公开(公告)号：US20070002299A1

公开(公告)日：2007-01-04

申请号：US11407210

申请日：2006-04-20

申请人： Motokatsu Imai ,  Susumu Makinouchi

发明人： Motokatsu Imai ,  Susumu Makinouchi

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.

摘要翻译： 曝光装置通过将液体供给到基板的一部分而形成浸渍区域，并通过液体在基板上形成规定的图案。 在浸渍区域的外周形成有能够将一部分液体保持在基板上的备用浸渍区域。 可以根据投影光学系统和投影光学系统的相对移动来防止投影光学系统的下表面和基板表面之间的液体从投影光学系统的下表面分离 基质。

公开(公告)号：US08272544B2

公开(公告)日：2012-09-25

申请号：US13064361

申请日：2011-03-21

申请人： Motokatsu Imai ,  Susumu Makinouchi

发明人： Motokatsu Imai ,  Susumu Makinouchi

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.

摘要翻译： 曝光装置通过将液体供给到基板的一部分而形成浸渍区域，并通过液体在基板上形成规定的图案。 在浸渍区域的外周形成有能够将一部分液体保持在基板上的备用浸渍区域。 可以根据投影光学系统和投影光学系统的相对移动来防止投影光学系统的下表面和基板表面之间的液体从投影光学系统的下表面分离 基质。

公开(公告)号：US07932996B2

公开(公告)日：2011-04-26

申请号：US11407210

申请日：2006-04-20

申请人： Motokatsu Imai ,  Susumu Makinouchi

发明人： Motokatsu Imai ,  Susumu Makinouchi

IPC分类号： G03B27/52

CPC分类号： G03F7/70341

摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.

公开(公告)号：US08797506B2

公开(公告)日：2014-08-05

申请号：US13591583

申请日：2012-08-22

申请人： Motokatsu Imai ,  Susumu Makinouchi

发明人： Motokatsu Imai ,  Susumu Makinouchi

IPC分类号： G03B27/42

CPC分类号： G03F7/70341

摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.

摘要翻译： 曝光装置通过将液体供给到基板的一部分而形成浸渍区域，并通过液体在基板上形成规定的图案。 在浸渍区域的外周形成能够将一部分液体保持在基板上的备用浸渍区域。 可以根据投影光学系统和投影光学系统的相对移动来防止投影光学系统的下表面和基板表面之间的液体从投影光学系统的下表面分离 基质。

公开(公告)号：US20110189613A1

公开(公告)日：2011-08-04

申请号：US13064361

申请日：2011-03-21

申请人： Motokatsu Imai ,  Susumu Makinouchi

发明人： Motokatsu Imai ,  Susumu Makinouchi

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： An exposure apparatus forms an immersion area by supplying a liquid onto a part of a substrate, and forms a prescribed pattern on the substrate through the liquid. A spare immersion area, which is capable of holding part of the liquid on the substrate, is formed at the outer circumference of the immersion area. It is possible to prevent the separation of the liquid, which is disposed between a lower surface of a projection optical system and a substrate surface, from the lower surface of the projection optical system in accordance with the relative movement of the projection optical system and the substrate.

摘要翻译： 曝光装置通过将液体供给到基板的一部分而形成浸渍区域，并通过液体在基板上形成规定的图案。 在浸渍区域的外周形成有能够将一部分液体保持在基板上的备用浸渍区域。 可以根据投影光学系统和投影光学系统的相对移动来防止投影光学系统的下表面和基板表面之间的液体从投影光学系统的下表面分离 基质。

公开(公告)号：US08710425B2

公开(公告)日：2014-04-29

申请号：US13090659

申请日：2011-04-20

申请人： Susumu Makinouchi ,  Akihiro Watanabe

发明人： Susumu Makinouchi ,  Akihiro Watanabe

IPC分类号： G01D5/34

CPC分类号： G01D5/38 ,  G01D5/34746

摘要： An encoder emits modulated light from a light source section and lets a first light and a second light separated from the modulated light interfere with each other in a moving grating. In the encoder, the light emitted from the light source section is electrically modulated, and the first light and the second light have different light path lengths.

摘要翻译： 编码器发射来自光源部分的调制光，并使得与调制光分离的第一光和第二光在移动光栅中相互干扰。 在编码器中，从光源部发射的光被电调制，第一光和第二光具有不同的光路长度。

公开(公告)号：US08208128B2

公开(公告)日：2012-06-26

申请号：US12366934

申请日：2009-02-06

申请人： Susumu Makinouchi

发明人： Susumu Makinouchi

IPC分类号： G01B11/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

CPC分类号： G01D5/34746 ,  G01D5/38 ,  G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

摘要： A mirror block on which moving gratings are arranged is fixed to the lower surface of a stage. Fixed gratings are placed on the upper surface of a stage platform that is opposed to the lower surface of the stage. A Y encoder that measures Y positional information of the stage is configured including the moving gratings and the fixed gratings. Similarly, an X encoder that measures X positional information of the stage is configured including the moving gratings and the fixed grating.

摘要翻译： 安置有移动光栅的镜块固定在舞台的下表面。 固定光栅放置在与平台的下表面相对的平台平台的上表面上。 测量台的Y位置信息的Y编码器被配置为包括移动光栅和固定光栅。 类似地，测量台阶X的位置信息的X编码器被配置成包括移动光栅和固定光栅。

公开(公告)号：US07601947B2

公开(公告)日：2009-10-13

申请号：US11798255

申请日：2007-05-11

申请人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

发明人： Susumu Makinouchi ,  Toru Imai ,  Akihiro Watanabe

IPC分类号： G01B9/02

CPC分类号： G01D5/38

摘要： When an incident light is obliquely incident on an index scale, the optical path length of light A becomes longer than the optical path length of light B and an optical path length difference occurs, which causes a phase difference in both of the diffracted lights incident on a photodetection element. According to the phase difference, intensity of a photoelectric detection signal output from the photodetection element changes. That is, due to a periodic change in the incident angle of the incident light, the phase difference between light A and light B is modulated, and the interference signal becomes greatly modulated.

摘要翻译： 当入射光倾斜地入射到指数刻度上时，光A的光程长度比光B的光路长度长，并且产生光程长度差，导致两个衍射光入射的相位差 光电检测元件。 根据相位差，从光检测元件输出的光电检测信号的强度变化。 也就是说，由于入射光的入射角度的周期性变化，光A和光B之间的相位差被调制，并且干扰信号变得很大地被调制。

公开(公告)号：US20070236854A1

公开(公告)日：2007-10-11

申请号：US11279296

申请日：2006-04-11

申请人： Martin Lee ,  Bausan Yuan ,  Susumu Makinouchi

发明人： Martin Lee ,  Bausan Yuan ,  Susumu Makinouchi

IPC分类号： H01H47/00

CPC分类号： G03F7/709 ,  G03F7/70716

摘要： Methods and apparatus for supporting the weight of a first stage of a stage apparatus using magnets are disclosed. According to one aspect of the present invention, and apparatus includes a first structure, a second structure, and an anti-gravity device. The anti-gravity device has a first magnet and a piston arrangement that includes a second magnet. The first magnet is coupled to the first structure, and the piston arrangement is movably interfaced with the second structure through an air bearing. The first magnet and the piston arrangement cooperate to support the first structure over the second structure relative to a vertical axis.

摘要翻译： 公开了一种用于支撑使用磁体的平台装置的第一级的重量的方法和装置。 根据本发明的一个方面，并且装置包括第一结构，第二结构和反重力装置。 反重力装置具有包括第二磁体的第一磁体和活塞装置。 第一磁体联接到第一结构，并且活塞装置通过空气轴承与第二结构可移动地接合。 第一磁体和活塞装置配合以相对于垂直轴线支撑第二结构的第一结构。

公开(公告)号：US20050231706A1

公开(公告)日：2005-10-20

申请号：US10825022

申请日：2004-04-14

申请人： Pai-Hsueh Yang ,  Hideyuki Hashimoto ,  Bausan Yuan ,  Atsushi Yamaguchi ,  Susumu Makinouchi

发明人： Pai-Hsueh Yang ,  Hideyuki Hashimoto ,  Bausan Yuan ,  Atsushi Yamaguchi ,  Susumu Makinouchi

IPC分类号： G03B27/58 ,  G03F7/20

CPC分类号： G03F7/70725

摘要： Embodiments of the present invention are directed to a control system and method for controlling the trajectory and alignment of one or more stages by incorporating a grouping method in the control methodology. In one embodiment, a method of controlling movement of one or more stages of a precision assembly to process a substrate having a plurality of process regions comprises dividing the substrate into blocks according to one or more preset criteria, each block of the substrate including one or more process regions; generating learning data for one or more representative process regions for each block of the substrate; and using the generated learning data of the one or more representative process regions of each block to control movement of the one or more stages to process the block of one or more process regions of the substrate.

摘要翻译： 本发明的实施例涉及一种用于通过在控制方法中并入分组方法来控制一个或多个阶段的轨迹和对准的控制系统和方法。 在一个实施例中，一种控制精密组件的一个或多个阶段的运动以处理具有多个工艺区域的衬底的方法包括根据一个或多个预设标准将衬底划分成块，衬底的每个块包括一个或多个 更多的工艺区域; 为所述基板的每个块生成用于一个或多个代表性处理区域的学习数据; 以及使用所生成的每个块的一个或多个代表性处理区域的学习数据来控制所述一个或多个阶段的移动以处理所述衬底的一个或多个处理区域的块。