公开(公告)号：US07982192B2

公开(公告)日：2011-07-19

申请号：US12106735

申请日：2008-04-21

申请人： Mitsukuni Tsukihara ,  Mitsuaki Kabasawa ,  Hiroshi Matsushita ,  Takanori Yagita ,  Yoshitaka Amano ,  Yoshito Fujii

发明人： Mitsukuni Tsukihara ,  Mitsuaki Kabasawa ,  Hiroshi Matsushita ,  Takanori Yagita ,  Yoshitaka Amano ,  Yoshito Fujii

IPC分类号： H01J37/317

CPC分类号： H01J37/3171 ,  H01J37/1477 ,  H01J2237/0042 ,  H01J2237/028

摘要： In a beam processing apparatus including a beam scanner having a two electrodes type deflection scanning electrode, the beam scanner further includes shielding suppression electrode assemblies respectively at vicinities of upstream side and downstream side of the two electrodes type deflection scanning electrode and having openings in a rectangular shape for passing a charged particle beam. Each of the shielding suppression electrode assemblies is an assembly electrode comprising one sheet of a suppression electrode and two sheets of shielding ground electrodes interposing the suppression electrode. A total of front side portions and rear side portions of the two electrodes type deflection scanning electrode is shielded by the two sheets of shielding ground electrodes.

摘要翻译： 在包括具有两电极型偏转扫描电极的光束扫描器的光束处理装置中，光束扫描器还包括分别在两电极型偏转扫描电极的上游侧和下游侧的附近的屏蔽抑制电极组件，并具有矩形的开口 用于通过带电粒子束的形状。 每个屏蔽抑制电极组件是包括一片抑制电极和插入抑制电极的两片屏蔽接地电极的组装电极。 两电极型偏转扫描电极的前侧部分和后侧部分被两片屏蔽接地电极屏蔽。

公开(公告)号：US20080258074A1

公开(公告)日：2008-10-23

申请号：US12106735

申请日：2008-04-21

申请人： Mitsukuni TSUKIHARA ,  Mitsuaki Kabasawa ,  Hiroshi Matsushita ,  Takanori Yagita ,  Yoshitaka Amano ,  Yoshito Fujii

发明人： Mitsukuni TSUKIHARA ,  Mitsuaki Kabasawa ,  Hiroshi Matsushita ,  Takanori Yagita ,  Yoshitaka Amano ,  Yoshito Fujii

IPC分类号： H01J3/30

CPC分类号： H01J37/3171 ,  H01J37/1477 ,  H01J2237/0042 ,  H01J2237/028

摘要： In a beam processing apparatus including a beam scanner having a two electrodes type deflection scanning electrode, the beam scanner further includes shielding suppression electrode assemblies respectively at vicinities of upstream side and downstream side of the two electrodes type deflection scanning electrode and having openings in a rectangular shape for passing a charged particle beam. Each of the shielding suppression electrode assemblies is an assembly electrode comprising one sheet of a suppression electrode and two sheets of shielding ground electrodes interposing the suppression electrode. A total of front side portions and rear side portions of the two electrodes type deflection scanning electrode is shielded by the two sheets of shielding ground electrodes.

摘要翻译： 在包括具有两电极型偏转扫描电极的光束扫描器的光束处理装置中，光束扫描器还包括分别在两电极型偏转扫描电极的上游侧和下游侧的附近的屏蔽抑制电极组件，并具有矩形的开口 用于通过带电粒子束的形状。 每个屏蔽抑制电极组件是包括一片抑制电极和插入抑制电极的两片屏蔽接地电极的组装电极。 两电极型偏转扫描电极的前侧部分和后侧部分被两片屏蔽接地电极屏蔽。

公开(公告)号：US07755067B2

公开(公告)日：2010-07-13

申请号：US12100861

申请日：2008-04-10

申请人： Mitsukuni Tsukihara ,  Takanori Yagita ,  Yoshitaka Amano ,  Mitsuaki Kabasawa

发明人： Mitsukuni Tsukihara ,  Takanori Yagita ,  Yoshitaka Amano ,  Mitsuaki Kabasawa

IPC分类号： H01J37/317 ,  H01J37/256 ,  H01L21/265 ,  G21K1/08

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/304 ,  H01J2237/30477

摘要： An ion implantation apparatus reciprocally scans an ion beam extracted from an ion source and passed through a mass analysis magnet apparatus and a mass analysis slit and irradiates to a wafer. The ion beam is converged and shaped by providing a first quadrupole vertical focusing electromagnet at a section of a beam line from an outlet of the mass analysis magnet apparatus before incidence of the mass analysis slit and providing a second quadrupole vertical focusing electromagnet having an effective magnetic field effect larger than that of the first quadrupole focusing electromagnet at a section of the beam line from an outlet of the mass analysis slit before incidence on the beam scanner.

摘要翻译： 离子注入装置相互扫描从离子源提取的离子束并通过质量分析磁体装置和质量分析狭缝并照射到晶片。 通过在质量分析用狭缝入射之前从质量分析磁体装置的出口在梁线的一部分处设置第一四极杆垂直聚焦电磁体并提供具有有效磁性的第二四极杆垂直聚焦电磁体，离子束会聚并成形 在光束扫描器上入射之前，在质量分析狭缝的出口处的光束线的一部分处的第一四极聚焦电磁体的场效应大于第一四极聚焦电磁体。

公开(公告)号：US20080251734A1

公开(公告)日：2008-10-16

申请号：US12100861

申请日：2008-04-10

申请人： Mitsukuni Tsukihara ,  Takanori Yagita ,  Yoshitaka Amano ,  Mitsuaki Kabasawa

发明人： Mitsukuni Tsukihara ,  Takanori Yagita ,  Yoshitaka Amano ,  Mitsuaki Kabasawa

IPC分类号： G21K1/08

CPC分类号： H01J37/3171 ,  H01J37/05 ,  H01J37/304 ,  H01J2237/30477

摘要： An ion implantation apparatus reciprocally scans an ion beam extracted from an ion source and passed through a mass analysis magnet apparatus and a mass analysis slit and irradiates to a wafer. The ion beam is converged and shaped by providing a first quadrupole vertical focusing electromagnet at a section of a beam line from an outlet of the mass analysis magnet apparatus before incidence of the mass analysis slit and providing a second quadrupole vertical focusing electromagnet having an effective magnetic field effect larger than that of the first quadrupole focusing electromagnet at a section of the beam line from an outlet of the mass analysis slit before incidence on the beam scanner.

摘要翻译： 离子注入装置相互扫描从离子源提取的离子束并通过质量分析磁体装置和质量分析狭缝并照射到晶片。 通过在质量分析用狭缝入射之前从质量分析磁体装置的出口在梁线的一部分处设置第一四极杆垂直聚焦电磁体并提供具有有效磁性的第二四极杆垂直聚焦电磁体，离子束会聚并成形 在光束扫描器上入射之前，在质量分析狭缝的出口处的光束线的一部分处的第一四极聚焦电磁体的场效应大于第一四极聚焦电磁体。

公开(公告)号：US20060113490A1

公开(公告)日：2006-06-01

申请号：US11139490

申请日：2005-05-31

申请人： Hiroshi Matsushita ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Yasuhiko Kimura ,  Mitsukuni Tsukihara ,  Junichi Murakami

发明人： Hiroshi Matsushita ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Yasuhiko Kimura ,  Mitsukuni Tsukihara ,  Junichi Murakami

IPC分类号： H01J37/317 ,  H01J37/147

CPC分类号： H01J37/1477 ,  H01J37/3171

摘要： A beam deflector for scanning performs deflecting of a charged particle beam having a regular trajectory in a vacuum space to thereby periodically change the trajectory of the charged particle beam. The beam deflector comprises a pair of deflection electrodes disposed so as to confront each inner electrode surface having a symmetrical concave extending in a direction of a beam trajectory.

公开(公告)号：US06797968B2

公开(公告)日：2004-09-28

申请号：US10329560

申请日：2002-12-27

申请人： Mitsukuni Tsukihara ,  Yoshitaka Amano ,  Mitsuaki Kabasawa ,  Michiro Sugitani ,  Hiroki Murooka ,  Hiroshi Matsushita

发明人： Mitsukuni Tsukihara ,  Yoshitaka Amano ,  Mitsuaki Kabasawa ,  Michiro Sugitani ,  Hiroki Murooka ,  Hiroshi Matsushita

IPC分类号： H01J3708

CPC分类号： H01J37/3171 ,  H01J37/3007

摘要： An ion beam processing apparatus comprises a beam line vacuum chamber from an ion source to a processing chamber. The apparatus further comprises a beam line structure for transporting ion beam from the ion source through the beam line vacuum chamber to the processing chamber. A mass analysis magnet unit is arranged from the outside in a partial section of the beam line vacuum chamber. An effective magnetic field area of the mass analysis magnet unit is disposed in a partial section of the beam line structure. Continuous cusp field forming magnet apparatuses are arranged at the series of beam line vacuum chamber part of the beam line structure to confine ion beam by forming continuous cusp fields.

摘要翻译： 离子束处理装置包括从离子源到处理室的束线真空室。 该装置还包括用于将来自离子源的离子束通过束线真空室输送到处理室的束线结构。 在束线真空室的部分部分中从外部布置质量分析磁体单元。 质量分析磁体单元的有效磁场面积设置在束线结构的局部剖面中。 连续尖点场形成磁体装置布置在束线结构的束线真空室系列的一部分中，以通过形成连续尖点场来限制离子束。

公开(公告)号：US07687782B2

公开(公告)日：2010-03-30

申请号：US11806127

申请日：2007-05-30

申请人： Mitsukuni Tsukihara ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Hiroshi Matsushita

发明人： Mitsukuni Tsukihara ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Hiroshi Matsushita

IPC分类号： G21K1/087 ,  H01J3/18

CPC分类号： H01J37/153 ,  H01J37/1477 ,  H01J37/3171 ,  H01J2237/30477

摘要： A beam deflection scanner performs reciprocating deflection scanning with an ion beam or a charged particle beam to thereby periodically change a beam trajectory and comprises a pair of scanning electrodes installed so as to be opposed to each other with the beam trajectory interposed therebetween and a pair of correction electrodes installed in a direction perpendicular to an opposing direction of the pair of scanning electrodes, with the beam trajectory interposed therebetween, and extending along a beam traveling axis. Positive and negative potentials are alternately applied to the pair of scanning electrodes, while a correction voltage is constantly applied to the pair of correction electrodes. A correction electric field produced by the pair of correction electrodes is exerted on the ion beam or the charged particle beam passing between the pair of scanning electrodes at the time of switching between the positive and negative potentials.

摘要翻译： 光束偏转扫描器用离子束或带电粒子束进行往复偏转扫描，从而周期性地改变光束轨迹，并且包括一对扫描电极，其被安装成彼此相对，并且光束轨迹插入其间， 校正电极，其安装在垂直于该对扫描电极的相反方向的方向上，其中光束轨迹插入其间，并且沿着光束移动轴线延伸。 正电位和负电位交替施加到该对扫描电极，同时校正电压不断地施加到该对校正电极。 在正电位和负电位之间切换时，由一对校正电极产生的校正电场施加在通过该对扫描电极的离子束或带电粒子束之间。

公开(公告)号：US20080067404A1

公开(公告)日：2008-03-20

申请号：US11806127

申请日：2007-05-30

申请人： Mitsukuni Tsukihara ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Hiroshi Matsushita

发明人： Mitsukuni Tsukihara ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Hiroshi Matsushita

IPC分类号： H01J3/14

CPC分类号： H01J37/153 ,  H01J37/1477 ,  H01J37/3171 ,  H01J2237/30477

摘要： A beam deflection scanner performs reciprocating deflection scanning with an ion beam or a charged particle beam to thereby periodically change a beam trajectory and comprises a pair of scanning electrodes installed so as to be opposed to each other with the beam trajectory interposed therebetween and a pair of correction electrodes installed in a direction perpendicular to an opposing direction of the pair of scanning electrodes, with the beam trajectory interposed therebetween, and extending along a beam traveling axis. Positive and negative potentials are alternately applied to the pair of scanning electrodes, while a correction voltage is constantly applied to the pair of correction electrodes. A correction electric field produced by the pair of correction electrodes is exerted on the ion beam or the charged particle beam passing between the pair of scanning electrodes at the time of switching between the positive and negative potentials.

摘要翻译： 光束偏转扫描器用离子束或带电粒子束进行往复偏转扫描，从而周期性地改变光束轨迹，并且包括一对扫描电极，其被安装成彼此相对，并且光束轨迹插入其间， 校正电极，其安装在垂直于该对扫描电极的相反方向的方向上，其中光束轨迹插入其间，并且沿着光束移动轴线延伸。 正电位和负电位交替施加到该对扫描电极，同时校正电压不断地施加到该对校正电极。 在正电位和负电位之间切换时，由一对校正电极产生的校正电场施加在通过该对扫描电极的离子束或带电粒子束之间。

公开(公告)号：US07138641B2

公开(公告)日：2006-11-21

申请号：US11139490

申请日：2005-05-31

申请人： Hiroshi Matsushita ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Yasuhiko Kimura ,  Mitsukuni Tsukihara ,  Junichi Murakami

发明人： Hiroshi Matsushita ,  Mitsuaki Kabasawa ,  Yoshitaka Amano ,  Yasuhiko Kimura ,  Mitsukuni Tsukihara ,  Junichi Murakami

IPC分类号： G01N23/00 ,  G21K7/00 ,  G21G5/00

CPC分类号： H01J37/1477 ,  H01J37/3171

摘要： A beam deflector for scanning performs deflecting of a charged particle beam having a regular trajectory in a vacuum space to thereby periodically change the trajectory of the charged particle beam. The beam deflector comprises a pair of deflection electrodes disposed so as to confront each inner electrode surface having a symmetrical concave extending in a direction of a beam trajectory.

摘要翻译： 用于扫描的光束偏转器执行在真空空间中具有规则轨迹的带电粒子束的偏转，从而周期性地改变带电粒子束的轨迹。 光束偏转器包括一对偏转电极，其设置成面对每个内电极表面，其具有沿光束轨迹的方向延伸的对称凹部。

公开(公告)号：US07276711B2

公开(公告)日：2007-10-02

申请号：US11150273

申请日：2005-06-13

申请人： Hiroshi Kawaguchi ,  Takanori Yagita ,  Takashi Nishi ,  Junichi Murakami ,  Mitsukuni Tsukihara ,  Mitsuaki Kabasawa

发明人： Hiroshi Kawaguchi ,  Takanori Yagita ,  Takashi Nishi ,  Junichi Murakami ,  Mitsukuni Tsukihara ,  Mitsuaki Kabasawa

IPC分类号： H01J37/317

CPC分类号： H01J37/026 ,  H01J37/3171

摘要： A beam space-charge compensation device is applied to an angular energy filter provided in an ion beam processing system that performs processing by irradiating onto a wafer with an ion beam. The beam space-charge compensation device comprises a plasma shower provided in a beam-guiding chamber of the angular energy filter. The plasma shower comprises an arc chamber having a filament for generating thermo-electrons for plasma. The arc chamber comprises an extraction hole for extracting the thermo-electrons. The plasma shower is arranged such that the extraction hole is located on lines of magnetic force, perpendicular to an ion beam advancing direction, of the magnetic field and that a center axis of the filament and a center axis of said extraction hole coincide with the lines of magnetic force, perpendicular to the ion beam advancing direction, of the magnetic field.

摘要翻译： 光束空间电荷补偿装置被应用于通过用离子束照射到晶片上进行处理的离子束处理系统中提供的角能量滤波器。 光束空间电荷补偿装置包括设置在角能量滤波器的光束引导室中的等离子体淋浴。 等离子体喷淋器包括具有用于产生等离子体的热电子的灯丝的电弧室。 电弧室包括用于提取热电子的提取孔。 等离子体淋浴器被布置成使得提取孔位于垂直于离子束行进方向的磁力线上，并且该细丝的中心轴线和所述提取孔的中心轴线与线条重合 的磁力，垂直于离子束前进方向的磁场。