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公开(公告)号：US06799532B2
公开(公告)日：2004-10-05
申请号：US10650802
申请日：2003-08-29
IPC分类号： C23C1600
CPC分类号： H01J37/32266 , H01J37/32311 , H01J37/3299 , H05H1/0081
摘要： A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.
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2.发明授权Electron density measurement and plasma process control system using a microwave oscillator locked to an open resonator containing the plasma 有权电子密度测量和等离子体处理控制系统，其使用锁定在包含等离子体的开放谐振器的微波振荡器公开(公告)号：US06741944B1
公开(公告)日：2004-05-25
申请号：US10031374
申请日：2002-05-22
IPC分类号： H01S313
CPC分类号： H01J37/32266 , H01J37/32311 , H01J37/32935 , H01J37/3299
摘要： A system for measuring plasma electon densities (e.g., in the range of 1010 to 1012 cm−3) and for controlling a plasma generator (240). Measurement of the plasma density is essential if plasma-assisted processes, such depositions or etches, are to be adequately controlled using a feedback control. Both the plasma measurement method and system generate a control voltage that in turn controls the plasma generator (240) to maintain the plasma electron density at a pre-selected value. The system utilizes a frequency stabilization system to lock the frequency of a local oscillator (100) to the resonant frequency of an open microwave resonator (245) when the resonant frequency changes due to the introduction of a plasma within the open resonator. The amplified output voltage of a second microwave discriminator may be used to control a plasma generator (240).
摘要翻译： 用于测量等离子体电离密度（例如，10 10 -10 cm -3 -3）的系统和用于控制等离子体发生器（240）的系统。 如果使用反馈控制充分控制等离子体辅助过程，这种沉积或蚀刻，则等离子体密度的测量是必不可少的。 等离子体测量方法和系统都产生控制电压，该控制电压又控制等离子体发生器（240）以将等离子体电子密度维持在预选值。 当谐振频率由于在开放谐振器内引入等离子体而改变时，系统利用频率稳定系统将本地振荡器（100）的频率锁定到开放式微波谐振器（245）的谐振频率。 第二微波识别器的放大的输出电压可以用于控制等离子体发生器（240）。
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公开(公告)号：US06646386B1
公开(公告)日：2003-11-11
申请号：US10031373
申请日：2002-04-25
IPC分类号： H01J724
CPC分类号： H01J37/32266 , H01J37/32311 , H01J37/3299 , H05H1/0081
摘要： A method and system for controlling electron densities in a plasma processing system. By applying a dither voltage and a correction voltage to a voltage-controlled oscillator, electron (plasma) density of a plasma processing system (acting as an open resonator) may be measured and controlled as part of a plasma-based process.
摘要翻译： 一种用于控制等离子体处理系统中的电子密度的方法和系统。 通过向压控振荡器施加抖动电压和校正电压，可以作为等离子体处理的一部分来测量和控制等离子体处理系统的电子（等离子体）密度（作为开路谐振器）。
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4.发明授权Electron density measurement and plasma process control system using changes in the resonant frequency of an open resonator containing the plasma 失效电子密度测量和等离子体处理控制系统，其使用包含等离子体的开放谐振器的谐振频率的变化公开(公告)号：US06861844B1
公开(公告)日：2005-03-01
申请号：US10031570
申请日：2000-07-20
CPC分类号： H05H1/0062
摘要： A system for measuring plasma electron densities (e.g., in the range of 1010 to 1012 cm−3) and for controlling a plasma generator. Measurement of the plasma electron density is used as part of a feedback control in plasma-assisted processes, such as depositions or etches. Both the plasma measurement method and system generate a control voltage that in turn controls the plasma generator. A programmable frequency source sequentially excites a number of the resonant modes of an open resonator placed within the plasma processing apparatus. The resonant frequencies of the resonant modes depend on the plasma electron density in the space between the reflectors of the open resonator. The apparatus automatically determines the increase in the resonant frequency of an arbitrarily chosen resonant mode of the open resonator due to the introduction of a plasma and compares that measured frequency to data previously entered. The comparison is by any one of (1) dedicated circuitry, (2) a digital signal processor, and (3) a specially programmed general purpose computer. The comparator calculates a control signal which is used to modify the power output of the plasma generator as necessary to achieve the desired plasma electron density.
摘要翻译： 一种用于测量等离子体电子密度（例如，在1010至1012cm-3范围内）和用于控制等离子体发生器的系统。 等离子体电子密度的测量用作等离子体辅助过程中的反馈控制的一部分，例如沉积或蚀刻。 等离子体测量方法和系统都产生控制电压，从而控制等离子体发生器。 可编程频率源顺序地激发放置在等离子体处理装置内的开放谐振器的多个谐振模式。 谐振模式的谐振频率取决于开路谐振器的反射器之间的空间中的等离子体电子密度。 该设备由于引入等离子体而自动确定开路谐振器的任意选择的谐振模式的谐振频率的增加，并将该测量频率与先前输入的数据进行比较。 比较由（1）专用电路，（2）数字信号处理器和（3）专门编程的通用计算机中的任何一个。 比较器计算用于修改等离子体发生器的功率输出的控制信号，以实现期望的等离子体电子密度。
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5.发明授权Electron density measurement and control system using plasma-induced changes in the frequency of a microwave oscillator 失效电子密度测量和控制系统使用等离子体引起的微波振荡器频率变化公开(公告)号：US06573731B1
公开(公告)日：2003-06-03
申请号：US10030947
申请日：2002-04-09
IPC分类号： G01R2732
CPC分类号： H01J37/32266 , H01J37/32311 , H01J37/32935 , H01J37/3299
摘要： A method and system for measuring at least one of a plasma density and an electron density (e.g., in a range of 1010 to 1012 electrons/cm−3) using plasma induced changes in the frequency of a microwave oscillator. Measurement of at least one of the plasma density and the electron density enables plasma-assisted processes, such as depositions or etches, to be controlled using a feedback control. Both the measurement method and system generate a control voltage that in turn controls a plasma generator to maintain at least one of the plasma density and the electron density at a pre-selected value.
摘要翻译： 使用等离子体引起的微波振荡器的频率变化来测量等离子体密度和电子密度（例如，在1010至1012电子/ cm -3）的范围中的至少一个的方法和系统。 测量等离子体密度和电子密度中的至少一个使得能够使用反馈控制来控制诸如沉积或蚀刻的等离子体辅助处理。 测量方法和系统都产生控制电压，该控制电压又控制等离子体发生器以将等离子体密度和电子密度中的至少一个保持在预选值。
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6.发明授权Method, system and apparatus for an electrically assisted chemical oxygen iodine laser 有权电辅助化学氧碘激光的方法，系统和装置公开(公告)号：US06501780B2
公开(公告)日：2002-12-31
申请号：US09829835
申请日：2001-04-10
IPC分类号： H01S322
CPC分类号： H01S3/2215 , H01S3/038
摘要： A method, apparatus and system are provided herein for an electrically assisted chemical oxygen iodine laser. The preferred system, in accordance with the present invention, includes a laser resonator with a laser-active gas mixture of at least excited oxygen and dissociated iodine. A first electrical generator in which a primary flow of at least excited oxygen is electrically generated from a first gas that includes at least ground state oxygen. A second electrical generator in which a secondary flow of at least dissociated iodine atoms is electrically generated from a second gas that includes at least diatomic iodine. The system further includes a means to inject the secondary flow into the primary flow to generate the laser-active gas mixture.
摘要翻译： 本文提供了一种用于电辅助化学氧碘激光的方法，装置和系统。 根据本发明的优选系统包括具有至少激发的氧和解离的碘的激光活性气体混合物的激光谐振器。 一种第一发电机，其中从至少包括基态氧的第一气体电生成至少激发的氧气的一次流。 第二发电机，其中至少解离的碘原子的二次流由至少包含双原子碘的第二气体电产生。 该系统还包括将二次流注入主流以产生激光活性气体混合物的装置。
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公开(公告)号：US20080197714A1
公开(公告)日：2008-08-21
申请号：US12030929
申请日：2008-02-14
IPC分类号： H03K3/00
CPC分类号： H03K3/53
摘要： In an embodiment of the invention there is provided a pulse circuit including two transmission lines or other capacitive energy storage circuits resonantly charged by inductors and diodes that are connected to a DC power source. The pulse circuit includes a pulse transformer that may be connected in series with the transmission lines or artificial lines with a turns ratio chosen to match the load impedance to primary circuit impedance or to generate the optimum pulsed voltage source. Multiple switches can be employed to increase the repetition frequency of the pulses. For transmission lines and L-C artificial lines, the pulse alternates in polarity; for simple capacitive energy storage, the pulses are unipolar.
摘要翻译： 在本发明的一个实施例中，提供了一种脉冲电路，该脉冲电路包括两个传输线路或其它电容性能量存储电路，该电容器通过与直流电源连接的电感器和二极管共振地充电。 脉冲电路包括脉冲变压器，其可以与传输线或人造线串联连接，匝数比选择为匹配负载阻抗与初级电路阻抗或产生最佳脉冲电压源。 可以采用多个开关来增加脉冲的重复频率。 对于传输线和L-C人造线，脉冲极性交替; 对于简单的电容性能量存储，脉冲是单极性的。
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公开(公告)号：US07126283B2
公开(公告)日：2006-10-24
申请号：US10939338
申请日：2004-09-14
申请人： Ju Gao , Joseph T. Verdeyen
发明人： Ju Gao , Joseph T. Verdeyen
CPC分类号： H05B41/24 , G01N21/68 , H01J61/0732 , H01J61/12 , H01J65/046 , H05B41/38
摘要： A method of generating an electrical discharge in a high pressure gas contained in a sealed enclosure. The method includes driving a helical coil resonator at an RF frequency to generate an RF electric-magnetic field sufficient to generate an electrical discharge in the high pressure gas. The electrical discharge produces an emission spectrum that may be spectroscopically analyzed to determine the composition and impurity content of the gas.
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公开(公告)号：US4360850A
公开(公告)日：1982-11-23
申请号：US89309
申请日：1979-10-30
摘要： A high-voltage crowbar circuit continually senses the load impedance and crowbars the output voltage applied to a load if the load impedance falls below a selected value. A differentiator circuit at the load senses variations in load voltage and can trigger the crowbar operation if the voltage variation as a function of time exceeds a preselected load.
摘要翻译： 如果负载阻抗低于所选择的值，则高电压短路电路会持续感测负载阻抗，并使得施加到负载的输出电压产生撬动。 负载的微分电路会感测负载电压的变化，如果电压变化随时间的变化而超过预选负载，则可以触发撬棒操作。
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公开(公告)号：US07804877B2
公开(公告)日：2010-09-28
申请号：US12122874
申请日：2008-05-19
IPC分类号： H01S3/22
CPC分类号： H01S3/227 , H01S3/03 , H01S3/036 , H01S3/041 , H01S3/09408 , H01S3/0941 , H01S3/09415 , H01S3/0943
摘要： The present invention provides in one of the embodiments for either a continuous wave (cw) or pulsed alkali laser having an optical cavity resonant at a wavelength defined by an atomic transition, a van der Waals complex within the optical cavity, the van der Waals complex is formed from an alkali vapor joined with a polarizable gas, and a pump laser for optically pumping the van der Waals complex outside of the Lorentzian spectral wings wherein the van der Waals complex is excited to form an exciplex that dissociates forming an excited alkali vapor, generating laser emission output at the wavelength of the lasing transition.
摘要翻译： 本发明在实施例中提供了一种连续波（cw）或脉冲碱性激光器，其具有在由原子跃迁限定的波长处共振的光学腔，光腔内的范德华复合物，范德华复合物 由与可极化气体连接的碱性蒸汽形成，以及用于在洛伦兹光谱翼外部光学泵送范德瓦尔兹复合物的泵激光器，其中激发了范德华复合物以形成解离形成激发的碱性蒸气的激元复合物， 在激光转换的波长处产生激光发射输出。
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