公开(公告)号：US20020196382A1

公开(公告)日：2002-12-26

申请号：US10163612

申请日：2002-06-07

Applicant: NEC CORPORATION

Inventor： Takayuki Ishino

IPC: G02F001/136

CPC classification number: G02F1/1368 ,  G02F1/136286 ,  G02F2201/40

Abstract: An active matrix type liquid crystal display device includes (a) a transparent substrate, (b) a plurality of scanning lines formed on the transparent substrate, (c) a plurality of signal lines formed on the transparent substrate perpendicularly to the scanning lines, (d) a transparent electrode arranged in a pixel area defined by the scanning and signal lines, and (e) a thin film transistor formed in association with the transparent electrode, the thin film transistor being formed in an area at which one of the scanning lines and one of the signal lines intersect with each other, the thin film transistor including source and drain regions both comprised of an electrically conductive film of which the signal lines are comprised.

Abstract translation: 有源矩阵型液晶显示装置包括（a）透明基板，（b）形成在透明基板上的多条扫描线，（c）与透明基板垂直于扫描线形成的多条信号线， d）布置在由扫描和信号线限定的像素区域中的透明电极，以及（e）与透明电极相关联地形成的薄膜晶体管，薄膜晶体管形成在扫描线 并且信号线之一彼此相交，所述薄膜晶体管包括源极和漏极区域，两者都包括由信号线组成的导电膜。

公开(公告)号：US20020140895A1

公开(公告)日：2002-10-03

申请号：US10107578

申请日：2002-03-28

Applicant: NEC CORPORATION

Inventor： Shigeru Kimura ,  Akitoshi Maeda ,  Satoshi Doi ,  Takayuki Ishino

IPC: G02F001/136

CPC classification number: G02F1/136227 ,  G02F1/13439

Abstract: A liquid crystal display is fabricated which has bus wires disposed in a grid shape, switching elements coupled to the bus wires, and pixel electrodes which are disposed on an interlayer insulating film formed by coating and which are coupled with the switching elements. In fabricating the liquid crystal display, when a transparent conductive film is formed on the interlayer insulating film which is formed by coating, the temperature of the substrate is controlled to become 100null C.-170null C. In other way, when the transparent conductive film is formed on the interlayer insulating film in a non-heated condition, an oxygen flow rate ratio is set to 1% or lower, and annealing is performed after forming the film. Thereby, when etching the ITO film on the interlayer insulating film, etching residue is not produced. Further, contact resistance between the ITO film and the lower layer metal can be uniformly decreased, and display defects can be obviated.

Abstract translation: 制造液晶显示器，其具有以栅格形状布置的总线，耦合到母线的开关元件和设置在由涂层形成并与开关元件耦合的层间绝缘膜上的像素电极。 在制造液晶显示器时，当在通过涂布形成的层间绝缘膜上形成透明导电膜时，将基板的温度控制为100℃-170℃。换句话说，当透明 在非加热状态下在层间绝缘膜上形成导电膜，将氧气流量比设定为1％以下，在形成膜之后进行退火。 因此，当蚀刻层间绝缘膜上的ITO膜时，不会产生蚀刻残留物。 此外，可以均匀地减少ITO膜和下层金属之间的接触电阻，并且可以避免显示缺陷。

公开(公告)号：US20030013236A1

公开(公告)日：2003-01-16

申请号：US10188743

申请日：2002-07-05

Applicant: NEC CORPORATION

Inventor： Shinichi Nakata ,  Yuji Yamamoto ,  Takayuki Ishino

IPC: G02F001/136 ,  H01L021/84

CPC classification number: H01L27/12 ,  G02F1/136227 ,  G02F2001/136236 ,  H01L27/1244 ,  H01L27/1248 ,  H01L27/1288

Abstract: In a step for forming a contact through hole in a protective film that covers a Thin Film Transistor (TFT) to connect a source electrode of the TFT and a pixel electrode to each other, location of a later-formed contact through hole is designed to be apart not less than 2.0 nullm from location of the opening of an overcoat layer, which opening is formed on the protective film. This construction forces the opening of a novolac type photosensitive resist to be positioned inside the location of the opening of the overcoat layer and therefore, the contact through hole formed in the protective film is able to have a tapered cross sectional profile that is never affected by the opening of the overcoat layer, allowing for stable connection between the source electrode and the pixel electrode.

Abstract translation: 在覆盖薄膜晶体管（TFT）的保护膜中形成接触通孔的步骤中，将TFT的源电极和像素电极彼此连接，将稍后形成的接触通孔的位置设计为 从保护膜的开口的位置开始分开不小于2.0μm，该保护膜形成开口。 这种结构迫使酚醛清漆型光敏抗蚀剂的开口位于外涂层开口位置的内侧，因此形成在保护膜中的接触通孔能够具有从不受 覆盖层的开口，允许源电极和像素电极之间的稳定连接。

公开(公告)号：US20020089615A1

公开(公告)日：2002-07-11

申请号：US10042144

申请日：2002-01-11

Applicant: NEC CORPORATION

Inventor： Michiaki Sakamoto ,  Yuji Yamamoto ,  Mamoru Okamoto ,  Shigeru Kimura ,  Shinichi Nakata ,  Shouichi Kuroha ,  Masanobu Hidehira ,  Yoshitaka Horie ,  Takayuki Ishino

IPC: G02F001/136

CPC classification number: G02F1/136209 ,  G02F1/133514 ,  G02F1/136227

Abstract: A liquid crystal display device is made up of a TFT substrate, an opposed substrate and a liquid crystal layer arranged between these substrates, in which the TFT substrate is provided with gate lines, data lines and TFT on its transparent insulative substrate, in addition, a passivation film is provided so as to cover them. Color filter is provided on the passivation film, and black matrix is provided at corresponding area to above part of the TFT and to above part of the data line on the color filter. In addition, a first overcoat layer with film thickness of degree of 1 to 3 nullm is provided so as to cover the black matrix. Further, a second overcoat layer with film thickness of approximate 0.5 nullm is provided at the whole surface except for a contact hole. Furthermore, a pixel electrode is provided on pixel formation area on the second overcoat layer.

Abstract translation: 液晶显示装置由TFT基板，相对基板和布置在这些基板之间的液晶层构成，其中TFT基板在其透明绝缘基板上设置有栅极线，数据线和TFT，另外， 提供钝化膜以覆盖它们。 在钝化膜上提供彩色滤光片，并且黑色矩阵设置在TFT上方的相应区域和彩色滤光片上数据线的上方。 此外，设置膜厚度为1〜3μm的第一覆盖层，以覆盖黑矩阵。 此外，除了接触孔之外，在整个表面上设置膜厚约为0.5μm的第二外涂层。 此外，像素电极设置在第二外涂层上的像素形成区域上。