公开(公告)号：US20170235238A1

公开(公告)日：2017-08-17

申请号：US15585664

申请日：2017-05-03

申请人： NIKON CORPORATION

发明人： Kenichi SHIRAISHI

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/42 ,  G03F7/70875 ,  G03F7/70916

摘要： An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area. The measuring device includes a resistivity meter to obtain information on a specific resistance value of the immersion liquid.

公开(公告)号：US20180004096A1

公开(公告)日：2018-01-04

申请号：US15703427

申请日：2017-09-13

申请人： NIKON CORPORATION

发明人： Yasufumi NISHII ,  Kenichi SHIRAISHI ,  Hirotaka KOHNO

IPC分类号： G03F7/20

CPC分类号： G03F7/70341

摘要： An exposure apparatus has a stage having a substrate holder and a plate member around the substrate holder to surround a substrate on the substrate holder. A liquid supply mechanism includes a supply port above the stage at a more outward position than an optical path of light from a projection system and supplies liquid onto the stage from the supply port. A liquid recovery mechanism includes a recovery port above the stage at a more outward position than the supply port and recovers the liquid supplied from the supply port. The liquid supply and recovery mechanisms form a liquid immersion region that includes the optical path on part of the stage with the liquid supplied from the supply port. The stage has a passageway below the plate member and recovers the liquid from the liquid immersion region that infiltrates a gap between the plate member and the substrate.

公开(公告)号：US20170329234A1

公开(公告)日：2017-11-16

申请号：US15664319

申请日：2017-07-31

申请人： NIKON CORPORATION

发明人： Soichi OWA ,  Nobutaka MAGOME ,  Shigeru HIRUKAWA ,  Yoshihiko KUDO ,  Jiro INOUE ,  Hiroyuki NAGASAKA ,  Hirotaka KOHNO ,  Masahiro NEI ,  Motokatsu IMAI ,  Kenichi SHIRAISHI ,  Yasufumi NISHII ,  Hiroaki TAKAIWA

IPC分类号： G03F7/20 ,  G03B27/58

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US20160246184A1

公开(公告)日：2016-08-25

申请号：US15145561

申请日：2016-05-03

申请人： NIKON CORPORATION

发明人： Kenichi SHIRAISHI ,  Ryuichi HOSHIKA ,  Tomoharu FUJIWARA

IPC分类号： G03F7/20

CPC分类号： G03F7/70608 ,  G03F7/2041 ,  G03F7/70341 ,  G03F7/70858

摘要： A liquid immersion device that has an mixing mechanism that mixes and dissolves a predetermined substance for adjusting specific resistance of the liquid, which is supplied onto a liquid repellent film on the surface of an object (member) of a projection optical system placed on the light emitting side of projection optical system, and an liquid immersion area is formed by supplying the liquid in which the predetermined liquid is dissolved onto the liquid repellent film.

摘要翻译： 一种液浸装置，其具有混合并溶解用于调节液体的电阻率的预定物质的混合机构，所述混合机构被供给到放置在所述光上的投影光学系统的物体（构件）的表面上的防液膜 投影光学系统的发射侧，并且通过将预定液体溶解在其上的液体供应到防液膜上而形成液浸区域。

公开(公告)号：US20150301457A1

公开(公告)日：2015-10-22

申请号：US14696898

申请日：2015-04-27

申请人： NIKON CORPORATION

发明人： Soichi OWA ,  Nobutaka MAGOME ,  Shigeru HIRUKAWA ,  Yoshihiko KUDO ,  Jiro INOUE ,  Hirotaka KOHNO ,  Masahiro NEI ,  Motokatsu IMAI ,  Hiroyuki NAGASAKA ,  Kenichi SHIRAISHI ,  Yasufumi NISHII ,  Hiroaki TAKAIWA

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

摘要翻译： 曝光装置通过液体将图案图像投影到基板上来曝光基板。 曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。 至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

公开(公告)号：US20130141703A1

公开(公告)日：2013-06-06

申请号：US13754112

申请日：2013-01-30

申请人： NIKON CORPORATION

发明人： Soichi OWA ,  Nobutaka MAGOME ,  Shigeru HIRUKAWA ,  Yoshihiko KUDO ,  Jiro INOUE ,  Hirotaka KOHNO ,  Masahiro NEI ,  Motokatsu IMAI ,  Hiroyuki NAGASAKA ,  Kenichi SHIRAISHI ,  Yasufumi NISHII ,  Hiroaki TAKAIWA

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US20130335717A1

公开(公告)日：2013-12-19

申请号：US13950338

申请日：2013-07-25

申请人： NIKON CORPORATION

发明人： Kenichi SHIRAISHI

IPC分类号： G03F7/20

CPC分类号： G03F7/70875 ,  G03B27/42 ,  G03F7/70341 ,  G03F7/70916

摘要： An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area.

摘要翻译： 曝光装置能够基于液浸法精确地进行曝光处理和测量处理。 在投影光学系统的图像表面侧形成液体的液浸区域并且经由投影光学系统和浸没区域的液体曝光基板的曝光装置包括：测量装置，其测量至少一个 用于形成液浸区域的液体的性质和组成。

公开(公告)号：US20130169945A1

公开(公告)日：2013-07-04

申请号：US13775853

申请日：2013-02-25

申请人： Nikon Corporation

发明人： Naoyuki KOBAYASHI ,  Akikazu TANIMOTO ,  Yasushi MIZUNO ,  Kenichi SHIRAISHI ,  Katsushi NAKANO ,  Soichi OWA

IPC分类号： G03F7/00

CPC分类号： G03F7/7085 ,  G03B27/52 ,  G03F7/00 ,  G03F7/2041 ,  G03F7/70316 ,  G03F7/70341 ,  G03F7/70775 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70958 ,  G03F9/7015 ,  G03F9/7088 ,  G03F9/7096

摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate via the projection optical system and the liquid so as to expose the substrate. The exposure device includes a liquid removing mechanism which removes the liquid remaining on a part arranged in the vicinity of the image plane of the projection optical system.

摘要翻译： 提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。 曝光装置通过投影光学系统和液体将图案的图像投影到基板上，以露出基板。 曝光装置包括：液体移除机构，其去除在投影光学系统的像面附近布置的部分残留的液体。

公开(公告)号：US20130141701A1

公开(公告)日：2013-06-06

申请号：US13753969

申请日：2013-01-30

申请人： Nikon Corporation

发明人： Soichi OWA ,  Nobutaka MAGOME ,  Shigeru HIRUKAWA ,  Yoshihiko KUDO ,  Jiro INOUE ,  Hirotaka KOHNO ,  Masahiro NEI ,  Motokatsu IMAI ,  Hiroyuki NAGASAKA ,  Kenichi SHIRAISHI ,  Yasufumi NISHII ,  Hiroaki TAKAIWA

IPC分类号： G03F7/20

CPC分类号： G03F7/70341 ,  G03B27/58 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70716

摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.

公开(公告)号：US20180364597A1

公开(公告)日：2018-12-20

申请号：US16113621

申请日：2018-08-27

申请人： NIKON CORPORATION

发明人： Natsuko YAMAKAWA ,  Katsushi NAKANO ,  Kenichi SHIRAISHI

IPC分类号： G03F7/20

摘要： An exposure apparatus exposes a substrate using exposure light via a liquid. The exposure apparatus comprises a substrate holding part, which releasably holds and is capable of moving a substrate, a management apparatus, which manages a status of usage of a dummy substrate that the substrate holding part is capable of holding.