摘要:
An incremental offset measuring instrument is provided. The incremental offset measuring instrument includes a main base; a specimen seat mounted on the main base for resting a specimen; a measuring tool assembly for measuring the specimen; and a movable assembly mounted on the main base, wherein the movable assembly carries the measuring tool assembly, thereby achieving the goal of measuring the specimen.
摘要:
A fixture for assembling a post-CMP cleaning brush. The post-CMP cleaning brush is provided with a brush core and an outer brush, and the outer brush is provided with a hollow portion. The fixture comprises a base, a plurality of posts and a guiding member. The base is provided with a plurality of holes. The posts insert into the holes of the base through the hollow portion of the outer brush respectively so as to assist the brush core in passing through the hollow portion of the outer brush. The guiding member is connected with the brush core to assist the brush core in passing through the hollow portion of the outer brush.
摘要:
An apparatus for assembling a post-CMP cleaning brush. The post-CMP cleaning brush is provided with a brush core and an outer brush, and the outer brush is provided with a hollow portion. The apparatus comprises a base, a fixed member, a sliding member, a plurality of posts, and an actuating device. The base holds the brush core and the outer brush, and the fixed member is disposed on the base. The sliding member is disposed on the base in a manner such that it is located at the opposite side of the fixed member relative to the outer brush disposed on the base. The posts, disposed on the sliding member, pass through the fixed member and the hollow portion of the outer brush so as to assist the brush core in passing through the hollow portion of the outer brush. The actuating device connects with the brush core so as to pass the brush core through the hollow portion of the outer brush and separate the posts, inserted into the outer brush, from the outer brush.
摘要:
A slurry tank autocleaner for cleaning an empty slurry tank. A first pipe is inserted in the interior of the slurry tank, where the first pipe has an open end located inside the slurry tank. A first nozzle is disposed on the open end of the first pipe. A cover is used to cover the slurry tank, where the cover has a plurality of second nozzles targeting the slurry tank. A second pipe is connected to the second nozzles. A controller is used to control chemical, pure water or dry gas to spurt from the first nozzle and the second nozzles through the first pipe and the second pipe. Thus, the slurry tank can be automatically cleaned.
摘要:
An apparatus for punching CMP machine backing film. The apparatus comprises a base, a first plate, and a second plate. The base holds the backing-film. The first plate is disposed on the base in a manner such that it moves between a first position and a second position. The first plate abuts the backing-film when it is located at the second position. The second plate, having a plurality of punches, is disposed on the base in a manner such that it moves between a third position and a fourth position. The first plate is located at the first position when the second plate is located at the third position. The first plate is located at the second position when the second plate is located at the fourth position so that the punches pass through the first plate to punch the backing-film.