公开(公告)号：US20040085489A1

公开(公告)日：2004-05-06

申请号：US10692736

申请日：2003-10-27

Applicant: NEC LCD TECHNOLOGIES, LTD.

Inventor： Takasuke Hayase ,  Keiko Yamada ,  Masami Yamashita ,  Shinichi Nakata ,  Akitoshi Maeda

IPC: G02F001/136

CPC classification number: G02F1/136227 ,  G02F1/134363 ,  G02F2202/104 ,  H01L27/124 ,  H01L27/1248 ,  H01L27/14621

Abstract: The method of fabricating a liquid crystal display device includes the steps of (a) fabricating a switching device on a substrate, (b) forming an interlayer insulating film on the substrate such that the switching device is covered with the interlayer insulating film, and (c) forming a transparent electrode on the interlayer insulating film, the transparent electrode being electrically connected to the switching device through the interlayer insulating film, the step (c) including (c1) depositing electrically conductive, transparent and amorphous material on the interlayer insulating film, (c2) patterning the material into the transparent electrode, and (c3) turning the transparent electrode into polysilicon by thermal annealing carried out after formation of an alignment film.

Abstract translation: 制造液晶显示装置的方法包括以下步骤：（a）在基板上制造开关装置，（b）在基板上形成层间绝缘膜，使得开关装置被层间绝缘膜覆盖，以及（ c）在层间绝缘膜上形成透明电极，透明电极通过层间绝缘膜与开关器件电连接，步骤（c）包括（c1）在层间绝缘膜上沉积导电，透明和非晶材料 ，（c2）将材料图案化成透明电极，（c3）通过在形成取向膜之后进行的热退火将透明电极转换成多晶硅。

公开(公告)号：US20040070718A1

公开(公告)日：2004-04-15

申请号：US10661543

申请日：2003-09-15

Applicant: NEC LCD TECHNOLOGIES, LTD.

Inventor： Shingo Saigo ,  Takasuke Hayase ,  Makoto Horinouchi ,  Hideto Motoshima ,  Akitoshi Maeda

IPC: G02F001/1343

CPC classification number: G02F1/134363 ,  G02F1/133345 ,  G02F1/136227

Abstract: A display portion is divided by scan lines and signal lines into sections where pixels are provided. Contact holes each for connecting common wiring and a common electrode together are not formed for all the pixels, but decimated so as to be arranged in zigzags.

Abstract translation: 显示部分被扫描线和信号线划分成设置像素的部分。 对于所有像素，不形成用于将公共布线和公共电极连接在一起的接触孔，而是以Z字形排列。

公开(公告)号：US20040134878A1

公开(公告)日：2004-07-15

申请号：US10704670

申请日：2003-11-12

Applicant: NEC LCD TECHNOLOGIES, LTD.

Inventor： Hidekazu Matsushita ,  Tsuyoshi Katoh ,  Satoshi Doi ,  Akitoshi Maeda

IPC: C30B033/00

CPC classification number: G02F1/13458 ,  G02F1/136227 ,  G02F2001/13629 ,  H01L27/12 ,  H01L27/124

Abstract: A method for manufacturing a TFT panel of an LCD device includes the steps of wet etching a multilayer metallic structure including a high-melting-point metal film (HMPM) film, Al film and another HMPM film while using side etching technique by using a photoresist mask, hot-water washing the side walls of the Al film after the wet etching, and dry etching for configuring the channel region of a TFT in each pixel, and removing the photoresist mask. The presence of the photoresist mask and the protection film prevents corrosion of Al caused by plasma of the etching gas in the dry etching.

Abstract translation: 一种用于制造LCD装置的TFT面板的方法包括以下步骤：使用侧蚀刻技术通过使用光致抗蚀剂来湿蚀刻包括高熔点金属膜（HMPM）膜，Al膜和另一HMPM膜的多层金属结构 掩模，在湿法蚀刻之后热水洗涤Al膜的侧壁，以及干法蚀刻以构成每个像素中的TFT的沟道区域，以及去除光致抗蚀剂掩模。 光致抗蚀剂掩模和保护膜的存在防止了由干蚀刻中的蚀刻气体的等离子体引起的Al的腐蚀。