MEMS ELEMENT AND METHOD FOR MANUFACTURING SAME
    1.
    发明申请
    MEMS ELEMENT AND METHOD FOR MANUFACTURING SAME 有权
    MEMS元件及其制造方法

    公开(公告)号:US20130292783A1

    公开(公告)日:2013-11-07

    申请号:US13934390

    申请日:2013-07-03

    Inventor: Junichi YOSHIDA

    Abstract: An acceleration sensor is formed using an etched layer sandwiched between first and second substrates. In this case, a structure including a movable portion which is displaceable in the thickness direction of the substrates, and a support frame are formed in the etched layer. In addition, first and second fixed electrodes are formed on the first and second substrates, respectively, at a position facing the movable portion. Further, a remaining sacrificial layer is provided on the substrate by leaving a portion of a second sacrificial layer when a first sacrificial layer is entirely etched away. Therefore, when the first sacrificial layer is etched away, corrosion of the structure and the support beams is prevented because the second sacrificial layer is preferentially corroded as compared to the structure.

    Abstract translation: 使用夹在第一和第二基板之间的蚀刻层形成加速度传感器。 在这种情况下,在蚀刻层中形成有包括可在基板的厚度方向上移动的可动部分和支撑框架的结构。 此外,第一和第二固定电极分别在面对可动部分的位置上形成在第一和第二基板上。 此外,当第一牺牲层被完全蚀刻掉时,通过留下第二牺牲层的一部分,在衬底上提供剩余的牺牲层。 因此,当第一牺牲层被蚀刻掉时,由于与结构相比,第二牺牲层被优先腐蚀,所以防止了结构和支撑梁的腐蚀。

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