公开(公告)号：US20050152046A1

公开(公告)日：2005-07-14

申请号：US11014199

申请日：2004-12-16

申请人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

发明人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

IPC分类号： G02B27/00 ,  G02B27/28 ,  G03F7/20 ,  G02B17/00

CPC分类号： G03F7/70191 ,  G02B5/04 ,  G02B5/3066 ,  G02B27/286 ,  G03F7/70566

摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.

摘要翻译： 微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。 所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。 根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。

公开(公告)号：US20050146704A1

公开(公告)日：2005-07-07

申请号：US10949396

申请日：2004-09-27

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US20090040496A1

公开(公告)日：2009-02-12

申请号：US12177715

申请日：2008-07-22

申请人： Toralf GRUNER ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf GRUNER ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/72

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US07408616B2

公开(公告)日：2008-08-05

申请号：US10949396

申请日：2004-09-27

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/42

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US08237918B2

公开(公告)日：2012-08-07

申请号：US12498475

申请日：2009-07-07

申请人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

发明人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

IPC分类号： G03B27/72

CPC分类号： G03F7/70566

摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.

摘要翻译： 公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。 光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。 光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。 可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％ 平面内的强度，机械手配置在该区域。

公开(公告)号：US07847921B2

公开(公告)日：2010-12-07

申请号：US12177715

申请日：2008-07-22

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US20090323042A1

公开(公告)日：2009-12-31

申请号：US12498475

申请日：2009-07-07

申请人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

发明人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

IPC分类号： G03F7/20 ,  G03B27/72 ,  G02B27/28

CPC分类号： G03F7/70566

摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.

摘要翻译： 公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。 光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。 光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。 可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％ 平面内的强度，机械手配置在该区域。

公开(公告)号：US07405808B2

公开(公告)日：2008-07-29

申请号：US11014199

申请日：2004-12-16

申请人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

发明人： Toralf Gruner ,  Michael Totzeck ,  Damian Fiolka ,  Wilhelm Ulrich ,  Gerhard Fuerter

IPC分类号： G03B27/54 ,  G03B27/42 ,  G02B5/08

CPC分类号： G03F7/70191 ,  G02B5/04 ,  G02B5/3066 ,  G02B27/286 ,  G03F7/70566

摘要： An optical system, particularly an illumination system, of a microlithographic projection exposure apparatus contains at least one plane reflecting surface for folding the beam path. The at least one reflecting surface is arranged with respect to an optical axis of the optical system such that the intensity ratio between two mutually perpendicular polarization directions is at least substantially preserved for an axially parallel light ray deviated by the at least one reflecting surface. In accordance with a second aspect, the at least one reflecting surface is arranged such that a maximum effect on the polarization of the projection light is achieved, so as to be able to compensate for polarization dependencies which occur in other components of the illumination system.

摘要翻译： 微光刻投影曝光装置的光学系统，特别是照明系统包含用于折叠光束路径的至少一个平面反射表面。 所述至少一个反射表面相对于所述光学系统的光轴布置，使得对于由所述至少一个反射表面偏离的轴向平行的光线，至少基本上保留了两个相互垂直的偏振方向之间的强度比。 根据第二方面，至少一个反射表面被布置成使得能够实现对投射光的极化的最大影响，以便能够补偿在照明系统的其它部件中发生的偏振依赖性。

公开(公告)号：US20050094268A1

公开(公告)日：2005-05-05

申请号：US10922380

申请日：2004-08-19

申请人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

发明人： Damian Fiolka ,  Olaf Dittmann ,  Michael Totzeck ,  Nils Dieckmann ,  Jess Koehler ,  Toralf Gruner ,  Daniel Kraehmer

IPC分类号： G02B17/08 ,  G02B27/09 ,  G02B27/28 ,  G03F7/20 ,  G02F1/1335

CPC分类号： G03F7/70241 ,  G02B27/0994 ,  G02B27/286 ,  G03F7/70191 ,  G03F7/70966

摘要： An optical system (1) includes a first optical subsystem (3) with at least a first birefringent optical element (7), and further includes a second optical subsystem (5) with at least a second birefringent optical element (9). Between the first optical subsystem and the second optical subsystem, an optical retarding system (13) with at least a first optical retarding element (15) is arranged, which introduces a retardation of one-half of a wavelength between two mutually orthogonal states of polarization.

摘要翻译： 光学系统（1）包括具有至少第一双折射光学元件（7）的第一光学子系统（3），并且还包括具有至少第二双折射光学元件（9）的第二光学子系统（5）。 在第一光学子系统和第二光学子系统之间布置有至少具有第一光学延迟元件（15）的光学延迟系统（13），其引入两个相互正交的极化状态之间的波长的一半的延迟 。

公开(公告)号：US08767181B2

公开(公告)日：2014-07-01

申请号：US12946380

申请日：2010-11-15

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/72 ,  G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。