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    STRESS-TUNED PLANAR LIGHTWAVE CIRCUIT AND METHOD THEREFOR
    1.
    发明申请
    STRESS-TUNED PLANAR LIGHTWAVE CIRCUIT AND METHOD THEREFOR 有权

    公开(公告)号：US20160202502A1

    公开(公告)日：2016-07-14

    申请号：US14998174

    申请日：2015-12-23

    申请人： Octrolix BV

    发明人： Rene Gerrit Heideman ,  Arne Leinse

    IPC分类号： G02F1/01

    CPC分类号： B05D1/36 ,  B05D5/06 ,  G02B6/122 ,  G02B6/132 ,  G02B6/14 ,  G02B6/305 ,  G02F1/00 ,  G02F1/0134 ,  G02F1/0136 ,  G02F1/225

    摘要： A planar lightwave circuit that can be optically coupled with an external device with low optical loss, while also providing low-power functional control over an optical signal propagating through the PLC is disclosed. The PLC includes a high-contrast waveguide region in a stress-inducing (SI) phase shifter is formed such that it can control the phase of the optical signal. The high-contrast-waveguide region is optically coupled to a low-contrast-waveguide region via a spotsize converter, thereby enabling optical coupling to off-chip devices with low optical loss. Formation of the SI phase shifter in a high-contrast-waveguide region enables improved responsivity and phase control, reduced voltage, and smaller required chip real estate. As a result, the present invention enables lower-cost and higher-performance PLC systems.

    Multi-path Interferometeric Sensor
    4.
    发明申请
    Multi-path Interferometeric Sensor 有权
    多路径干涉仪传感器

    公开(公告)号：US20160265898A1

    公开(公告)日：2016-09-15

    申请号：US15015965

    申请日：2016-02-04

    申请人： Octrolix BV

    发明人： Frederik Schreuder ,  Rene Gerrit Heideman

    IPC分类号： G01B9/02 ,  G02B6/293 ,  G01N21/45

    CPC分类号： G02B6/29343 ,  G01N21/45 ,  G01N21/7746 ,  G01N2021/399 ,  G01N2021/7716 ,  G01N2021/7776 ,  G01N2021/7779 ,  G02B6/00 ,  G02B6/29355

    摘要： A multi-path interferometric sensor for sensing small changes in the refractive index of sensing arms thereof, such as caused by the presence of an analyte or changes in analyte concentration, is disclosed. The sensor includes a single light source, a single detector, and a plurality of interferometers or a single multi-path interferometer. The various sensing branches within the multi-path interferometric sensor each include a delay having a different length. This results in a different modulation frequency for each interferometer, each of carriers include phase information that correlates to a change in refractive index and, ultimately, analyte concentration. The plural carrier frequencies enable simultaneous detection of multiple samples.

    摘要翻译： 公开了用于感测其感测臂的折射率的小变化的多路径干涉测量传感器，例如由分析物的存在或分析物浓度的变化引起的。 该传感器包括单个光源，单个检测器和多个干涉仪或单个多路径干涉仪。 多路径干涉测量传感器内的各种感测分支都包括具有不同长度的延迟。 这导致每个干涉仪的调制频率不同，每个载波包括与折射率变化和最终分析物浓度相关的相位信息。 多个载波频率使得能够同时检测多个样本。

    Layer Having a Non-linear Taper and Method of Fabrication
    5.
    发明申请
    Layer Having a Non-linear Taper and Method of Fabrication 有权
    具有非线性锥度的层和制造方法

    公开(公告)号：US20160246003A1

    公开(公告)日：2016-08-25

    申请号：US15004037

    申请日：2016-01-22

    申请人： Octrolix BV

    发明人： Rene Gerrit Heideman ,  Marcel Hoekman

    IPC分类号： G02B6/14 ,  G02B6/136 ,  G02B6/122

    CPC分类号： G02B6/14 ,  G02B6/1223 ,  G02B6/1228 ,  G02B6/136 ,  G02B2006/12173 ,  G02B2006/12176 ,  G02B2006/12195 ,  Y10T428/24479

    摘要： A method for forming a non-linear thickness-profile in a first layer of a first material is disclosed. The method comprises forming an accelerator layer of a second material on the first layer and forming a mask layer disposed on the accelerator layer, wherein the mask layer enables the accelerator layer to expose the first layer to a first etchant in a first region, where the exposure time for each point along a first axis varies non-linearly as a function of distance from a first point on the first axis. Since the time for which the first layer is exposed to the first etch in the first region is non-linear, the thickness of the first layer in the first region changes non-linearly along the first axis.

    摘要翻译： 公开了一种在第一材料的第一层中形成非线性厚度轮廓的方法。 该方法包括在第一层上形成第二材料的加速剂层并形成设置在加速剂层上的掩模层，其中掩模层使加速剂层能够将第一层暴露于第一区域中的第一蚀刻剂，其中 沿着第一轴的每个点的曝光时间作为与第一轴上的第一点的距离的函数非线性地变化。 由于第一层暴露于第一区域中的第一蚀刻的时间是非线性的，所以第一区域中的第一层的厚度沿着第一轴线非线性地改变。

    Stress-tuned planar lightwave circuit and method therefor
    6.
    发明授权
    Stress-tuned planar lightwave circuit and method therefor 有权
    应力调谐平面光波电路及其方法

    公开(公告)号：US09221074B2

    公开(公告)日：2015-12-29

    申请号：US14580831

    申请日：2014-12-23

    申请人： Octrolix BV

    发明人： Rene Gerrit Heideman ,  Arne Leinse

    IPC分类号： G02B6/12 ,  B05D1/36 ,  B05D5/06 ,  G02B6/30 ,  G02B6/14 ,  G02F1/00 ,  G02F1/01 ,  G02F1/225 ,  G02B6/122 ,  G02B6/132

    CPC分类号： B05D1/36 ,  B05D5/06 ,  G02B6/122 ,  G02B6/132 ,  G02B6/14 ,  G02B6/305 ,  G02F1/00 ,  G02F1/0134 ,  G02F1/0136 ,  G02F1/225

    摘要： A planar lightwave circuit that can be optically coupled with an external device with low optical loss, while also providing low-power functional control over an optical signal propagating through the PLC is disclosed. The PLC includes a high-contrast waveguide region in a stress-inducing (SI) phase shifter is formed such that it can control the phase of the optical signal. The high-contrast-waveguide region is optically coupled to a low-contrast-waveguide region via a spotsize converter, thereby enabling optical coupling to off-chip devices with low optical loss. Formation of the SI phase shifter in a high-contrast-waveguide region enables improved responsivity and phase control, reduced voltage, and smaller required chip real estate. As a result, the present invention enables lower-cost and higher-performance PLC systems.

    摘要翻译： 公开了一种平面光波电路，其可以与具有低光损耗的外部设备光学耦合，同时还提供通过PLC传播的光信号的低功率功能控制。 PLC包括应力诱导（SI）移相器中的高对比度波导区域，以便它可以控制光信号的相位。 高对比度波导区域经由斑点转换器光耦合到低对比度波导区域，从而使光耦合到具有低光损耗的片外器件。 在高对比度波导区域中形成SI移相器能够提高响应度和相位控制，降低的电压以及更小的所需芯片空间。 因此，本发明能够实现低成本和更高性能的PLC系统。

    STRESS-TUNED PLANAR LIGHTWAVE CIRCUIT AND METHOD THEREFOR
    7.
    发明申请
    STRESS-TUNED PLANAR LIGHTWAVE CIRCUIT AND METHOD THEREFOR 有权
    应力调整平面照明电路及其方法

    公开(公告)号：US20150110441A1

    公开(公告)日：2015-04-23

    申请号：US14580831

    申请日：2014-12-23

    申请人： Octrolix BV

    发明人： Rene Gerrit Heideman ,  Arne Leinse

    IPC分类号： G02B6/42 ,  B05D1/36 ,  B05D5/06

    CPC分类号： B05D1/36 ,  B05D5/06 ,  G02B6/122 ,  G02B6/132 ,  G02B6/14 ,  G02B6/305 ,  G02F1/00 ,  G02F1/0134 ,  G02F1/0136 ,  G02F1/225

    摘要： A planar lightwave circuit that can be optically coupled with an external device with low optical loss, while also providing low-power functional control over an optical signal propagating through the PLC is disclosed. The PLC includes a high-contrast waveguide region in a stress-inducing (SI) phase shifter is formed such that it can control the phase of the optical signal. The high-contrast-waveguide region is optically coupled to a low-contrast-waveguide region via a spotsize converter, thereby enabling optical coupling to off-chip devices with low optical loss. Formation of the SI phase shifter in a high-contrast-waveguide region enables improved responsivity and phase control, reduced voltage, and smaller required chip real estate. As a result, the present invention enables lower-cost and higher-performance PLC systems.

    摘要翻译： 公开了一种平面光波电路，其可以与具有低光损耗的外部设备光学耦合，同时还提供通过PLC传播的光信号的低功率功能控制。 PLC包括应力诱导（SI）移相器中的高对比度波导区域，以便它可以控制光信号的相位。 高对比度波导区域经由斑点转换器光耦合到低对比度波导区域，从而使光耦合到具有低光损耗的片外器件。 在高对比度波导区域中形成SI移相器能够提高响应度和相位控制，降低的电压以及更小的所需芯片空间。 因此，本发明能够实现低成本和更高性能的PLC系统。

    Layer having a non-linear taper and method of fabrication
    9.
    发明授权
    Layer having a non-linear taper and method of fabrication 有权
    具有非线性锥度和制造方法的层

    公开(公告)号：US09268089B2

    公开(公告)日：2016-02-23

    申请号：US14270014

    申请日：2014-05-05

    申请人： Octrolix BV

    发明人： Rene Gerrit Heideman ,  Marcel Hoekman

    IPC分类号： G02B6/122 ,  G02B6/136 ,  G02B6/12

    CPC分类号： G02B6/14 ,  G02B6/1223 ,  G02B6/1228 ,  G02B6/136 ,  G02B2006/12173 ,  G02B2006/12176 ,  G02B2006/12195 ,  Y10T428/24479

    摘要： A method for forming a non-linear thickness-profile in a first layer of a first material is disclosed. The method comprises forming an accelerator layer of a second material on the first layer and forming a mask layer disposed on the accelerator layer, wherein the mask layer enables the accelerator layer to expose the first layer to a first etchant in a first region, where the exposure time for each point along a first axis varies non-linearly as a function of distance from a first point on the first axis. Since the time for which the first layer is exposed to the first etch in the first region is non-linear, the thickness of the first layer in the first region changes non-linearly along the first axis.

    摘要翻译： 公开了一种在第一材料的第一层中形成非线性厚度轮廓的方法。 该方法包括在第一层上形成第二材料的加速剂层并形成设置在加速剂层上的掩模层，其中掩模层使加速剂层能够将第一层暴露于第一区域中的第一蚀刻剂，其中 沿着第一轴的每个点的曝光时间作为与第一轴上的第一点的距离的函数非线性地变化。 由于第一层暴露于第一区域中的第一蚀刻的时间是非线性的，所以第一区域中的第一层的厚度沿着第一轴线非线性地变化。

    Surface waveguide having a tapered region and method of forming
    10.
    发明授权
    Surface waveguide having a tapered region and method of forming 有权
    具有锥形区域的表面波导和成形方法

    公开(公告)号：US09020317B2

    公开(公告)日：2015-04-28

    申请号：US14051715

    申请日：2013-10-11

    申请人： Octrolix BV

    发明人： Rene Gerrit Heideman ,  Arne Leinse

    IPC分类号： G02B6/10 ,  G02B6/30 ,  G02B6/14

    CPC分类号： G02B6/305 ,  G02B6/14

    摘要： A method for forming a waveguide having a thin-core region, a thick-core region, and a transition region of tapered thickness between them is disclosed. The method comprises forming a lower core layer of a first material on a lower cladding, forming a thin central core layer of a second material on the first core layer, forming an upper core layer of the first material on the central core layer, and etching the upper core layer in an etchant such that it is removed from the thin-core region and its thickness monotonically changes from its as-deposited thickness to extinction across the transition region, where the central core layer protects the lower core layer from exposure to the etchant.

    摘要翻译： 公开了一种形成具有薄壁区域，厚芯区域和它们之间的锥形厚度的过渡区域的波导的方法。 该方法包括在下包层上形成第一材料的下芯层，在第一芯层上形成第二材料的薄中心芯层，在中心芯层上形成第一材料的上芯层，以及蚀刻 蚀刻剂中的上芯层使得其从薄芯区域移除，并且其厚度从其沉积厚度单调地从过渡区域逐渐变化到消光，其中中心芯层保护下芯层免受暴露于 蚀刻剂