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    Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle
    4.
    发明授权
    Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle 失效
    掩模和晶片衍射光栅对准系统，其中衍射光束基本上沿入射角返回

    公开(公告)号：US5559601A

    公开(公告)日：1996-09-24

    申请号：US375636

    申请日：1995-01-20

    申请人： Gregg M. Gallatin ,  Justin L. Kreuzer ,  Michael L. Nelson

    发明人： Gregg M. Gallatin ,  Justin L. Kreuzer ,  Michael L. Nelson

    IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  G01B9/02

    CPC分类号： G03F9/7049

    摘要： The present invention provides a grating-grating interferometric wafer alignment system, sensor and method for microlithography. It includes: (1) an electromagnetic radiation source with collimating optics delivering a collimated beam of a coherent single or multiple discrete wavelengths or in some cases broadband electromagnetic radiation; (2) a detector of the intensity of the collimated return electromagnetic radiation; (3) x- and y-oriented independent linear gratings for the mask-mark; (3) a "checkerboard pattern" grating for the wafer-mark; and (4) software including an algorithm for determining alignment from the return electromagnetic radiation intensity measured as a function of the relative position of the wafer and mask grating, and a means such as a Fourier transform determining phase and amplitude of a known frequency component of the intensity. In one embodiment a laser diode is used and the backscatter from the mask and wafer gratings is returned to the laser diode creating a beat signal used to determine alignment of the mask and wafer. Alignment accuracy is increased and made more tolerant of processing variables such as wafer topography and coatings.

    摘要翻译： 本发明提供一种光栅光栅干涉测量晶片对准系统，用于微光刻的传感器和方法。 它包括：（1）具有准直光学器件的电磁辐射源，其递送相干单个或多个离散波长的准直光束，或在某些情况下传送宽带电磁辐射; （2）准直返回电磁辐射强度的检测器; （3）用于掩模标记的x和y取向的独立线性光栅; （3）用于晶片标记的“棋盘图案”格栅; 以及（4）软件，其包括用于根据作为晶片和掩模光栅的相对位置的函数测量的返回电磁辐射强度来确定对准的算法，以及诸如傅立叶变换确定相位和幅度的装置，其中已知频率分量 强度。 在一个实施例中，使用激光二极管，并且来自掩模和晶片光栅的反向散射返回到激光二极管，产生用于确定掩模和晶片的对准的拍频信号。 对准精度提高，并且能够更加容忍诸如晶片形貌和涂层的处理变量。

    Software license serving in a massively parallel processing environment
    6.
    发明授权
    Software license serving in a massively parallel processing environment 有权

    公开(公告)号：US09639832B2

    公开(公告)日：2017-05-02

    申请号：US13427980

    申请日：2012-03-23

    申请人： Jerrold M. Heyman ,  Michael L. Nelson ,  Andrew G. Tonkin

    发明人： Jerrold M. Heyman ,  Michael L. Nelson ,  Andrew G. Tonkin

    IPC分类号： G06F21/00 ,  G06Q20/12 ,  G06F21/10

    CPC分类号： G06Q20/1235 ,  G06F21/10

    摘要： Techniques for implementing software licensing in a massive parallel processing environment on the basis of the actual use of licensed software instances are disclosed. In one embodiment, rather than using a license server or a node-locked license strategy, each use of a licensed software instance is monitored and correlated with a token. A store of tokens is maintained within the licensing system and a token is consumed after each instance successfully executes. Further, a disclosed embodiment also allows jobs that execute multiple software instances to complete execution, even if an adequate number of tokens does not exist for each remaining software instance. Once the license tokens are repurchased and replenished, any overage consumed from previous job executions may be reconciled. In this way, token-based licensing can be adapted to large scale computing environments that execute jobs of large and unpredictable sizes, while the cancellation of executing jobs may be avoided.

    Dynamic generation of VM instance at time of invocation
    7.
    发明授权
    Dynamic generation of VM instance at time of invocation 失效
    在调用时动态生成VM实例

    公开(公告)号：US08776058B2

    公开(公告)日：2014-07-08

    申请号：US13316524

    申请日：2011-12-11

    申请人： Jerrold M. Heyman ,  Michael L. Nelson ,  Andrew G. Tonkin ,  Kent R. Milligan ,  Antonio N. Pirraglia

    发明人： Jerrold M. Heyman ,  Michael L. Nelson ,  Andrew G. Tonkin ,  Kent R. Milligan ,  Antonio N. Pirraglia

    IPC分类号： G06F9/455

    CPC分类号： G06F9/45558 ,  G06F2009/45562

    摘要： Responsive to a request to invoke a given virtual machine (VM) instance, a base VM instance corresponding to a number of VM instances, including the given VM instance, is retrieved. A VM change file particular to just the given VM instance is also retrieved. The VM change file indicates how the given VM instance varies from the base VM instance. The VM change file is applied to the base VM instance to dynamically generate the given VM instance, and the given VM instance is then invoked. Responsive to a request to subsequently shutdown the given VM instance, the VM change file is updated to reflect how the given VM instance varies from the base VM instance. The given VM instance is then shutdown and deleted.

    摘要翻译： 响应于调用给定虚拟机（VM）实例的请求，检索与包括给定VM实例的VM数量相对应的基本VM实例。 还会检索到特定于VM给定VM实例的虚拟机更改文件。 VM更改文件指示给定的VM实例与基本VM实例的不同之处。 将VM更改文件应用于基本VM实例以动态生成给定的VM实例，然后调用给定的VM实例。 响应于随后关闭给定VM实例的请求，VM更改文件将被更新，以反映给定VM实例与基本VM实例的不同之处。 然后关闭并删除给定的VM实例。

    SOFTWARE LICENSE SERVING IN A MASSIVELY PARALLEL PROCESSING ENVIRONMENT
    8.
    发明申请
    SOFTWARE LICENSE SERVING IN A MASSIVELY PARALLEL PROCESSING ENVIRONMENT 有权
    软件许可证服务于大规模并行处理环境

    公开(公告)号：US20110296402A1

    公开(公告)日：2011-12-01

    申请号：US12788926

    申请日：2010-05-27

    申请人： Jerrold M. Heyman ,  Michael L. Nelson ,  Andrew G. Tonkin

    发明人： Jerrold M. Heyman ,  Michael L. Nelson ,  Andrew G. Tonkin

    IPC分类号： G06F9/445 ,  G06F17/30

    CPC分类号： G06Q20/1235 ,  G06F21/10

    摘要： Techniques for implementing software licensing in a massive parallel processing environment on the basis of the actual use of licensed software instances are disclosed. In one embodiment, rather than using a license server or a node-locked license strategy, each use of a licensed software instance is monitored and correlated with a token. A store of tokens is maintained within the licensing system and a token is consumed after each instance successfully executes. Further, a disclosed embodiment also allows jobs that execute multiple software instances to complete execution, even if an adequate number of tokens does not exist for each remaining software instance. Once the license tokens are repurchased and replenished, any overage consumed from previous job executions may be reconciled. In this way, token-based licensing can be adapted to large scale computing environments that execute jobs of large and unpredictable sizes, while the cancellation of executing jobs may be avoided.

    摘要翻译： 公开了在大量并行处理环境中基于许可软件实例的实际使用来实现软件许可的技术。 在一个实施例中，不是使用许可证服务器或节点锁定许可策略，每个使用许可的软件实例被监视并与令牌相关联。 一个令牌存储在许可证系统内，令牌在每个实例成功执行后被消耗。 此外，所公开的实施例还允许执行多个软件实例的作业完成执行，即使每个剩余软件实例不存在足够数量的令牌。 一旦许可证令牌被回购和补充，从以前的工作执行中消耗的任何高估可能会被调和。 以这种方式，基于令牌的许可可以适应于执行大型和不可预测尺寸的作业的大规模计算环境，同时可以避免执行作业的取消。

    EUV Reticle Substrates With High Thermal Conductivity
    9.
    发明申请
    EUV Reticle Substrates With High Thermal Conductivity 有权
    具有高导热性的EUV掩模基板

    公开(公告)号：US20110116068A1

    公开(公告)日：2011-05-19

    申请号：US13054008

    申请日：2009-07-29

    申请人： Ronald A. Wilklow ,  Michael L. Nelson ,  Michael Perry

    发明人： Ronald A. Wilklow ,  Michael L. Nelson ,  Michael Perry

    IPC分类号： G03B27/54 ,  G03F1/00

    CPC分类号： G03F1/24 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/70891

    摘要： A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry standards. The reflective reticle includes a layer of ultra-low expansion (ULE) glass and a substrate of Cordierite having a thermal conductivity substantially larger than that of ULE glass. An aluminum layer is disposed onto a first surface of the ULE glass and a second surface of the ULE glass is polished to be substantially flat and defect-free. The Cordierite substrate can be directly bonded to the aluminum layer using anodic bonding to form the reflective reticle. Alternatively, a first surface of an intermediate Zerodur layer can be bonded to the aluminum layer, and a second aluminum layer can be used to anodically bond the Cordierite substrate to a second surface of the Zerodur layer, thereby forming the reflective reticle.

    摘要翻译： 反射型掩模版基本上减少或消除由于EUV辐射的吸收而导致的图案变形，同时保持与行业标准一致的光罩厚度。 反射型掩模版包括一层超低膨胀（ULE）玻璃和堇青石的基底，其导热率基本上大于ULE玻璃的热导率。 将铝层设置在ULE玻璃的第一表面上，并将ULE玻璃的第二表面抛光成基本平坦且无缺陷。 堇青石基材可以使用阳极结合直接结合到铝层上以形成反射型掩模版。 或者，中间Zerodur层的第一表面可以结合到铝层，并且可以使用第二铝层将堇青石基板阳极结合到Zerodur层的第二表面，从而形成反射掩模版。