公开(公告)号：US11874237B2

公开(公告)日：2024-01-16

申请号：US17114842

申请日：2020-12-08

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： Heath Pois ,  David Reed ,  Bruno Shueler ,  Rodney Smedt ,  Jeffrey Fanton

IPC: G01N23/201 ,  G01N23/207 ,  H01L21/66

CPC classification number: G01N23/201 ,  G01N23/207 ,  G01N2223/054 ,  H01L22/12

Abstract: A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.