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公开(公告)号:US11515688B2
公开(公告)日:2022-11-29
申请号:US16482915
申请日:2018-02-05
Inventor: Bjorn Ove Myking Fimland , Helge Weman , Dingding Ren
IPC: H01L33/06 , H01L33/00 , H01L33/32 , H01L33/60 , H01S5/343 , H01S5/02 , H01S5/183 , H01S5/22 , H01S5/042 , H01L29/06
Abstract: A device, such as a light-emitting device, e.g. a laser device, comprising: a plurality of group III-V semiconductor NWs grown on one side of a graphitic substrate, preferably through the holes of an optional hole-patterned mask on said graphitic substrate; a first distributed Bragg reflector or metal mirror positioned substantially parallel to said graphitic substrate and positioned on the opposite side of said graphitic substrate to said NWs; optionally a second distributed Bragg reflector or metal mirror in contact with the top of at least a portion of said NWs; and wherein said NWs comprise aim-type doped region and a p-type doped region and optionally an intrinsic region there between.
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公开(公告)号:US11239391B2
公开(公告)日:2022-02-01
申请号:US16604397
申请日:2018-04-10
Inventor: Bjørn Ove Myking Fimland , Helge Weman , Dingding Ren
Abstract: A composition of matter comprising at least one nanostructure grown epitaxially on an optionally doped β-Ga2O3 substrate, wherein said nanostructure comprises at least one group III-V compound.
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公开(公告)号:US11450528B2
公开(公告)日:2022-09-20
申请号:US16456591
申请日:2019-06-28
Inventor: Dong Chul Kim , Ida Marie Høiaas , Mazid Munshi , Bjørn Ove Fimland , Helge Weman , Dingding Ren , Dasa Dheeraj
IPC: H01L21/02
Abstract: A process for growing nanowires or nanopyramids comprising: (I) providing a graphitic substrate and depositing AlGaN, InGaN, AlN or AlGa(In)N on said graphitic substrate at an elevated temperature to form a buffer layer or nanoscale nucleation islands of said compounds; (II) growing a plurality of semiconducting group III-V nanowires or nanopyramids, preferably III-nitride nanowires or nanopyramids, on the said buffer layer or nucleation islands on the graphitic substrate, preferably via MOVPE or MBE.
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公开(公告)号:US10714337B2
公开(公告)日:2020-07-14
申请号:US15749228
申请日:2016-08-01
Inventor: Dong Chul Kim , Ida Marie Høiaas , Mazid Munshi , Bjørn Ove Fimland , Helge Weman , Dingding Ren , Dasa Dheeraj
IPC: H01L21/02
Abstract: A process for growing nanowires or nanopyramids comprising: (I) providing a graphitic substrate and depositing AlGaN, InGaN, AlN or AlGa(In)N on said graphitic substrate at an elevated temperature to form a buffer layer or nanoscale nucleation islands of said compounds; (II) growing a plurality of semiconducting group III-V nanowires or nanopyramids, preferably III-nitride nanowires or nanopyramids, on the said buffer layer or nucleation islands on the graphitic substrate, preferably via MOVPE or MBE.
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