公开(公告)号：US20240302302A1

公开(公告)日：2024-09-12

申请号：US17768464

申请日：2020-10-09

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Takehiro YOSHIDA

IPC分类号： G01N23/207 ,  G01N23/20008 ,  H01L21/304

CPC分类号： G01N23/207 ,  G01N23/20008 ,  H01L21/304 ,  G01N2223/1016

摘要： A nitride semiconductor substrate that has a diameter of 2 inches or more and includes a main surface for which the closest low index crystal plane is a (0001) plane. The ratio of FWHM1{10-12} to FWHM2{10-12} is 80% or more.

公开(公告)号：US20240210334A1

公开(公告)日：2024-06-27

申请号：US18600451

申请日：2024-03-08

申请人： Kioxia Corporation

发明人： Yuki ABE ,  Akira HAMAGUCHI ,  Takaki HASHIMOTO ,  Kazuhiro NOJIMA ,  Kaori FUMITA

IPC分类号： G01N23/201 ,  G01N21/47 ,  G01N21/95 ,  G01N23/207

CPC分类号： G01N23/201 ,  G01N21/4788 ,  G01N21/9501 ,  G01N23/207

摘要： A measurement device includes: an X-ray irradiation section; an X-ray detection section configured to detect scattered X-rays generated from an object; and an analysis section configured to analyze diffraction images obtained through photoelectric conversion of the scattered X-rays and estimate a three-dimensional shape of the object. A recessed portion is formed in a first film from an opening portion in a second film formed on the first film. The analysis section estimates a three-dimensional shape of the object on the basis of the diffraction images acquired while an irradiation angle of the X-rays with respect to the object is changed and shape data obtained by measuring the object in advance. The shape data include a film thickness of the second film, a neck diameter, and a bottom diameter.

公开(公告)号：US11996259B2

公开(公告)日：2024-05-28

申请号：US17754998

申请日：2020-10-22

申请人： NOVA MEASURING INSTRUMENTS INC.

发明人： David A. Reed ,  Bruce H. Newcome ,  Bruno W. Schueler

IPC分类号： H01J35/08 ,  G01N23/20008 ,  G01N23/207 ,  G01N23/2208 ,  G01N23/223 ,  H01J35/24

CPC分类号： H01J35/112 ,  G01N23/20008 ,  G01N23/207 ,  G01N23/2208 ,  G01N23/223 ,  H01J35/24 ,  G01N2223/045 ,  G01N2223/052 ,  G01N2223/056 ,  G01N2223/072 ,  G01N2223/076 ,  G01N2223/085 ,  G01N2223/1016 ,  G01N2223/204 ,  G01N2223/611 ,  H01J2235/081 ,  H01J2235/084 ,  H01J2235/086 ,  H01J2235/1204 ,  H01J2235/1291

摘要： The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.

公开(公告)号：US20240167969A1

公开(公告)日：2024-05-23

申请号：US18507147

申请日：2023-11-13

申请人： Rigaku Corporation

发明人： Hideo TORAYA

IPC分类号： G01N23/2055 ,  G01N23/207

CPC分类号： G01N23/2055 ,  G01N23/207 ,  G01N2223/1016 ,  G01N2223/60

摘要： Provided is a degree-of-crystallinity measurement apparatus including: an X-ray scattering pattern acquisition module which acquires an X-ray scattering pattern of a sample including a crystalline portion and an amorphous portion of a target substance; a pattern decomposition module which acquires a diffraction pattern of the crystalline portion and a continuous pattern from the X-ray scattering pattern; a target substance intensity calculation module which calculates an integrated intensity of the target substance based on the X-ray scattering pattern and chemical formula information of the target substance; a target substance pattern calculation module which calculates, from the continuous pattern, a scattering pattern of the target substance including the crystalline portion and the amorphous portion; a structural disorder parameter determination module which determines a structural disorder parameter of the crystalline portion based on the diffraction pattern of the crystalline portion and the scattering pattern of the target substance; and a degree-of-crystallinity output module.

公开(公告)号：US20240151663A1

公开(公告)日：2024-05-09

申请号：US18277152

申请日：2022-02-15

申请人： Merck Patent GMBH

发明人： Carolina Von Essen ,  Lara Rosenberger

IPC分类号： G01N23/207 ,  C07D213/06 ,  C07D401/14

CPC分类号： G01N23/207 ,  C07D213/06 ,  C07D401/14 ,  G01N2223/615

摘要： The present invention is directed to methods for selecting (solution) conditions to introduce an analyte guest compound into a crystalline polynuclear metal complex. The selected (solution) conditions can be used in a method for introducing an analyte guest compound into a crystalline polynuclear metal complex to form a crystal structure analysis sample. The molecular structure of the analyte guest compound can be determined by X-ray crystallography using the crystal structure analysis sample obtained with such method.

公开(公告)号：US11927550B2

公开(公告)日：2024-03-12

申请号：US17547479

申请日：2021-12-10

申请人： Malvern Panalytical B.V.

发明人： Jaap Boksem ,  Detlef Beckers

IPC分类号： G01N23/20025 ,  G01N23/207 ,  G01N23/2204

CPC分类号： G01N23/20025 ,  G01N23/207 ,  G01N23/2204 ,  G01N2223/03 ,  G01N2223/056 ,  G01N2223/076 ,  G01N2223/1016 ,  G01N2223/307 ,  G01N2223/309 ,  G01N2223/419

摘要： The sample mounting system comprises a sample holder and a sample stage having a platform for supporting the sample holder. The sample can be fixed to the sample holder by a mount. The sample holder comprises a holder reference portion, which co-operates with a corresponding reference portion of the sample stage (the stage reference portion) to align the sample holder with the sample stage. When the sample holder is positioned on the platform such that the stage reference portion and the holder reference portion engage each other, the sample holder is aligned with the sample stage.

公开(公告)号：US11874237B2

公开(公告)日：2024-01-16

申请号：US17114842

申请日：2020-12-08

申请人： NOVA MEASURING INSTRUMENTS INC.

发明人： Heath Pois ,  David Reed ,  Bruno Shueler ,  Rodney Smedt ,  Jeffrey Fanton

IPC分类号： G01N23/201 ,  G01N23/207 ,  H01L21/66

CPC分类号： G01N23/201 ,  G01N23/207 ,  G01N2223/054 ,  H01L22/12

摘要： A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.

公开(公告)号：US11862685B2

公开(公告)日：2024-01-02

申请号：US17665166

申请日：2022-02-04

申请人： SENIC Inc.

发明人： Jong Hwi Park ,  Kap-Ryeol Ku ,  Jung-Gyu Kim ,  Jung Woo Choi ,  Myung-Ok Kyun

IPC分类号： H01L21/16 ,  H01L29/16 ,  G01N23/207 ,  H01L21/02 ,  H01L21/66

CPC分类号： H01L29/1608 ,  G01N23/207 ,  H01L21/02529 ,  H01L22/12

摘要： The wafer having a retardation distribution measured with a light having a wavelength of 520 nm, wherein an average value of the retardation is 38 nm or less, wherein the wafer comprises a micropipe, and wherein a density of the micropipe is 1.5/cm2 or less, is disclosed.

公开(公告)号：US11802844B2

公开(公告)日：2023-10-31

申请号：US17295855

申请日：2019-11-21

申请人： Rigaku Corporation

发明人： Takashi Sato

IPC分类号： G01N23/207 ,  G01N23/20025 ,  G01N1/28 ,  G01N23/20016

CPC分类号： G01N23/20025 ,  G01N1/28 ,  G01N23/207 ,  G01N23/20016

摘要： A single-crystal X-ray structure analysis apparatus capable of surely and easily performing a single-crystal X-ray structure analysis using a crystalline sponge, and an analysis method and a sample holder unit thereof are provided. There are provided a sample holder that holds a sample; a goniometer that rotationally moves, the sample holder 250 being attached to the goniometer; an X-ray irradiation section that irradiates the X-rays from the X-ray source to the sample held by the sample holder 250 attached to the goniometer, wherein the sample holder 250 comprises a porous complex crystal capable of soaking the sample in a plurality of fine pores formed therein, and the applicator comprises a space for soaking the sample in the porous complex crystal of the sample holder 250.

公开(公告)号：US11796485B2

公开(公告)日：2023-10-24

申请号：US17621005

申请日：2020-12-29

申请人： XENOCS SAS

发明人： Peter Hoghoj ,  Blandine Lantz

IPC分类号： G01N23/201 ,  G01N23/041 ,  G01N23/207

CPC分类号： G01N23/041 ,  G01N23/201 ,  G01N23/207 ,  G01N2223/054 ,  G21K2201/067

摘要： An X-ray scattering apparatus having a sample holder for aligning and/or orienting a sample to be analyzed by X-ray scattering, a first X-ray beam delivery system having a first X-ray source and a first monochromator being arranged upstream of the sample holder for generating and directing a first X-ray beam along a beam path, a distal X-ray detector arranged downstream of the sample holder and being movable, in a motorized way, is disclosed. The first X-ray beam delivery system is configured to focus the first X-ray beam onto a focal spot near the distal X-ray detector when placed at its largest distance from the sample holder or produce a parallel beam so that the X-ray scattering apparatus has a second X-ray beam delivery system having a second X-ray source and being configured to generate and direct a divergent second X-ray beam towards the sample holder for X-ray imaging.