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    Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
    1.
    发明授权
    Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator 有权

    公开(公告)号：US09785053B2

    公开(公告)日：2017-10-10

    申请号：US13890547

    申请日：2013-05-09

    申请人： NIKON CORPORATION

    发明人： Takehito Kudo ,  Shigeru Hirukawa

    IPC分类号： G03F7/20 ,  G03B27/42

    摘要： An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.

    Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
    2.
    发明授权
    Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator 有权

    公开(公告)号：US09625826B2

    公开(公告)日：2017-04-18

    申请号：US13890547

    申请日：2013-05-09

    申请人： NIKON CORPORATION

    发明人： Takehito Kudo ,  Shigeru Hirukawa

    IPC分类号： G03F7/20 ,  G03B27/42

    摘要： An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.

    Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
    3.
    发明授权
    Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator 有权
    具有偏转构件，透镜，偏振构件以设定圆周方向偏振的照明光学装置和光学积分器

    公开(公告)号：US09588432B2

    公开(公告)日：2017-03-07

    申请号：US13890547

    申请日：2013-05-09

    申请人： NIKON CORPORATION

    发明人： Takehito Kudo ,  Shigeru Hirukawa

    IPC分类号： G03F7/20 ,  G03B27/42

    摘要： An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.

    摘要翻译： 照明光学装置用照明光照亮掩模上的图案。 所述照明光学装置包括布置在所述照明光的光路中的光学积分器，设置在所述光学积分器的入射侧的所述光路中的偏转构件，所述偏转构件使所述照明光偏转;布置在所述光路中的透镜元件 偏转构件和光学积分器，其将照明光分布在照明光学装置的光瞳平面上，远离照明光学装置的光轴;以及偏振构件，其布置在透镜之间的光路中 元件和光学积分器，其改变照明光的偏振状态，使得该区域中的照明光的偏振方向基本上与围绕光轴的周向方向一致。

    Exposure apparatus, exposure method, and method for producing device
    6.
    发明授权
    Exposure apparatus, exposure method, and method for producing device 有权

    公开(公告)号：US10048602B2

    公开(公告)日：2018-08-14

    申请号：US15094678

    申请日：2016-04-08

    申请人： NIKON CORPORATION

    发明人： Naoyuki Kobayashi ,  Soichi Owa ,  Shigeru Hirukawa ,  Yasuhiro Omura

    IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

    摘要： An exposure apparatus exposes a substrate by irradiating exposure light on the substrate through liquid. The exposure apparatus has a substrate holder for holding the substrate, a substrate stage capable of moving the substrate held by the substrate holder, and a temperature adjusting system for adjusting the temperature of the substrate holder. The temperature of the substrate is controlled so that there is no difference in temperature between the substrate and the liquid, thereby preventing a reduction in exposure accuracy resulting from variation in temperature of the liquid.

    Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
    7.
    发明授权
    Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator 有权

    公开(公告)号：US09857691B2

    公开(公告)日：2018-01-02

    申请号：US13890547

    申请日：2013-05-09

    申请人： NIKON CORPORATION

    发明人： Takehito Kudo ,  Shigeru Hirukawa

    IPC分类号： G03F7/20 ,  G03B27/42

    摘要： An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator arranged in an optical path of the illumination light, a deflecting member arranged in the optical path on an incidence side of the optical integrator, which deflects the illumination light, a lens element arranged in the optical path between the deflecting member and the optical integrator, which distributes the illumination light in a region, on a pupil plane of the illumination optical apparatus, away from an optical axis of the illumination optical apparatus, and a polarization member arranged in the optical path between the lens element and the optical integrator, which changes a polarization state of the illumination light so that a polarization direction of the illumination light in the region is substantially coincident with a circumferential direction about the optical axis.

    Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
    8.
    发明授权
    Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction 有权

    公开(公告)号：US09625825B2

    公开(公告)日：2017-04-18

    申请号：US13890142

    申请日：2013-05-08

    申请人： NIKON CORPORATION

    发明人： Takehito Kudo ,  Shigeru Hirukawa

    IPC分类号： G03F7/20 ,  G03B27/42

    摘要： An illumination optical apparatus illuminates a pattern on a mask with illumination light. The illumination optical apparatus includes an optical integrator, a polarization member arranged in an optical path of the illumination light on an incidence side of the optical integrator, which changes a polarization state of the illumination light, and a distribution changing member arranged in the optical path between the polarization member and the optical integrator, which can change a light amount distribution of the illumination light on a pupil plane of the illumination optical apparatus. The polarization member changes the polarization state of the illumination light so that a polarization direction of the illumination light, which is distributed away from an optical axis of the illumination optical apparatus on the pupil plane, is substantially coincident with a circumferential direction about the optical axis on the pupil plane.

    Exposure method, exposure apparatus, and method for producing device
    9.
    发明授权
    Exposure method, exposure apparatus, and method for producing device 有权

    公开(公告)号：US09448493B2

    公开(公告)日：2016-09-20

    申请号：US13788940

    申请日：2013-03-07

    申请人： NIKON CORPORATION

    发明人： Shigeru Hirukawa

    IPC分类号： G03B27/52 ,  G03F7/20

    摘要： An exposure apparatus and method exposes a substrate by projecting an image of a pattern onto the substrate through a liquid. A projection optical system projects the image of the pattern onto the substrate. A recovery port recovers the liquid supplied onto the substrate. A temperature sensor measures a temperature of the liquid recovered via the recovery port.