公开(公告)号：US06920796B2

公开(公告)日：2005-07-26

申请号：US10705939

申请日：2003-11-13

申请人： Chih-Kun Chen ,  Yao-Hsiung Kung ,  Chung-Min Lin ,  Shan-Chang Wang ,  Jiun-Bo Wang

发明人： Chih-Kun Chen ,  Yao-Hsiung Kung ,  Chung-Min Lin ,  Shan-Chang Wang ,  Jiun-Bo Wang

IPC分类号： G01L5/00 ,  H01L21/00 ,  H01L21/687 ,  G01N3/02

CPC分类号： H01L21/67288 ,  G01L5/009 ,  H01L21/68707

摘要： A device used for detecting the clamping force of a processed object and a method thereof are proposed. The device comprises a detection unit, a basis component and a pressure detection component disposed on the basis component. The basis component having the pressure detection component is closely placed between pivotal rods so that the detection unit can detect variation of electric properties of the pressure detection component to adjust the spacing between the pivotal rods, hence facilitating adjustment of the clamping force.

摘要翻译： 提出了一种用于检测加工对象的夹持力的装置及其方法。 该装置包括检测单元，基础部件和设置在基础部件上的压力检测部件。 具有压力检测部件的基础部件紧密地放置在枢转杆之间，使得检测单元可以检测压力检测部件的电特性的变化，以调节枢转杆之间的间隔，从而有助于调节夹紧力。

公开(公告)号：US06772528B2

公开(公告)日：2004-08-10

申请号：US10200497

申请日：2002-07-23

申请人： Ming Fa Tsai ,  Shan Chang Wang ,  Yi-Tung Lin

发明人： Ming Fa Tsai ,  Shan Chang Wang ,  Yi-Tung Lin

IPC分类号： G01B502

CPC分类号： G01B5/0007

摘要： An incremental offset measuring instrument is provided. The incremental offset measuring instrument includes a main base; a specimen seat mounted on the main base for resting a specimen; a measuring tool assembly for measuring the specimen; and a movable assembly mounted on the main base, wherein the movable assembly carries the measuring tool assembly, thereby achieving the goal of measuring the specimen.

公开(公告)号：US06761624B2

公开(公告)日：2004-07-13

申请号：US10053161

申请日：2002-01-15

申请人： Shan-Chang Wang ,  Hsin-Chuan Tsai

发明人： Shan-Chang Wang ,  Hsin-Chuan Tsai

IPC分类号： B24B4106

CPC分类号： B24B37/345

摘要： A chemical mechanical polish apparatus comprises a platen having a polishing pad thereon, a wafer carrier holding a wafer on the polishing pad, and a pusher. The pusher has a base disk and at least two guiding structures at the rim of the base disk. Each guiding structure has a shell with an opening, an elastic device and a pin moving through the opening, wherein the opening is non-linear.

摘要翻译： 化学机械抛光装置包括其上具有抛光垫的压板，在抛光垫上保持晶片的晶片载体和推动器。 推动器具有基盘和在基盘的边缘处的至少两个引导结构。 每个引导结构具有开口的外壳，弹性装置和穿过开口的销，其中开口是非线性的。

公开(公告)号：US06726554B1

公开(公告)日：2004-04-27

申请号：US10460446

申请日：2003-06-12

申请人： Chih-Kun Chen ,  Shan Chang Wang

发明人： Chih-Kun Chen ,  Shan Chang Wang

IPC分类号： B24B4702

CPC分类号： H01L21/68728 ,  B24B37/32 ,  H01L21/68785 ,  Y10S451/914

摘要： A guide ring removal device. The guide ring removal device includes a column press, a first disc, a second disc, and a plurality of fasteners. The first disc is disposed on the column press. The second disc is disposed on a point of the column press to exert force on a carrier. The plurality of fasteners is disposed on the first disc, the fasteners grasping the guide ring. As the second disc exerts the primary force on the carrier, the fasteners generate reciprocal force on the guide ring, thus separating the guide ring. Engagement of the column press alters the distance between the first disc and the second disc, and the primary force is exerted on the carrier.

摘要翻译： 导环拆除装置。 引导环移除装置包括柱压机，第一盘，第二盘和多个紧固件。 将第一盘放置在柱压机上。 第二盘被设置在柱压机的点上以对载体施加力。 多个紧固件设置在第一盘上，紧固件抓住导向环。 当第二盘在载体上施加主力时，紧固件在引导环上产生相互的力，从而分离引导环。 柱压合器的接合改变第一盘和第二盘之间的距离，并且主力施加在载体上。

公开(公告)号：US06923709B2

公开(公告)日：2005-08-02

申请号：US10410558

申请日：2003-04-07

申请人： Chih-Kun Chen ,  Shan-Chang Wang ,  Ching-Huang Chen

发明人： Chih-Kun Chen ,  Shan-Chang Wang ,  Ching-Huang Chen

IPC分类号： B24B49/00

CPC分类号： B24B37/32 ,  B24B49/00

摘要： A CMP (chemical mechanical polishing) apparatus having a measuring device for measuring a guide ring. A polishing table is provided. A wafer loading/unloading device is located at a first side of the polishing table. A measuring device is located at a second side of the polishing table. A carrier having a first lateral and a second lateral opposite the first lateral, wherein the first lateral faces the polishing table, the wafer loading/unloading device or the measuring device. A guide ring is disposed on the first lateral of the carrier. A transfer device is disposed on the second lateral of the carrier and connected to the carrier, wherein the transfer device is used to move the carrier onto the polishing table, the wafer loading/unloading device or the measuring device. The measuring device is used to automatically and immediately measure the severity of scoring on the guide ring.

摘要翻译： 一种具有用于测量导向环的测量装置的CMP（化学机械抛光）装置。 提供了抛光台。 晶片装载/卸载装置位于抛光台的第一侧。 测量装置位于抛光台的第二侧。 一种具有与第一侧面相反的第一横向和第二横向的载体，其中所述第一横向面向所述抛光台，所述晶片装载/卸载装置或所述测量装置。 引导环布置在载体的第一侧面上。 传送装置设置在载体的第二侧面上并连接到载体上，其中传送装置用于将载体移动到抛光台，晶片装载/卸载装置或测量装置上。 测量装置用于自动并立即测量导环上刻痕的严重程度。

公开(公告)号：US20050103121A1

公开(公告)日：2005-05-19

申请号：US10705939

申请日：2003-11-13

申请人： Chih-Kun Chen ,  Yao-Hsiung Kung ,  Chung-Min Lin ,  Shan-Chang Wang ,  Jiun-Bo Wang

发明人： Chih-Kun Chen ,  Yao-Hsiung Kung ,  Chung-Min Lin ,  Shan-Chang Wang ,  Jiun-Bo Wang

IPC分类号： G01L5/00 ,  H01L21/00 ,  H01L21/687 ,  G01N3/02

CPC分类号： H01L21/67288 ,  G01L5/009 ,  H01L21/68707

摘要： A device used for detecting the clamping force of a processed object and a method thereof are proposed. The device comprises a detection unit, a basis component and a pressure detection component disposed on the basis component. The basis component having the pressure detection component is closely placed between pivotal rods so that the detection unit can detect variation of electric properties of the pressure detection component to adjust the spacing between the pivotal rods, hence facilitating adjustment of the clamping force.

摘要翻译： 提出了一种用于检测加工对象的夹持力的装置及其方法。 该装置包括检测单元，基础部件和设置在基础部件上的压力检测部件。 具有压力检测部件的基础部件紧密地放置在枢转杆之间，使得检测单元可以检测压力检测部件的电特性的变化，以调节枢转杆之间的间隔，从而有助于调节夹紧力。

公开(公告)号：US06790010B2

公开(公告)日：2004-09-14

申请号：US10316354

申请日：2002-12-11

申请人： Chih-Kun Chen ,  Shan Chang Wang

发明人： Chih-Kun Chen ,  Shan Chang Wang

IPC分类号： F04B4900

CPC分类号： F04B9/125 ,  F04B2205/09

摘要： A pumping system. The pumping system has a cylinder pump, a first group of switching devices, and a second group of switching devices. The first group of switching devices enable the cylinder pump to pump the liquid by feeding the gas provided by the gas source into the cylinder pump through a first ventilator according to a first enabling signal, and the second group of switching devices enable the cylinder to output the liquid by feeding the gas provided by the gas source into the cylinder pump through a second ventilator according to a second enable signal.

摘要翻译： 抽水系统 泵送系统具有气缸泵，第一组开关装置和第二组开关装置。 第一组开关装置使得气缸泵能够通过根据第一启用信号通过第一通气机将由气体源提供的气体馈送到气缸泵中来泵送液体，并且第二组开关装置使气缸能够输出 通过根据第二使能信号将由气体源提供的气体通过第二通气机输送到气缸泵中的液体。