公开(公告)号：US09476120B2

公开(公告)日：2016-10-25

申请号：US14169325

申请日：2014-01-31

申请人： Novellus Systems, Inc.

发明人： Henner Meinhold ,  Dan M. Doble ,  Stephen Lau ,  Vince Wilson ,  Easwar Srinivasan

IPC分类号： C23C16/455 ,  C23C16/509 ,  H01J37/32

CPC分类号： C23C16/45572 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32724

摘要： A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger.

公开(公告)号：US10584415B2

公开(公告)日：2020-03-10

申请号：US16291822

申请日：2019-03-04

申请人： Novellus Systems, Inc.

发明人： Henner Meinhold ,  Dan M. Doble ,  Stephen Lau ,  Vince Wilson ,  Easwar Srinivasan

IPC分类号： C23C16/455 ,  C23C16/509 ,  H01J37/32

摘要： A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger.

公开(公告)号：US20190256977A1

公开(公告)日：2019-08-22

申请号：US16291822

申请日：2019-03-04

申请人： Novellus Systems, Inc.

发明人： Henner Meinhold ,  Dan M. Doble ,  Stephen Lau ,  Vince Wilson ,  Easwar Srinivasan

IPC分类号： C23C16/455 ,  H01J37/32 ,  C23C16/509

摘要： A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger.

公开(公告)号：US20140158792A1

公开(公告)日：2014-06-12

申请号：US14169325

申请日：2014-01-31

申请人： Novellus Systems, Inc.

发明人： Henner Meinhold ,  Dan M. Doble ,  Stephen Lau ,  Vince Wilson ,  Easwar Srinivasan

IPC分类号： C23C16/455

CPC分类号： C23C16/45572 ,  C23C16/45563 ,  C23C16/45565 ,  C23C16/4557 ,  C23C16/5096 ,  H01J37/3244 ,  H01J37/32724

摘要： A temperature controlled showerhead for chemical vapor deposition (CVD) chambers enhances heat dissipation to enable accurate temperature control with an electric heater. Heat dissipates by conduction through a showerhead stem and fluid passageway and radiation from a back plate. A temperature control system includes one or more temperature controlled showerheads in a CVD chamber with fluid passageways serially connected to a heat exchanger.

摘要翻译： 用于化学气相沉积（CVD）室的温度控制喷头增强了散热，从而能够使用电加热器进行精确的温度控制。 散热通过喷头杆和流体通道的传导以及来自背板的辐射而消散。 温度控制系统包括在CVD室中的一个或多个温度控制的喷头，其中流体通道串联连接到热交换器。