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153 条记录 (耗时 0.036 秒)

    APPARATUS AND METHOD FOR PRODUCING A PLASMA, AND USE OF SUCH AN APPARATUS
    2.
    发明申请
    APPARATUS AND METHOD FOR PRODUCING A PLASMA, AND USE OF SUCH AN APPARATUS 审中-公开

    公开(公告)号：US20180228933A1

    公开(公告)日：2018-08-16

    申请号：US15750372

    申请日：2016-07-25

    申请人： terraplasma GmbH

    发明人： Gregor Morfill ,  Yangfang Li ,  Tetsuji Shimizu ,  Bernd Steffes

    IPC分类号： A61L9/22 ,  H05H1/50 ,  B08B7/00 ,  B08B3/14 ,  C02F1/30 ,  B01D53/00

    CPC分类号： A61L9/22 ,  A61L2/14 ,  A61L2202/11 ,  B01D53/007 ,  B01D2259/818 ,  B08B3/14 ,  B08B7/0035 ,  C02F1/30 ,  C02F2303/04 ,  H05H1/50

    摘要： The invention relates to an apparatus (1) for producing a plasma, having at least one first electrode (3), at least one second electrode (5), which is arranged at a distance from the first electrode (3), a voltage source (7), which is connected to at least one electrode (3,59) selected from the first electrode (3) and the second electrode (5) such that a potential difference between the at least one first electrode (3) and the at least one second electrode (5) can be produced by the voltage source (7), wherein the at least one first electrode (3) and the at least one second electrode (5) define at least one discharge path (9) for an electrical discharge in a discharge region (11) between the at least one first electrode (3) and the at least one second electrode (5). In this case, a magnetic field arrangement (15) is provided that is set up and arranged relative to the at least one first electrode (3) and the at least one second electrode (5), to provide a magnetic field in the discharge region (11), so that a magnetic field vector (B) of the magnetic field is oriented at an angle to the discharge path (9).

    Electrode assemblies, plasma generating apparatuses, and methods for generating plasma
    4.
    发明授权
    Electrode assemblies, plasma generating apparatuses, and methods for generating plasma 有权

    公开(公告)号：US09997322B2

    公开(公告)日：2018-06-12

    申请号：US13943137

    申请日：2013-07-16

    申请人： Battelle Energy Alliance, LLC

    发明人： Peter C. Kong ,  Jon D. Grandy ,  Brent A. Detering ,  Larry D. Zuck

    IPC分类号： B23K9/00 ,  H01J1/02 ,  H05H1/50 ,  H05H7/00

    CPC分类号： H01J1/02 ,  H05H1/50 ,  H05H7/00

    摘要： Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode.

    Method and device for transporting vacuum arc plasma
    6.
    发明授权
    Method and device for transporting vacuum arc plasma 有权
    用于输送真空电弧等离子体的方法和装置

    公开(公告)号：US09035552B2

    公开(公告)日：2015-05-19

    申请号：US13877708

    申请日：2011-10-31

    申请人： Volodymyr Vasilievich Vasyliev ,  Volodymyr Evgenievich Strelnytskiy

    发明人： Volodymyr Vasilievich Vasyliev ,  Volodymyr Evgenievich Strelnytskiy

    IPC分类号： H05H1/48 ,  C23C14/32 ,  H01J27/14 ,  H01J37/32

    CPC分类号： H05H1/48 ,  C23C14/325 ,  H01J27/14 ,  H01J37/32055 ,  H01J37/3266 ,  H05H1/50

    摘要： The proposed method allows forming cathode arc plasma flows for high quality coatings. The plasma flows are transported in a plasma-optical system by means of a transport magnetic field generated by electromagnetic coils, super-positioning a constant magnetic field and additional variable magnetic fields deflecting the plasma flows from internal surfaces of the system's elements. In a device for implementing the proposed method, an arc power supply is connected to an anode via a coil, surrounding the anode. In a linear embodiment of the system, an electrically conductive tube section inside the anode is connected to one end of the deflection coil. The other end is connected to the positive terminal of power supply. In the system's non-linear embodiment, additional magnetic fields are established using two additional electromagnetic coils, surrounding the anode and a nonlinear part respectively. The method and device allow for a significantly reduction of losses of macroparticle-free plasma.

    摘要翻译： 所提出的方法允许形成用于高质量涂层的阴极电弧等离子体流。 等离子体流在等离子体光学系统中通过由电磁线圈产生的传输磁场传输，超定位恒定磁场和从系统元件的内表面偏转等离子体流的附加可变磁场。 在用于实现所提出的方法的装置中，电弧电源通过围绕阳极的线圈连接到阳极。 在系统的线性实施例中，阳极内部的导电管部分连接到偏转线圈的一端。 另一端连接电源正极。 在系统的非线性实施例中，使用分别围绕阳极和非线性部分的两个额外的电磁线圈来建立额外的磁场。 该方法和装置允许显着减少无大颗粒等离子体的损失。

    Device And Method For Quick Closing Of An Electric Circuit And A Use Of The Device
    9.
    发明申请
    Device And Method For Quick Closing Of An Electric Circuit And A Use Of The Device 有权
    电路快速闭合的装置和方法以及装置的使用

    公开(公告)号：US20140055035A1

    公开(公告)日：2014-02-27

    申请号：US14071002

    申请日：2013-11-04

    申请人： Ola Jeppsson ,  Lars Paulsson

    发明人： Ola Jeppsson ,  Lars Paulsson

    IPC分类号： H05H1/48 ,  H05H1/50

    CPC分类号： H05H1/48 ,  H01T2/02 ,  H05H1/50

    摘要： A device for quick closing of an electric circuit having a main spark gap with main electrodes and a triggering device. The triggering device has an auxiliary spark gap with auxiliary electrodes for igniting an arc in the main spark gap. The auxiliary electrodes are shielded from the main spark gap by a shielding unit having channel means extending therethrough from an auxiliary spark gap facing side to a main spark gap facing side of the shielding unit. The device further includes a nozzle with a first end being most close to the auxiliary spark gap and a second end most close to the main spark gap. The first end has an inlet opening that is in connection with the channel means and the second end has an outlet opening. The invention also relates to a corresponding method and to a use of the device.

    摘要翻译： 一种用于快速关闭具有主电极的主火花隙的电路和触发装置的装置。 触发装置具有用于点燃主火花隙中的电弧的辅助电极的辅助火花隙。 辅助电极通过屏蔽单元屏蔽，该屏蔽单元具有从辅助火花间隙侧向屏蔽单元的主火花间隙侧延伸穿过的通道装置。 该装置还包括具有最靠近辅助火花间隙的第一端和最靠近主火花间隙的第二端的喷嘴。 第一端具有与通道装置连接的入口开口，第二端具有出口开口。 本发明还涉及相应的方法和该装置的用途。

    Method for Producing Plasma Flow, Method for Plasma Processing, Apparatus for Producing Plasma, and Apparatus for Plasma Processing
    10.
    发明申请
    Method for Producing Plasma Flow, Method for Plasma Processing, Apparatus for Producing Plasma, and Apparatus for Plasma Processing 有权
    制造等离子体流动的方法，等离子体处理方法，等离子体制造装置和等离子体处理装置

    公开(公告)号：US20130034668A1

    公开(公告)日：2013-02-07

    申请号：US13642442

    申请日：2011-04-20

    申请人： Keisuke Sagisaka ,  Yoshifumi Noguchi

    发明人： Keisuke Sagisaka ,  Yoshifumi Noguchi

    IPC分类号： H05H1/50 ,  C23C16/50

    CPC分类号： H05H1/50 ,  C23C14/325 ,  H01J37/32055 ,  H01J37/3402

    摘要： Provided are a plasma stream generation method, a plasma processing method, a plasma generation apparatus, and a plasma processing apparatus using same, which enable plasma processing with rotating plasma to be controllably performed with stability and thereby improved in quality. The frequencies in four quadrants Z1-Z4 are set at 7, 15, 6, and 20 Hz, respectively. This frequency variability can realize different rotational velocity of plasma in the four-portion partitioned rotational angle regions. The rotational velocities of plasmas P2, P4 are greater than those of plasmas P1, P3. Thus, the rotating plasma, which rotates at a periodically varied rotational velocity as plasma P1, plasma P2, plasma P3, and plasma P4 in that order while traveling in a circular orbit C, can be used for irradiation therewith, thereby performing uniform film formation treatment in first quadrant Z1 to fourth quadrant Z4.

    摘要翻译： 提供了使等离子体产生方法，等离子体处理方法，等离子体产生装置和使用该等离子体处理装置的等离子体处理装置能够稳定地控制地进行旋转等离子体的等离子体处理，从而提高了质量。 四个象限Z1-Z4中的频率分别设定为7,15,6和20 Hz。 该频率变化性可以实现四部分分割旋转角区域中等离子体的不同旋转速度。 等离子体P2，P4的旋转速度大于等离子体P1，P3的旋转速度。 因此，可以使用沿圆周轨道C行进时以等离子体P1，等离子体P2，等离子体P3，等离子体P4等周期性变化的旋转速度旋转的旋转等离子体进行照射，从而进行均匀的成膜 在第一象限Z1到第四象限Z4中的处理。