公开(公告)号：US20010010370A1

公开(公告)日：2001-08-02

申请号：US09745657

申请日：2000-12-20

Applicant: NEC Corporation

Inventor： Shigeru Kimura ,  Takahiko Watanabe ,  Tae Yoshikawa ,  Hiroyuki Uchida ,  Shusaku Kido ,  Shinichi Nakata ,  Tsutomu Hamada ,  Hisanobu Shimodouzono ,  Satoshi Doi ,  Toshihiko Harano ,  Akitoshi Maeda ,  Satoshi Ihida ,  Hiroaki Tanaka ,  Takasuke Hayase ,  Shouichi Kuroha ,  Hirofumi Ihara ,  Kazushige Takechi

IPC: H01L021/00 ,  H01L031/036

CPC classification number: G02F1/134363

Abstract: An active matrix substrate plate having superior properties is manufactured at high yield using four photolithographic fabrication steps. In step 1, the scanning line and the gate electrode extending from the scanning line are formed in the glass plate. In step 2, the gate insulation layer and the semiconductor layer comprised by amorphous silicon layer and nnull amorphous silicon layer is laminated to provide the semiconductor layer for the TFT section. In step 3, the transparent conductive layer and the metallic layer are laminated, and the signal line, the drain electrode extending from the signal line, the pixel electrode and the source electrode extending from the pixel electrode are formed, and the nnull amorphous silicon layer of the channel gap is removed by etching. In step 4, the protective insulation layer is formed, and the protective insulation layer and the metal layer above the pixel electrode are removed by etching.

Abstract translation: 使用四个光刻制造步骤以高产率制造具有优异性能的有源矩阵基板。 在步骤1中，在玻璃板上形成扫描线和从扫描线延伸的栅电极。 在步骤2中，层叠由非晶硅层和n +非晶硅层构成的栅极绝缘层和半导体层，为TFT部分提供半导体层。 在步骤3中，层叠透明导电层和金属层，形成信号线，从信号线延伸的漏极，从像素电极延伸的像素电极和源电极，并且n +非晶硅层 通过蚀刻去除通道间隙。 在步骤4中，形成保护绝缘层，通过蚀刻除去保护绝缘层和像素电极上方的金属层。

公开(公告)号：US20020140895A1

公开(公告)日：2002-10-03

申请号：US10107578

申请日：2002-03-28

Applicant: NEC CORPORATION

Inventor： Shigeru Kimura ,  Akitoshi Maeda ,  Satoshi Doi ,  Takayuki Ishino

IPC: G02F001/136

CPC classification number: G02F1/136227 ,  G02F1/13439

Abstract: A liquid crystal display is fabricated which has bus wires disposed in a grid shape, switching elements coupled to the bus wires, and pixel electrodes which are disposed on an interlayer insulating film formed by coating and which are coupled with the switching elements. In fabricating the liquid crystal display, when a transparent conductive film is formed on the interlayer insulating film which is formed by coating, the temperature of the substrate is controlled to become 100null C.-170null C. In other way, when the transparent conductive film is formed on the interlayer insulating film in a non-heated condition, an oxygen flow rate ratio is set to 1% or lower, and annealing is performed after forming the film. Thereby, when etching the ITO film on the interlayer insulating film, etching residue is not produced. Further, contact resistance between the ITO film and the lower layer metal can be uniformly decreased, and display defects can be obviated.

Abstract translation: 制造液晶显示器，其具有以栅格形状布置的总线，耦合到母线的开关元件和设置在由涂层形成并与开关元件耦合的层间绝缘膜上的像素电极。 在制造液晶显示器时，当在通过涂布形成的层间绝缘膜上形成透明导电膜时，将基板的温度控制为100℃-170℃。换句话说，当透明 在非加热状态下在层间绝缘膜上形成导电膜，将氧气流量比设定为1％以下，在形成膜之后进行退火。 因此，当蚀刻层间绝缘膜上的ITO膜时，不会产生蚀刻残留物。 此外，可以均匀地减少ITO膜和下层金属之间的接触电阻，并且可以避免显示缺陷。