公开(公告)号：US20090323043A1

公开(公告)日：2009-12-31

申请号：US12509738

申请日：2009-07-27

申请人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

发明人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

IPC分类号： G03B27/72

CPC分类号： G03F7/70191

摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

摘要翻译： 微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。 可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。 在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

公开(公告)号：US08169594B2

公开(公告)日：2012-05-01

申请号：US12509738

申请日：2009-07-27

申请人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

发明人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70191

摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

摘要翻译： 微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。 可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。 在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

公开(公告)号：US20120188527A1

公开(公告)日：2012-07-26

申请号：US13438179

申请日：2012-04-03

申请人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

发明人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

IPC分类号： G03B27/72

CPC分类号： G03F7/70191

摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

摘要翻译： 微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器）。 可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。 在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

公开(公告)号：US09116441B2

公开(公告)日：2015-08-25

申请号：US13438179

申请日：2012-04-03

申请人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

发明人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20

CPC分类号： G03F7/70191

摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane. The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

摘要翻译： 微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。 可以确定透射率分布，使得其具有对椭圆率的场依赖校正效果。 在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

公开(公告)号：US20070206381A1

公开(公告)日：2007-09-06

申请号：US10590537

申请日：2005-02-22

申请人： Damian Fiolka ,  Manfred Maul ,  Nils Dieckmann

发明人： Damian Fiolka ,  Manfred Maul ,  Nils Dieckmann

IPC分类号： F21S8/00

CPC分类号： G03F7/70583 ,  G03F7/70058

摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.

摘要翻译： 本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射 。 第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。 然后将两个部分光束共同传递到照明平面。 除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。 在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。 谐振器主体设置有具有不同局部相位分布的相位板。

公开(公告)号：US07593095B2

公开(公告)日：2009-09-22

申请号：US10590537

申请日：2005-02-22

申请人： Damian Fiolka ,  Manfred Maul ,  Nils Dieckmann

发明人： Damian Fiolka ,  Manfred Maul ,  Nils Dieckmann

IPC分类号： G03B27/72 ,  G03B27/42

CPC分类号： G03F7/70583 ,  G03F7/70058

摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then Passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.

摘要翻译： 本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射 。 第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。 然后将两个部分光束共同地通向照明平面。 除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。 在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。 谐振器主体设置有具有不同局部相位分布的相位板。

公开(公告)号：US20060290913A1

公开(公告)日：2006-12-28

申请号：US11475871

申请日：2006-06-28

申请人： Nils Dieckmann ,  Manfred Maul

发明人： Nils Dieckmann ,  Manfred Maul

IPC分类号： G03B27/42

CPC分类号： G03F7/70308 ,  G03F7/70566

摘要： In an exposure method for producing an image of a pattern, arranged in the object surface of a projection objective, in the image surface of the projection objective, the mask is illuminated with illumination radiation with the aid of the illumination system. The radiation varied by the mask and which enters the projection objective is thereby produced downstream of the mask. The projection objective is transirradiated with this radiation. An astigmatic variation of the radiation varied by the mask is effected in the region of at least one pupil surface of the projection objective, the astigmatic variation being designed such that an anisotropy of properties of the radiation striking the image surface that leads to direction-dependent contrast differences is at least partially compensated. The astigmatic variation can be achieved, for example, with the aid of an elliptical diaphragm or an elliptical transmission filter.

摘要翻译： 在布置在投影物镜的物体表面上的图形图像的曝光方法中，在投影物镜的图像表面中，借助于照明系统照射照射的掩模。 由掩模变化并进入投影物镜的辐射由此在掩模的下游产生。 投射物镜用这种辐射进行辐照。 由掩模变化的辐射的散光变化在投影物镜的至少一个瞳孔表面的区域中进行，散光变化被设计成使得射入图像表面的辐射的各向异性导致方向依赖 对比差异至少部分得到补偿。 像散变化可以例如借助椭圆形光阑或椭圆形透射滤光片来实现。

公开(公告)号：US08873023B2

公开(公告)日：2014-10-28

申请号：US13186068

申请日：2011-07-19

申请人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

发明人： Axel Scholz ,  Frank Schlesener ,  Nils Haverkamp ,  Vladimir Davydenko ,  Michael Gerhard ,  Gerhard-Wilhelm Ziegler ,  Mirco Kern ,  Thomas Bischoff ,  Thomas Stammler ,  Stephan Kellner ,  Manfred Maul ,  Daniel Walldorf ,  Igor Hurevich ,  Markus Deguenther

IPC分类号： G03B27/54 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70191 ,  G02B3/0043 ,  G03F7/70058 ,  G03F7/70075 ,  G03F7/70083

摘要： An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects. The raster elements of the two raster arrangements are arranged relative to one another in such a way that to each raster element type (I to III) is allocated at least one individual distance (ΔI, ΔII, ΔIII) between the first raster element of this type (I to III) and the allocated second raster element of the second raster arrangement. As a result, an illumination system is obtained which allows particular illumination parameters to be influenced in such a way that undesirable influences on other illumination parameters are avoided to the greatest extent possible.

摘要翻译： 用于微光刻的照明系统用于利用一次光源的照明光照射照明场。 第一光栅布置具有束形成的第一光栅元件，其布置在照明系统的第一平面中或与该平面相邻。 第一光栅布置用于产生二次光源的光栅布置。 传输光学器件用于将次级光源的照明光的叠加传输到照明场中。 传输光学器件具有第二光栅装置，其具有束形成第二光栅元件。 在每种情况下，第一光栅装置的一个光栅元件被分配给第二光栅布置的光栅元件之一，用于引导整束照明光的部分束。 例如，第一光栅布置具有至少两种具有不同束影响效果的第一光栅元件（I，II，III）。 两个光栅装置的光栅元件相对于彼此布置成使得每个光栅元素类型（I至III）被分配至少一个单独距离（＆Dgr; I，＆Dgr; II，＆Dgr; III） 这种类型的第一光栅元素（I至III）和第二光栅布置的分配的第二光栅元素。 结果，获得允许特定照明参数受到影响的照明系统，使得最大程度地避免对其他照明参数的不期望的影响。

公开(公告)号：US08730455B2

公开(公告)日：2014-05-20

申请号：US13181033

申请日：2011-07-12

申请人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

发明人： Damian Fiolka ,  Manfred Maul ,  Axel Scholz ,  Markus Deguenther ,  Johannes Wangler ,  Vladimir Davydenko

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20 ,  G03B27/68 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03F7/7015 ,  G03B27/54 ,  G03F7/70075 ,  G03F7/70108

摘要： An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.

摘要翻译： 用于微光刻投影曝光步进扫描装置的照明系统具有光源，第一光栅元件和第二光栅元件。 第一光栅元件在照明系统的第一光瞳平面中延伸，并且被设计成使得系统的几何光通量垂直于投影曝光设备的扫描方向增加。 第二光栅元件在照明系统的第二光瞳平面中延伸，其不一定与第一光瞳平面不同，并且被设计成使得系统的几何光通量在扫描方向上和垂直于其上增加。 这使得可以提高掩模版平面中的辐照度均匀性。

公开(公告)号：US08480261B2

公开(公告)日：2013-07-09

申请号：US13553005

申请日：2012-07-19

申请人： Manfred Maul ,  Damian Fiolka

发明人： Manfred Maul ,  Damian Fiolka

IPC分类号： F21V9/00 ,  G03B27/68

CPC分类号： G02B26/008 ,  G01J1/0488 ,  G02B27/0933 ,  G02B27/0994 ,  G03F7/70091 ,  G03F7/70191

摘要： The invention relates to a filter device for an illumination system, especially for the correction of the illumination of the illuminating pupil, including a light source, with the illumination system being passed through by a bundle of illuminating rays from the light source to an object plane, with the bundle of illuminating rays impinging upon the filter device, including at least one filter element which can be introduced into the beam path of the bundle of illuminating rays, with the filter element including an actuating device, so that the filter element can be brought with the help of the actuating device into the bundle of illuminating rays.

摘要翻译： 本发明涉及一种用于照明系统的过滤装置，特别是用于校正包括光源的照明光瞳的照明，照明系统通过一束照明光线从光源穿过到物平面 具有撞击在过滤装置上的一束照明光线，包括至少一个能够被引入照明光束的光束路径中的过滤元件，过滤元件包括致动装置，使得过滤元件可以是 在致动装置的帮助下带入照明光束。