公开(公告)号：US08578594B2

公开(公告)日：2013-11-12

申请号：US13154191

申请日：2011-06-06

申请人： Ming Jiang ,  Ronghui Zhou ,  Guanghong Luo ,  Masahiro Osugi ,  Danning Yang

发明人： Ming Jiang ,  Ronghui Zhou ,  Guanghong Luo ,  Masahiro Osugi ,  Danning Yang

IPC分类号： G11B5/127 ,  H04R31/00

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

摘要： A process for fabricating a magnetic recording transducer for use in a data storage system comprises providing a substrate, an underlayer and a first nonmagnetic intermediate layer deposited to a first thickness on and in contact with the underlayer, performing a first scanning polishing on a first section of the first intermediate layer to planarize the first section of the first intermediate layer to a second thickness, providing a main pole in the planarized first section of the first intermediate layer, providing a first pattern of photoresist on and in contact with the first section of the first intermediate layer, the pattern comprising an aperture to define a side shield trench, performing a wet etch to remove at least a portion of the first intermediate layer thereby exposing at least one of the plurality of main pole sides, and depositing side shield material in the side shield trench.

摘要翻译： 一种用于制造用于数据存储系统的磁记录传感器的方法包括提供在底层上沉积到第一厚度并与底层接触的基底，底层和第一非磁性中间层，在第一部分上进行第一扫描抛光 将所述第一中间层的第一部分平坦化为第二厚度，在所述第一中间层的平坦化的第一部分中提供主极，在所述第一中间层的所述第一部分的第一部分上提供第一图案， 第一中间层，图案包括用于限定侧屏蔽沟槽的孔，执行湿蚀刻以去除第一中间层的至少一部分，从而暴露多个主极侧中的至少一个，以及沉积侧屏蔽材料 在侧盾沟。

公开(公告)号：US08506828B1

公开(公告)日：2013-08-13

申请号：US13171242

申请日：2011-06-28

申请人： Masahiro Osugi ,  Guanghong Luo ,  Ronghui Zhou ,  Danning Yang ,  Dujiang Wan ,  Ming Jiang

发明人： Masahiro Osugi ,  Guanghong Luo ,  Ronghui Zhou ,  Danning Yang ,  Dujiang Wan ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/3932 ,  G11B5/3163 ,  G11B5/3909 ,  Y10T29/49043

摘要： A method and system for fabricating a read sensor on a substrate for a read transducer is described. A read sensor stack is deposited on the substrate. A mask is provided on the on the read sensor stack. The mask has a pattern that covers a first portion of the read sensor stack corresponding to the read sensor, covers a second portion of the read sensor stack distal from the read sensor, and exposes a third portion of the read sensor stack between the first and second portions. The read sensor is defined from the read sensor stack. A hard bias layer is deposited. An aperture free mask layer including multiple thicknesses is provided. A focused ion beam scan (FIBS) polishing step is performed on the mask and hard bias layers to remove a portion of the mask and hard bias layers based on the thicknesses.

摘要翻译： 描述了用于在读取换能器的基板上制造读取传感器的方法和系统。 读取传感器堆叠沉积在衬底上。 在读取传感器堆叠上提供掩模。 掩模具有覆盖对应于读取传感器的读取传感器堆叠的第一部分的图案，其覆盖远离读取传感器的读取传感器堆叠的第二部分，并将读取传感器堆叠的第三部分暴露在第一和第 第二部分。 读取传感器由读取传感器堆栈定义。 沉积硬偏压层。 提供包括多个厚度的无孔掩模层。 在掩模和硬偏压层上执行聚焦离子束扫描（FIBS）抛光步骤，以基于厚度去除掩模和硬偏压层的一部分。

公开(公告)号：US08486285B2

公开(公告)日：2013-07-16

申请号：US12544998

申请日：2009-08-20

申请人： Ronghui Zhou ,  Ming Jiang ,  Xiaohai Xiang ,  Jinwen Wang ,  Guanghong Luo ,  Yun-Fei Li

发明人： Ronghui Zhou ,  Ming Jiang ,  Xiaohai Xiang ,  Jinwen Wang ,  Guanghong Luo ,  Yun-Fei Li

IPC分类号： B44C1/22

CPC分类号： G11B5/855 ,  Y10T29/49048

摘要： A method for forming a write pole comprises forming a stop layer over a substrate layer of a wafer, the stop layer having an opening above a damascene trench in the substrate layer, and forming a buffer layer over the stop layer, the buffer layer having an opening above the opening of the stop layer. The method further comprises plating a layer of magnetic material over the wafer, disposing a first sacrificial material over a region of the magnetic material above the damascene trench, performing a milling or etching operation over the wafer to remove the magnetic material not covered by the first sacrificial material and to remove the first sacrificial material, disposing a second sacrificial material over the wafer, and performing a polishing operation over the wafer to remove the region of the magnetic material above the damascene trench, the second sacrificial material, and the buffer layer.

摘要翻译： 用于形成写极的方法包括在晶片的衬底层上形成阻挡层，所述阻挡层在衬底层中具有在镶嵌沟槽上方的开口，以及在停止层上形成缓冲层，所述缓冲层具有 在停止层的开口上方开口。 该方法还包括在晶片上镀覆一层磁性材料，在金刚石沟槽上方的磁性材料的区域上设置第一牺牲材料，在晶片上进行研磨或蚀刻操作，以去除第一 牺牲材料并且去除第一牺牲材料，在晶片上设置第二牺牲材料，以及在晶片上执行抛光操作以去除镶嵌沟槽，第二牺牲材料和缓冲层之上的磁性材料的区域。

公开(公告)号：US09099118B1

公开(公告)日：2015-08-04

申请号：US12472341

申请日：2009-05-26

申请人： Ronghui Zhou ,  Ming Jiang ,  Guanghong Luo ,  Yun-Fei Li

发明人： Ronghui Zhou ,  Ming Jiang ,  Guanghong Luo ,  Yun-Fei Li

IPC分类号： G11B5/127 ,  H04R31/00 ,  G11B5/31

CPC分类号： G11B5/3169 ,  G11B5/1278 ,  G11B5/3116 ,  G11B5/313 ,  G11B5/3163 ,  Y10T29/49046

摘要： Methods of forming a write pole are disclosed. A structure comprising a bottom insulating layer and a top insulating layer is provided. A top damascene trench is formed in the top insulating layer, and a bottom damascene trench is formed in the bottom insulating layer. The bottom damascene trench and a portion of the top damascene trench are filled with a pole material. The top insulating layer and a portion of the pole material located above the bottom damascene trench are removed.

摘要翻译： 公开了形成写极的方法。 提供了包括底部绝缘层和顶部绝缘层的结构。 在顶部绝缘层中形成顶部镶嵌沟槽，并且在底部绝缘层中形成底部镶嵌沟槽。 底部镶嵌沟槽和顶部镶嵌沟槽的一部分填充有极材料。 去除顶部绝缘层和位于底部镶嵌沟槽上方的极材料的一部分。

公开(公告)号：US08262918B1

公开(公告)日：2012-09-11

申请号：US12411270

申请日：2009-03-25

申请人： Yun-Fei Li ,  Ronghui Zhou ,  Guanghong Luo ,  Ming Jiang

发明人： Yun-Fei Li ,  Ronghui Zhou ,  Guanghong Luo ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/3163

摘要： Methods of producing magnetic recording heads are disclosed. The methods can include providing a wafer comprising a substrate layer in which are disposed a plurality of damascene trenches. The method can further include depositing a pole material across the whole wafer, wherein the plurality of trenches are filled with the pole material. The methods can further include depositing a mask material over the pole material across the whole wafer. The methods can further include performing a first material removal process across the whole wafer to remove the mask material and a first portion of the pole material at a same material removal rate. The methods can further include performing a second material removal process to remove a second portion of the pole material above the substrate layer.

摘要翻译： 公开了制造磁记录头的方法。 所述方法可以包括提供包括其中布置有多个镶嵌沟槽的基底层的晶片。 该方法还可以包括在整个晶片上沉积极材料，其中多个沟槽用极材料填充。 该方法还可以包括在整个晶片上沉积超过极材料的掩模材料。 该方法还可以包括在整个晶片上执行第一材料去除工艺，以相同的材料去除速率移除掩模材料和极材料的第一部分。 所述方法还可以包括执行第二材料去除工艺以去除衬底层上方的极材料的第二部分。

公开(公告)号：US08790524B1

公开(公告)日：2014-07-29

申请号：US12880484

申请日：2010-09-13

申请人： Guanghong Luo ,  Danning Yang ,  Ming Jiang

发明人： Guanghong Luo ,  Danning Yang ,  Ming Jiang

IPC分类号： G11B5/127 ,  G11B5/31 ,  G11B5/11

CPC分类号： G11B5/3116 ,  G11B5/112 ,  G11B5/3163 ,  G11B5/3903 ,  G11B5/3932

摘要： A method and system for fabricating a magnetic transducer is described. The transducer has device and field regions, and a magnetoresistive stack. Hard mask layer and wet-etchable layers are provided on the magnetoresistive stack and hard mask layer, respectively. A hard mask and a wet-etchable mask are formed from the hard mask and the wet-etchable layers, respectively. The hard and wet-etchable masks each includes a sensor portion and a line frame. The sensor portion covers part of the magnetoresistive stack corresponding to a magnetoresistive structure. The line frame covers a part of the magnetoresistive stack in the device region. The magnetoresistive structure is defined in a track width direction. Hard bias material(s) are then provided. Part of the hard bias material(s) is adjacent to the magnetoresistive structure in the track width direction. The wet-etchable sensor portion and line frame, and hard bias material(s) thereon, are removed.

摘要翻译： 描述了用于制造磁换能器的方法和系统。 传感器具有器件和场区域以及磁阻堆叠。 硬掩模层和湿蚀刻层分别设置在磁阻堆叠和硬掩模层上。 分别由硬掩模和湿蚀刻层形成硬掩模和湿蚀刻掩模。 硬和湿可蚀刻掩模各自包括传感器部分和线框架。 传感器部分覆盖对应于磁阻结构的磁阻堆叠的一部分。 线框架覆盖设备区域中的磁阻堆叠的一部分。 磁阻结构被定义在磁道宽度方向上。 然后提供硬偏置材料。 硬偏置材料的一部分在磁道宽度方向上与磁阻结构相邻。 湿式可蚀刻传感器部分和线框架以及其上的硬偏移材料被去除。

公开(公告)号：US08790527B1

公开(公告)日：2014-07-29

申请号：US13069023

申请日：2011-03-22

申请人： Guanghong Luo ,  Ming Jiang ,  Danning Yang ,  Yunfei Li

发明人： Guanghong Luo ,  Ming Jiang ,  Danning Yang ,  Yunfei Li

IPC分类号： H01L21/302 ,  H01L21/461 ,  B29D11/00 ,  C03C15/00 ,  C03C25/68

CPC分类号： B29D11/00663

摘要： A method for providing waveguide structures for an energy assisted magnetic recording (EAMR) transducer is described. The waveguide structures have a plurality of widths. At least one waveguide layer is provided. Mask structure(s) corresponding to the waveguide structures and having a pattern are provided on the waveguide layer(s). The mask structure(s) include a planarization stop layer, a planarization assist layer on the planarization stop layer, and a hard mask layer on the planarization assist layer. The planarization assist layer has a low density. The pattern of the mask structure(s) is transferred to the waveguide layer(s). Optical material(s) that cover the waveguide layer(s) and a remaining portion of the mask structure(s) are provided. The optical material(s) have a density that is at least twice the low density of the planarization assist layer. The method also includes performing a planarization configured to remove at least a portion of the optical material(s).

摘要翻译： 描述了一种用于提供能量辅助磁记录（EAMR）换能器的波导结构的方法。 波导结构具有多个宽度。 提供至少一个波导层。 对应于波导结构并具有图案的掩模结构设置在波导层上。 掩模结构包括平坦化停止层，平坦化停止层上的平坦化辅助层和平坦化辅助层上的硬掩模层。 平坦化助剂层具有低密度。 掩模结构的图案被传送到波导层。 提供了覆盖波导层和掩模结构的剩余部分的光学材料。 光学材料的密度至少是平坦化辅助层的低密度的两倍。 该方法还包括执行被配置为去除至少一部分光学材料的平坦化。

公开(公告)号：US08262919B1

公开(公告)日：2012-09-11

申请号：US12824036

申请日：2010-06-25

申请人： Guanghong Luo ,  Changqing Shi ,  Danning Yang ,  Jinwen Wang ,  Ming Jiang

发明人： Guanghong Luo ,  Changqing Shi ,  Danning Yang ,  Jinwen Wang ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/1278 ,  G11B5/3116 ,  G11B5/315 ,  G11B5/3163

摘要： A method and system for providing a pole of magnetic transducer having an intermediate layer are described. The method and system include providing a trench in the intermediate layer and depositing a nonmagnetic liner. A portion of the nonmagnetic liner resides in the trench. At least one seed layer is deposited. A portion of the at least one seed layer resides in the trench. The method and system include depositing at least one main pole layer. The at least one main pole layer is magnetic. A portion of the main pole layer(s) reside in the trench. The method and system also include performing a first chemical mechanical planarization (CMP). An excess portion of the seed layer(s) external to the trench are removed through an ion beam etch. The method and system further include performing a second CMP to remove an excess portion of the nonmagnetic liner external to the trench.

摘要翻译： 描述了一种用于提供具有中间层的磁换能器的磁极的方法和系统。 该方法和系统包括在中间层中提供沟槽并沉积非磁性衬垫。 非磁性衬垫的一部分位于沟槽中。 沉积至少一个种子层。 至少一个种子层的一部分位于沟槽中。 该方法和系统包括沉积至少一个主极层。 至少一个主极层是磁性的。 主极层的一部分驻留在沟槽中。 该方法和系统还包括执行第一化学机械平面化（CMP）。 通过离子束蚀刻去除沟槽外部的种子层的多余部分。 该方法和系统还包括执行第二CMP以去除沟槽外部的非磁性衬垫的多余部分。

公开(公告)号：US08480911B1

公开(公告)日：2013-07-09

申请号：US13173846

申请日：2011-06-30

申请人： Masahiro Osugi ,  Guanghong Luo ,  Lily Yao ,  Ming Jiang

发明人： Masahiro Osugi ,  Guanghong Luo ,  Lily Yao ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/398 ,  G01R33/0052 ,  G01R33/093 ,  G11B5/3163 ,  G11B5/3169 ,  G11B5/3932

摘要： A read sensor for a read transducer is fabricated. The read transducer has field and device regions. A read sensor stack is deposited. A mask covering part of the stack corresponding to the read sensor is provided. The read sensor having inboard and outboard junction angles is defined from the stack in a track width direction. A critical junction (CJ) focused ion beam scan (FIBS) polishing that removes part of the read sensor based on the junction angles is performed. A hard bias structure is deposited and the transducer planarized. A remaining portion of the mask is removed. A stripe height mask covering part of the read sensor and hard bias structure in a stripe height direction is provided. The read sensor stripe height is defined. A tunneling magnetoresistance (TMR) FIBS polishing that removes part of the stack in the field region is performed. An insulating layer is provided.

摘要翻译： 制造用于读取换能器的读取传感器。 读取传感器具有现场和设备区域。 读取传感器堆栈。 提供覆盖对应于读取传感器的堆叠部分的掩模。 具有内侧和外侧接合角的读取传感器从堆叠沿轨道宽度方向限定。 执行基于结合角去除部分读取传感器的临界结（CJ）聚焦离子束扫描（FIBS）抛光。 沉积硬偏压结构，并将传感器平坦化。 去除掩模的剩余部分。 提供覆盖读取传感器的一部分并且条带高度方向上的硬偏置结构的条纹高度掩模。 读取传感器条纹高度被定义。 执行去除场区域中的一部分堆叠的隧道磁阻（TMR）FIBS抛光。 提供绝缘层。

公开(公告)号：US08404129B1

公开(公告)日：2013-03-26

申请号：US12751815

申请日：2010-03-31

申请人： Guanghong Luo ,  Danning Yang ,  Ming Jiang

发明人： Guanghong Luo ,  Danning Yang ,  Ming Jiang

IPC分类号： B44C1/22

CPC分类号： G11B5/3163 ,  G11B2005/0021

摘要： A method and system for fabricating an optical component are described. The method and system include providing a first planarization stopping and a second planarization stopping structure. The first planarization stopping structure has a first height and a first edge. The second planarization stopping structure has a second height different from the first height and a second edge. The first edge is separated from the second edge by a distance. The method and system also include providing an optical material. The optical material resides at least between the first edge of the first planarization stopping structure and the second edge of the second planarization stopping structure. The method and system also include planarizing the optical components. The planarization removes a portion of the optical material to form a surface between the first planarization stopping structure and the second planarization stopping structure. This surface has a curvature.

摘要翻译： 描述了用于制造光学部件的方法和系统。 该方法和系统包括提供第一平坦化停止和第二平坦化停止结构。 第一平面化停止结构具有第一高度和第一边缘。 第二平坦化停止结构具有与第一高度不同的第二高度和第二边缘。 第一边缘与第二边缘分开一段距离。 该方法和系统还包括提供光学材料。 光学材料至少位于第一平坦化停止结构的第一边缘和第二平坦化停止结构的第二边缘之间。 该方法和系统还包括平面化光学部件。 平坦化除去光学材料的一部分以在第一平坦化停止结构和第二平坦化停止结构之间形成表面。 该表面具有曲率。