公开(公告)号：US11664191B2

公开(公告)日：2023-05-30

申请号：US17643727

申请日：2021-12-10

申请人： NuFlare Technology, Inc.

发明人： Taku Yamada ,  Kota Iwasaki

IPC分类号： H01J37/30 ,  H01J37/04

CPC分类号： H01J37/3007 ,  H01J37/045 ,  H01J2237/0435

摘要： According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.

公开(公告)号：US11049688B2

公开(公告)日：2021-06-29

申请号：US16586254

申请日：2019-09-27

申请人： NuFlare Technology, Inc.

发明人： Michihiro Kawaguchi ,  Kiminobu Akeno ,  Keita Ideno ,  Kota Iwasaki ,  Keisuke Goto ,  Kiyoshi Nakaso ,  Shintaro Yamamoto ,  Hitoshi Matsushita ,  Ryota Inoue ,  Yuki Fukuda

IPC分类号： H01J37/244 ,  H01J37/02 ,  H01J37/26 ,  H05H7/00

摘要： A charged particle beam irradiation apparatus according to an embodiment includes: an optical column; a stage; a mount supporting the stage; a chamber provided on the mount and supporting the optical column; a detector configured to detect movement of the stage; actuator units each including a curved plate, a piezoelectric element, and a connector connected configured to transmit a first force generated by a change of the curvature of the curved plate to the mount; and an actuator control circuit configured to control the voltage applied to the piezoelectric element of each of the actuator units based on movement information, so that the first force is transmitted from the actuator units to the mount against a second force acting on the mount due to the movement of the stage.

公开(公告)号：US11621140B2

公开(公告)日：2023-04-04

申请号：US17305607

申请日：2021-07-12

申请人： NuFlare Technology, Inc.

发明人： Kota Iwasaki ,  Taku Yamada

IPC分类号： H01J37/317 ,  H01J37/04 ,  H01J37/10 ,  H01J37/24

摘要： A multiple electron beam writing apparatus includes an excitation light source to emit an excitation light, a multi-lens array to divide the excitation light into a plurality of lights, a photoemissive surface to receive the plurality of lights incident through its upper side, and emit multiple photoelectron beams from its back side, a blanking aperture array mechanism to provide, by deflecting each beam of the multiple photoelectron beams, an individual blanking control which individually switches each beam between ON and OFF, an electron optical system to include an electron lens, and to irradiate, using the electron lens, a target object with the multiple photoelectron beams having been controlled to be beam ON, and a control circuit to interconnect, for each shot of the multiple photoelectron beams, a timing of switching the excitation light between emission and non-emission with a timing of switching the each beam between ON and OFF.