公开(公告)号：US5976636A

公开(公告)日：1999-11-02

申请号：US45103

申请日：1998-03-19

申请人： Ming-Sheng Leu ,  Wei-Cheng Lih ,  Yuh-Wen Lee ,  Shau-Yi Chen ,  Wei-Jieh Chang ,  Shinn-Cherng Huang ,  Mau-Shen Liou

发明人： Ming-Sheng Leu ,  Wei-Cheng Lih ,  Yuh-Wen Lee ,  Shau-Yi Chen ,  Wei-Jieh Chang ,  Shinn-Cherng Huang ,  Mau-Shen Liou

IPC分类号： C23C14/32 ,  H05H1/50 ,  C23C14/14 ,  C23C14/00

CPC分类号： C23C14/325 ,  H05H1/50

摘要： An electric arc ion plating apparatus to coat a metal material on an object includes: (a) an vacuum chamber; (b) an electric arc bombardment chamber in the vacuum chamber, comprising an anode, a cathode target, and an arc triggering electrode to generate metal particles when a voltage is applied on the anode and the cathode, and on the arc triggering electrode; and (c) a magnetic coil having a longitudinal axis. The magnetic coil emanates from the electric arc bombardment chamber and encloses at least a part of the electric bombardment chamber. The magnetic coil contains a constant-diameter section enclosing and immediately emanating from the electric arc bombardment chamber to guide the metal particles away from the cathode and toward the object, and a varying-diameter section away from the electric arc bombardment chamber to provide optimum distribution of the metal particles before they reach the object surface. The varying-diameter section can be a diverging section for effectively coating relatively large objects, or a converging section for efficiently coating a relatively small object.

摘要翻译： 用于在物体上涂覆金属材料的电弧离子镀装置包括：（a）真空室; （b）真空室中的电弧轰击室，当在阳极和阴极上施加电压时，包括阳极，阴极靶和电弧触发电极以产生金属颗粒;以及电弧触发电极; 和（c）具有纵向轴线的电磁线圈。 电磁线圈从电弧轰击室发出并且包围电轰击室的至少一部分。 磁性线圈包含恒定直径部分，其包围并立即从电弧轰击室发出，以引导金属颗粒远离阴极并朝向物体，以及远离电弧轰击室的变化直径部分以提供最佳分布 的金属颗粒在它们到达物体表面之前。 变径部分可以是用于有效地涂覆较大物体的发散部分或用于有效地涂覆较小物体的会聚部分。