Process for CMP with large feature size variation
    1.
    发明授权
    Process for CMP with large feature size variation 有权
    具有大特征尺寸变化的CMP的工艺

    公开(公告)号:US08846534B1

    公开(公告)日:2014-09-30

    申请号:US13269453

    申请日:2011-10-07

    IPC分类号: H01L21/302

    CPC分类号: G11B5/3163

    摘要: Embodiments of the present invention relate to reducing the size variation on a wafer fabrication. In some embodiments, at least a portion the backfill material over features larger than a threshold size is etched or milled to provide backfill protrusions over those features. The backfill protrusions are configured to reduce the size variation across the fabrication. Embodiments of the invention may be used in fabrication of many types of devices, such as tapered wave guides (TWG), near-field transducers (NFT), MEMS devices, EAMR optical devices, optical structures, bio-optical devices, micro-fluidic devices, and magnetic writers.

    摘要翻译: 本发明的实施例涉及减小晶片制造的尺寸变化。 在一些实施例中,至少一部分覆盖材料超过阈值尺寸的特征被蚀刻或研磨以在这些特征上提供回填突起。 回填突起构造成减小制造过程中的尺寸变化。 本发明的实施例可用于制造诸如锥形波导(TWG),近场换能器(NFT),MEMS装置,EAMR光学装置,光学结构,生物光学装置,微流体 设备和磁性作者。

    Method and system for providing a magnetic recording transducer using a line hard mask and a wet-etchable mask
    2.
    发明授权
    Method and system for providing a magnetic recording transducer using a line hard mask and a wet-etchable mask 有权
    用于使用线硬掩模和湿蚀刻掩模提供磁记录换能器的方法和系统

    公开(公告)号:US08790524B1

    公开(公告)日:2014-07-29

    申请号:US12880484

    申请日:2010-09-13

    IPC分类号: G11B5/127 G11B5/31 G11B5/11

    摘要: A method and system for fabricating a magnetic transducer is described. The transducer has device and field regions, and a magnetoresistive stack. Hard mask layer and wet-etchable layers are provided on the magnetoresistive stack and hard mask layer, respectively. A hard mask and a wet-etchable mask are formed from the hard mask and the wet-etchable layers, respectively. The hard and wet-etchable masks each includes a sensor portion and a line frame. The sensor portion covers part of the magnetoresistive stack corresponding to a magnetoresistive structure. The line frame covers a part of the magnetoresistive stack in the device region. The magnetoresistive structure is defined in a track width direction. Hard bias material(s) are then provided. Part of the hard bias material(s) is adjacent to the magnetoresistive structure in the track width direction. The wet-etchable sensor portion and line frame, and hard bias material(s) thereon, are removed.

    摘要翻译: 描述了用于制造磁换能器的方法和系统。 传感器具有器件和场区域以及磁阻堆叠。 硬掩模层和湿蚀刻层分别设置在磁阻堆叠和硬掩模层上。 分别由硬掩模和湿蚀刻层形成硬掩模和湿蚀刻掩模。 硬和湿可蚀刻掩模各自包括传感器部分和线框架。 传感器部分覆盖对应于磁阻结构的磁阻堆叠的一部分。 线框架覆盖设备区域中的磁阻堆叠的一部分。 磁阻结构被定义在磁道宽度方向上。 然后提供硬偏置材料。 硬偏置材料的一部分在磁道宽度方向上与磁阻结构相邻。 湿式可蚀刻传感器部分和线框架以及其上的硬偏移材料被去除。

    Process for fabricating a magnetic pole and shields
    3.
    发明授权
    Process for fabricating a magnetic pole and shields 有权
    制造磁极和屏蔽的工艺

    公开(公告)号:US08578594B2

    公开(公告)日:2013-11-12

    申请号:US13154191

    申请日:2011-06-06

    IPC分类号: G11B5/127 H04R31/00

    摘要: A process for fabricating a magnetic recording transducer for use in a data storage system comprises providing a substrate, an underlayer and a first nonmagnetic intermediate layer deposited to a first thickness on and in contact with the underlayer, performing a first scanning polishing on a first section of the first intermediate layer to planarize the first section of the first intermediate layer to a second thickness, providing a main pole in the planarized first section of the first intermediate layer, providing a first pattern of photoresist on and in contact with the first section of the first intermediate layer, the pattern comprising an aperture to define a side shield trench, performing a wet etch to remove at least a portion of the first intermediate layer thereby exposing at least one of the plurality of main pole sides, and depositing side shield material in the side shield trench.

    摘要翻译: 一种用于制造用于数据存储系统的磁记录传感器的方法包括提供在底层上沉积到第一厚度并与底层接触的基底,底层和第一非磁性中间层,在第一部分上进行第一扫描抛光 将所述第一中间层的第一部分平坦化为第二厚度,在所述第一中间层的平坦化的第一部分中提供主极,在所述第一中间层的所述第一部分的第一部分上提供第一图案, 第一中间层,图案包括用于限定侧屏蔽沟槽的孔,执行湿蚀刻以去除第一中间层的至少一部分,从而暴露多个主极侧中的至少一个,以及沉积侧屏蔽材料 在侧盾沟。

    Damascene write poles produced via full film plating
    4.
    发明授权
    Damascene write poles produced via full film plating 失效
    大马士革通过全电镀制作电极

    公开(公告)号:US08486285B2

    公开(公告)日:2013-07-16

    申请号:US12544998

    申请日:2009-08-20

    IPC分类号: B44C1/22

    CPC分类号: G11B5/855 Y10T29/49048

    摘要: A method for forming a write pole comprises forming a stop layer over a substrate layer of a wafer, the stop layer having an opening above a damascene trench in the substrate layer, and forming a buffer layer over the stop layer, the buffer layer having an opening above the opening of the stop layer. The method further comprises plating a layer of magnetic material over the wafer, disposing a first sacrificial material over a region of the magnetic material above the damascene trench, performing a milling or etching operation over the wafer to remove the magnetic material not covered by the first sacrificial material and to remove the first sacrificial material, disposing a second sacrificial material over the wafer, and performing a polishing operation over the wafer to remove the region of the magnetic material above the damascene trench, the second sacrificial material, and the buffer layer.

    摘要翻译: 用于形成写极的方法包括在晶片的衬底层上形成阻挡层,所述阻挡层在衬底层中具有在镶嵌沟槽上方的开口,以及在停止层上形成缓冲层,所述缓冲层具有 在停止层的开口上方开口。 该方法还包括在晶片上镀覆一层磁性材料,在金刚石沟槽上方的磁性材料的区域上设置第一牺牲材料,在晶片上进行研磨或蚀刻操作,以去除第一 牺牲材料并且去除第一牺牲材料,在晶片上设置第二牺牲材料,以及在晶片上执行抛光操作以去除镶嵌沟槽,第二牺牲材料和缓冲层之上的磁性材料的区域。

    PROCESS FOR FABRICATING A MAGNETIC POLE AND SHIELDS
    5.
    发明申请
    PROCESS FOR FABRICATING A MAGNETIC POLE AND SHIELDS 有权
    制造磁性和石英的方法

    公开(公告)号:US20120304454A1

    公开(公告)日:2012-12-06

    申请号:US13154191

    申请日:2011-06-06

    IPC分类号: G11B5/127

    摘要: A process for fabricating a magnetic recording transducer for use in a data storage system comprises providing a substrate, an underlayer and a first nonmagnetic intermediate layer deposited to a first thickness on and in contact with the underlayer, performing a first scanning polishing on a first section of the first intermediate layer to planarize the first section of the first intermediate layer to a second thickness, providing a main pole in the planarized first section of the first intermediate layer, providing a first pattern of photoresist on and in contact with the first section of the first intermediate layer, the pattern comprising an aperture to define a side shield trench, performing a wet etch to remove at least a portion of the first intermediate layer thereby exposing at least one of the plurality of main pole sides, and depositing side shield material in the side shield trench.

    摘要翻译: 一种用于制造用于数据存储系统的磁记录传感器的方法包括提供在底层上沉积到第一厚度并与底层接触的基底,底层和第一非磁性中间层,在第一部分上进行第一扫描抛光 将所述第一中间层的第一部分平坦化为第二厚度,在所述第一中间层的平坦化的第一部分中提供主极,在所述第一中间层的所述第一部分的第一部分上提供第一图案, 第一中间层,图案包括用于限定侧屏蔽沟槽的孔,执行湿蚀刻以去除第一中间层的至少一部分,从而暴露多个主极侧中的至少一个,以及沉积侧屏蔽材料 在侧盾沟。

    DAMASCENE WRITE POLES PRODUCED VIA FULL FILM PLATING
    6.
    发明申请
    DAMASCENE WRITE POLES PRODUCED VIA FULL FILM PLATING 失效
    大容量写波长通过全电镀

    公开(公告)号:US20110042349A1

    公开(公告)日:2011-02-24

    申请号:US12544998

    申请日:2009-08-20

    IPC分类号: B44C1/22 B05D5/12

    CPC分类号: G11B5/855 Y10T29/49048

    摘要: A method for forming a write pole comprises forming a stop layer over a substrate layer of a wafer, the stop layer having an opening above a damascene trench in the substrate layer, and forming a buffer layer over the stop layer, the buffer layer having an opening above the opening of the stop layer. The method further comprises plating a layer of magnetic material over the wafer, disposing a first sacrificial material over a region of the magnetic material above the damascene trench, performing a milling or etching operation over the wafer to remove the magnetic material not covered by the first sacrificial material and to remove the first sacrificial material, disposing a second sacrificial material over the wafer, and performing a polishing operation over the wafer to remove the region of the magnetic material above the damascene trench, the second sacrificial material, and the buffer layer.

    摘要翻译: 用于形成写极的方法包括在晶片的衬底层上形成阻挡层,所述阻挡层在衬底层中具有在镶嵌沟槽上方的开口,以及在停止层上形成缓冲层,所述缓冲层具有 在停止层的开口上方开口。 该方法还包括在晶片上镀覆一层磁性材料,在金刚石沟槽上方的磁性材料的区域上设置第一牺牲材料,在晶片上进行研磨或蚀刻操作,以去除第一 牺牲材料并且去除第一牺牲材料,在晶片上设置第二牺牲材料,以及在晶片上执行抛光操作以去除镶嵌沟槽,第二牺牲材料和缓冲层之上的磁性材料的区域。

    Method for fabricating a read sensor for a read transducer
    7.
    发明授权
    Method for fabricating a read sensor for a read transducer 失效
    读取传感器的读取传感器的制造方法

    公开(公告)号:US08607438B1

    公开(公告)日:2013-12-17

    申请号:US13309357

    申请日:2011-12-01

    IPC分类号: G11B5/127 H04R31/00

    摘要: A read sensor for a transducer is fabricated. The transducer has a field region and a sensor region corresponding to the sensor. A sensor stack is deposited. A hybrid mask including hard and field masks is provided. The hard mask includes a sensor portion covering the sensor region and a field portion covering the field region. The field mask covers the field portion of the hard mask. The field mask exposes the sensor portion of the hard mask and part of the sensor stack between the sensor and field regions. The sensor is defined from the sensor stack in a track width direction. Hard bias layer(s) are deposited. Part of the hard bias layer(s) resides on the field mask. Part of the hard bias layer(s) adjoining the sensor region is sealed. The field mask is lifted off. The transducer is planarized.

    摘要翻译: 制造用于换能器的读取传感器。 传感器具有对应于传感器的场区域和传感器区域。 传感器堆叠被沉积。 提供了包括硬掩模和磁场掩模的混合掩模。 硬掩模包括覆盖传感器区域的传感器部分和覆盖场区域的场部分。 场掩模覆盖硬掩模的场部分。 场掩模将传感器和场区域之间的硬掩模的传感器部分和传感器堆叠的一部分暴露。 传感器从传感器堆叠在轨道宽度方向上定义。 硬偏置层被沉积。 硬偏置层的一部分位于场掩模上。 邻近传感器区域的一部分硬偏压层被密封。 场地面罩被提起。 传感器平坦化。

    Method and system for providing a magnetic recording pole having a dual sidewall angle
    8.
    发明授权
    Method and system for providing a magnetic recording pole having a dual sidewall angle 有权
    用于提供具有双重侧壁角的磁记录极的方法和系统

    公开(公告)号:US08563146B1

    公开(公告)日:2013-10-22

    申请号:US13169710

    申请日:2011-06-27

    IPC分类号: G11B5/33

    摘要: A method for fabricating a magnetic transducer having an air-bearing surface (ABS). An underlayer having a first and second regions and a bevel connecting these regions is provided. The first region is thicker and closer to the ABS than the second region. An intermediate layer conformal with the underlayer is provided. A hard mask layer having a top surface perpendicular to the ABS is formed on the intermediate layer. Part of the hard mask and intermediate layers are removed to provide a trench. The trench has a bottom surface and sidewalls having a first angle between the bottom surface and the intermediate layer and a second angle corresponding to the hard mask layer. A pole is provided in the trench. The pole has a pole tip, a yoke distal, and a bottom bevel. At least the yoke includes sidewalls having sidewall angles corresponding to the first and second angles.

    摘要翻译: 一种制造具有空气轴承表面(ABS)的磁换能器的方法。 提供具有第一和第二区域的底层以及连接这些区域的斜面。 第一区域比第二区域更厚且更接近ABS。 提供与底层共形的中间层。 在中间层上形成具有垂直于ABS的顶表面的硬掩模层。 除去硬掩模和中间层的一部分以提供沟槽。 沟槽具有底表面和在底表面和中间层之间具有第一角度的侧壁和对应于硬掩模层的第二角度。 在沟槽中设置一个极点。 杆具有极尖,轭远端和底斜面。 至少轭包括具有对应于第一和第二角度的侧壁角的侧壁。

    Method and system for manufacturing tapered waveguide structures in an energy assisted magnetic recording head
    10.
    发明授权
    Method and system for manufacturing tapered waveguide structures in an energy assisted magnetic recording head 有权
    在能量辅助磁记录头中制造锥形波导结构的方法和系统

    公开(公告)号:US08790527B1

    公开(公告)日:2014-07-29

    申请号:US13069023

    申请日:2011-03-22

    CPC分类号: B29D11/00663

    摘要: A method for providing waveguide structures for an energy assisted magnetic recording (EAMR) transducer is described. The waveguide structures have a plurality of widths. At least one waveguide layer is provided. Mask structure(s) corresponding to the waveguide structures and having a pattern are provided on the waveguide layer(s). The mask structure(s) include a planarization stop layer, a planarization assist layer on the planarization stop layer, and a hard mask layer on the planarization assist layer. The planarization assist layer has a low density. The pattern of the mask structure(s) is transferred to the waveguide layer(s). Optical material(s) that cover the waveguide layer(s) and a remaining portion of the mask structure(s) are provided. The optical material(s) have a density that is at least twice the low density of the planarization assist layer. The method also includes performing a planarization configured to remove at least a portion of the optical material(s).

    摘要翻译: 描述了一种用于提供能量辅助磁记录(EAMR)换能器的波导结构的方法。 波导结构具有多个宽度。 提供至少一个波导层。 对应于波导结构并具有图案的掩模结构设置在波导层上。 掩模结构包括平坦化停止层,平坦化停止层上的平坦化辅助层和平坦化辅助层上的硬掩模层。 平坦化助剂层具有低密度。 掩模结构的图案被传送到波导层。 提供了覆盖波导层和掩模结构的剩余部分的光学材料。 光学材料的密度至少是平坦化辅助层的低密度的两倍。 该方法还包括执行被配置为去除至少一部分光学材料的平坦化。