公开(公告)号：US20160263814A1

公开(公告)日：2016-09-15

申请号：US15029481

申请日：2014-08-29

Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY

Inventor： Sung Won YOUN ,  Sang Cheon PARK ,  Hiroshi HIROSHIMA ,  Hideki Takagi ,  Kenta Suzuki

IPC: B29C59/02 ,  G03F7/00 ,  B29C35/08 ,  B29C43/02 ,  B29C43/52

CPC classification number: B29C59/022 ,  B29C35/0805 ,  B29C43/021 ,  B29C43/52 ,  B29C2035/0827 ,  B29C2043/025 ,  B29C2059/023 ,  B29K2079/08 ,  C08L79/08 ,  G03F7/0002 ,  G03F7/0387

Abstract: Provided is a method for forming a pattern of polyimide that is simpler and is more excellent in the pattern shape and in the dimensional accuracy in comparison with the conventional techniques of patterning polyimide, such as photolithography and laser processing. In a method for forming a micropattern of polyimide, which includes using as polyimide a solvent-soluble polyimide resin composition that is photosensitive and is moldable at a temperature of less than or equal to a glass-transition temperature; patterning the composition using thermal imprinting; and thermally curing the composition, ultraviolet irradiation is performed after the composition is released from a mold after a molding step.

Abstract translation: 提供了一种形成聚酰亚胺图案的方法，其与诸如光刻和激光加工的常规聚酰亚胺技术相比，更简单并且在图案形状和尺寸精度方面更优异。 在形成聚酰亚胺微图案的方法中，其包括使用作为聚酰亚胺的溶剂可溶性聚酰亚胺树脂组合物，所述聚酰亚胺树脂组合物是光敏的并且可以在低于或等于玻璃化转变温度的温度下成型; 使用热压印图案化组合物; 并对组合物进行热固化，在成型步骤后从模具中脱模后进行紫外线照射。