THROUGH-INTERPOSER GROUNDING USING BLIND VIAS

    公开(公告)号:US20220338349A1

    公开(公告)日:2022-10-20

    申请号:US17850495

    申请日:2022-06-27

    Abstract: A current path is provided through an interposer to ground a grounding pattern associated with a transmission line, by exploiting an interposer substrate that has a high-resistivity portion at a first surface and a low-resistivity portion extending from the high-resistivity portion to a second surface of the interposer. Moreover, a set of blind via-holes comprising electrically-conductive material extend from the first surface of the interposer substrate through the high-resistivity portion and into the low-resistivity portion. Top-to-bottom connection can be made using the conductive material in the blind vias and using the low-resistivity portion of the substrate, while the high-resistivity portion of the substrate impedes current leakage from the transmission line to the second surface of the substrate. The number and dimensions of the blind via-holes control the impedance of the grounding pattern relative to the transmission line's characteristic impedance.

    ELECTRICAL DEVICE COMPRISING A 3D CAPACITOR AND A REGION SURROUNDED BY A THROUGH OPENING

    公开(公告)号:US20220190101A1

    公开(公告)日:2022-06-16

    申请号:US17551437

    申请日:2021-12-15

    Abstract: An electrical device that includes a substrate; a 3D capacitor including a capacitor dielectric region of a dielectric material, a capacitor electrode region of a conductive material, the capacitor dielectric region and the capacitor electrode region being arranged at least partially inside a cavity extending in the substrate from a top face of the substrate; and a surrounding through opening in the substrate and which surrounds a surrounded substrate region, the 3D capacitor being outside of the surrounded substrate region, the surrounding through opening extending from the top face to a bottom face of the substrate, wherein inside the surrounding through opening a surrounding dielectric region of the dielectric material and a surrounding conductive region of the conductive material are arranged.

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