公开(公告)号：US20240258077A1

公开(公告)日：2024-08-01

申请号：US18634508

申请日：2024-04-12

申请人： NANOTECH INC.

发明人： Dong Ho CHA

IPC分类号： H01J37/32 ,  C23C16/50

CPC分类号： H01J37/32504 ,  C23C16/50 ,  H01J37/32183 ,  H01J37/32568 ,  H01J37/32651 ,  H01J37/32834 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/332

摘要： The present invention relates to a technology for increasing the reliability of measurement by preventing the contamination of a self-plasma chamber provided in order to monitor a deposition operation performed in a process chamber, and has a shielding means capable of preventing an inflow of negative electrode material, which is generated by a sputtering phenomenon, into a discharge chamber when a positive charge of plasma, which is generated in the self-plasma chamber, collides with a negative electrode.