公开(公告)号：US20130295700A1

公开(公告)日：2013-11-07

申请号：US13935726

申请日：2013-07-05

Applicant: Micron Technology, Inc.

Inventor： Mark J. Williamson ,  Gurtej S. Sandhu ,  Justin R. Arrington

IPC: H01L21/66

CPC classification number: H01L22/14 ,  G01R31/2898 ,  H01J37/252 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/24564 ,  H01J2237/24592

Abstract: A method provides a mechanism to examine physical properties and/or diagnose problems at a selected location of an integrated circuit. Such a method can include creating a layer of a reactive material a selected distance above and in proximity with a surface of the integrated circuit so that the reactive material can be evaluated to form chemical radicals above and in proximity to the surface of the integrated circuit. A portion of the reactive material can be excited. A portion of the surface of the integrated circuit can be removed to a selected level to evaluate an exposed electrical structure of the integrated circuit. The exposed electrical structure can be evaluated to determine a potential problem in the integrated circuit.

Abstract translation: 一种方法提供了在集成电路的选定位置检查物理特性和/或诊断问题的机制。 这种方法可以包括在集成电路的表面上方和附近产生选定距离的反应材料层，使得反应性材料可以被评估以在集成电路的表面上方和附近形成化学自由基。 可以激发一部分反应性材料。 可以将集成电路的表面的一部分去除到选定的电平以评估集成电路的暴露的电结构。 可以评估暴露的电气结构以确定集成电路中的潜在问题。

公开(公告)号：US08809074B2

公开(公告)日：2014-08-19

申请号：US13935726

申请日：2013-07-05

Applicant: Micron Technology, Inc.

Inventor： Mark J. Williamson ,  Gurtej S. Sandhu ,  Justin R. Arrington

IPC: H01L21/66

CPC classification number: H01L22/14 ,  G01R31/2898 ,  H01J37/252 ,  H01J37/28 ,  H01J37/3056 ,  H01J2237/24564 ,  H01J2237/24592

Abstract: A method provides a mechanism to examine physical properties and/or diagnose problems at a selected location of an integrated circuit. Such a method can include creating a layer of a reactive material a selected distance above and in proximity with a surface of the integrated circuit so that the reactive material can be evaluated to form chemical radicals above and in proximity to the surface of the integrated circuit. A portion of the reactive material can be excited. A portion of the surface of the integrated circuit can be removed to a selected level to evaluate an exposed electrical structure of the integrated circuit. The exposed electrical structure can be evaluated to determine a potential problem in the integrated circuit.

Abstract translation: 一种方法提供了在集成电路的选定位置检查物理特性和/或诊断问题的机制。 这种方法可以包括在集成电路的表面上方和附近产生选定距离的反应材料层，使得反应性材料可以被评估以在集成电路的表面上方和附近形成化学自由基。 可以激发一部分反应性材料。 可以将集成电路的表面的一部分去除到选定的电平以评估集成电路的暴露的电结构。 可以评估暴露的电气结构以确定集成电路中的潜在问题。

公开(公告)号：US08609542B2

公开(公告)日：2013-12-17

申请号：US13784468

申请日：2013-03-04

Applicant: Micron Technology, Inc.

Inventor： Neal R. Rueger ,  Mark J. Williamson ,  Gurtej S. Sandhu ,  Justin R. Arrington

IPC: H01L21/311

CPC classification number: H01L31/02325 ,  B29D11/00365 ,  H01L22/20 ,  H01L27/14627

Abstract: Methods may operate to position a sample within a processing chamber and operate on a surface of the sample. Further activities may include creating a layer of reactive material in proximity with the surface, and exciting a portion of the layer of reactive material in proximity with the surface to form chemical radicals. Additional activities may include removing a portion of the material in proximity to the excited portion of the surface to a predetermined level, and continuing the creating, exciting and removing actions until at least one of a plurality of stop criteria occurs.

Abstract translation: 方法可以操作以将样品定位在处理室内并在样品的表面上操作。 进一步的活动可以包括在表面附近形成一层反应性材料，并且激发邻近表面的一部分反应性材料以形成化学自由基。 另外的活动可以包括将表面的被激发部分附近的材料的一部分移除到预定水平，并且继续创建，激励和移除动作，直到出现多个停止标准中的至少一个。

公开(公告)号：US20130180950A1

公开(公告)日：2013-07-18

申请号：US13784468

申请日：2013-03-04

Applicant: Micron Technology, Inc.

Inventor： Neal R. Rueger ,  Mark J. Williamson ,  Gurtej S. Sandhu ,  Justin R. Arrington

IPC: H01L31/0232

CPC classification number: H01L31/02325 ,  B29D11/00365 ,  H01L22/20 ,  H01L27/14627

Abstract: Methods may operate to position a sample within a processing chamber and operate on a surface of the sample. Further activities may include creating a layer of reactive material in proximity with the surface, and exciting a portion of the layer of reactive material in proximity with the surface to form chemical radicals. Additional activities may include removing a portion of the material in proximity to the excited portion of the surface to a predetermined level, and continuing the creating, exciting and removing actions until at least one of a plurality of stop criteria occurs.

Abstract translation: 方法可以操作以将样品定位在处理室内并在样品的表面上操作。 进一步的活动可以包括在表面附近形成一层反应性材料，并且激发邻近表面的一部分反应性材料以形成化学自由基。 另外的活动可以包括将表面的被激发部分附近的材料的一部分移除到预定水平，并且继续创建，激励和移除动作，直到出现多个停止标准中的至少一个。