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公开(公告)号:US10025202B2
公开(公告)日:2018-07-17
申请号:US15612079
申请日:2017-06-02
Applicant: Molecular Imprints, Inc.
Inventor: Roy Patterson , Christopher John Fleckenstein , Matthew S. Shafran , Charles Scott Carden , Satish Sadam , Ryan Christiansen
Abstract: Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.
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公开(公告)号:US11298856B2
公开(公告)日:2022-04-12
申请号:US15922499
申请日:2018-03-15
Applicant: Molecular Imprints, Inc.
Inventor: Chieh Chang , Christophe Peroz , Roy Matthew Patterson , Matthew S. Shafran , Christopher John Fleckenstein , Charles Scott Carden
IPC: B29C43/58 , B29C35/08 , G02B1/04 , B29C33/10 , B29C43/54 , G03F7/00 , B29L11/00 , B29C37/00 , B29C43/56
Abstract: An example system is configured to photocure a photocurable material to form a polymer film. The system includes a first chuck configured to support a first substantially planar mold, a second chuck configured to support a second substantially planar mold, and an actuable stage coupled to the first chuck and/or the second chuck. The actuable stage is configured to position the first chuck and/or the second chuck so that the first and second molds are separated by a gap. The system also includes a sensor arrangement for obtaining measurement information indicative of a distance between the first and second molds and/or a pressure between the first and second chucks at each of at least three locations. The system also includes a control module configured control the gap between the first and second molds based on the measurement information.
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公开(公告)号:US20180264691A1
公开(公告)日:2018-09-20
申请号:US15922499
申请日:2018-03-15
Applicant: Molecular Imprints, Inc.
Inventor: Chieh Chang , Christophe Peroz , Roy Matthew Patterson , Matthew S. Shafran , Christopher John Fleckenstein , Charles Scott Carden
Abstract: An example system is configured to photocure a photocurable material to form a polymer film. The system includes a first chuck configured to support a first substantially planar mold, a second chuck configured to support a second substantially planar mold, and an actuable stage coupled to the first chuck and/or the second chuck. The actuable stage is configured to position the first chuck and/or the second chuck so that the first and second molds are separated by a gap. The system also includes a sensor arrangement for obtaining measurement information indicative of a distance between the first and second molds and/or a pressure between the first and second chucks at each of at least three locations. The system also includes a control module configured control the gap between the first and second molds based on the measurement information.
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公开(公告)号:US10317806B2
公开(公告)日:2019-06-11
申请号:US16008728
申请日:2018-06-14
Applicant: Molecular Imprints, Inc.
Inventor: Roy Patterson , Christopher John Fleckenstein , Matthew S. Shafran , Charles Scott Carden , Satish Sadam , Ryan Christiansen
Abstract: Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.
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公开(公告)号:US20180292755A1
公开(公告)日:2018-10-11
申请号:US16008728
申请日:2018-06-14
Applicant: Molecular Imprints, Inc.
Inventor: Roy Patterson , Christopher John Fleckenstein , Matthew S. Shafran , Charles Scott Carden , Satish Sadam , Ryan Christiansen
CPC classification number: G03F7/707 , G03F7/0002
Abstract: Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.
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公开(公告)号:US20180031976A1
公开(公告)日:2018-02-01
申请号:US15612079
申请日:2017-06-02
Applicant: Molecular Imprints, Inc.
Inventor: Roy Patterson , Christopher John Fleckenstein , Matthew S. Shafran , Charles Scott Carden , Satish Sadam , Ryan Christiansen
CPC classification number: G03F7/707 , G03F7/0002
Abstract: Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.
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