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公开(公告)号：US5193682A
公开(公告)日：1993-03-16
申请号：US724980
申请日：1991-06-28
IPC分类号： H01L21/673
CPC分类号： H01L21/67326 , H01L21/68707 , Y10S206/833
摘要： A wafer basket in which the recesses provided for the engagement with the basket lifter are each formed with a dent at the upper and innermost corner of the recess, and a pair of stays are provided at the lower bent portions of the side walls in a manner such that the upper edges of the stays are of the same height and elevated to the extent that the downward movement of the wafers is checked by the stays rather than by the ribs.
摘要翻译： 其中设置用于与篮式升降机接合的凹槽的圆盘篮在凹槽的上部和最内角分别形成有凹痕，并且一对撑杆以一种方式设置在侧壁的下弯曲部分 使得支柱的上边缘具有相同的高度并且升高到通过支柱而不是肋来检查晶片的向下移动的程度。
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公开(公告)号：USD338991S
公开(公告)日：1993-08-31
申请号：US724320
申请日：1991-06-28
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公开(公告)号：US20060246724A1
公开(公告)日：2006-11-02
申请号：US10565879
申请日：2004-07-08
申请人： Naoyuki Takamatsu
发明人： Naoyuki Takamatsu
IPC分类号： H01L21/461 , C03C15/00 , B44C1/22
CPC分类号： H01L21/02024 , C09G1/02
摘要： There is provided a method for polishing a wafer in which linear defects are not generated. The polishing method comprises the steps of: holding a wafer on a rotatable wafer holding plate; and polishing a surface of the being in contact with a polishing cloth adhered on a rotatable table in such a state that a polishing agent is supplied onto the polishing cloth, wherein the polishing agent is an alkaline solution which contains silica having particles each in the shape of almost an sphere as a main component and further an organic base or a salt thereof. A quaternary ammonium hydroxide is used as the organic base or the salt thereof.
摘要翻译： 提供了一种抛光不产生线性缺陷的晶片的方法。 抛光方法包括以下步骤：将晶片保持在可旋转晶片保持板上; 并且在抛光剂被供给到抛光布上的状态下抛光与粘附在可旋转工作台上的抛光布接触的表面，其中所述抛光剂是含有二氧化硅的碱性溶液，所述二氧化硅具有形状 几乎为球状的主要成分，还有一种有机碱或其盐。 使用季铵氢氧化物作为有机碱或其盐。
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