公开(公告)号：US06636297B2

公开(公告)日：2003-10-21

申请号：US09842230

申请日：2001-04-26

申请人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai

发明人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai

IPC分类号： G01J300

CPC分类号： G01J9/00 ,  G01J1/4257

摘要： A vacuum ultraviolet laser wavelength measuring apparatus capable of accurately measuring wavelength characteristics of a laser beam. The wavelength measuring apparatus has spectral devices for generating an optical pattern corresponding to wavelength characteristics of an incident laser beam and measuring wavelength characteristics of a laser beam in a vacuum ultraviolet region oscillating from a vacuum ultraviolet laser on the basis of the optical pattern. The apparatus has a fluorescent screen for generating a fluorescent pattern having an intensity distribution corresponding to an intensity distribution of the incident optical pattern, a pattern detector for measuring the intensity distribution of the fluorescent pattern, and arithmetic unit for calculating the wavelength characteristics of the laser beam on the basis of the measured intensity distribution.

摘要翻译： 一种能够精确地测量激光束的波长特性的真空紫外激光波长测量装置。 波长测量装置具有用于产生与入射激光束的波长特性相对应的光学图案的光谱装置，并且基于光学图案测量从真空紫外激光器振荡的真空紫外区域中的激光束的波长特性。 该装置具有用于产生具有对应于入射光学图案的强度分布的强度分布的荧光图案的荧光屏，用于测量荧光图案的强度分布的图案检测器和用于计算激光器的波长特性的算术单元 基于测量的强度分布。

公开(公告)号：US06243163B1

公开(公告)日：2001-06-05

申请号：US09398191

申请日：1999-09-17

申请人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai ,  Toru Suzuki ,  Takeshi Ohta ,  Hirokazu Kubo

发明人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai ,  Toru Suzuki ,  Takeshi Ohta ,  Hirokazu Kubo

IPC分类号： G01J328

CPC分类号： G01J9/00 ,  G01J3/28

摘要： The present invention can accurately detect a wavelength of a light to be detected, which is output from a source of light to be detected, without an error even if there is a change in the characteristic of a spectroscope due to an individual difference among the spectroscopes or a change in the measuring environment. The device according to the invention emits at least two reference lights (Ln, La) having different wavelengths (&lgr;n, &lgr;a) as the reference lights by reference light source. And, actual characteristic value (D) of spectroscope is calculated on the basis of detection positions (Sn, Sa) of the at least two reference lights (Ln, La) on a sensor and the known wavelengths (&lgr;n, &lgr;a) of the at least two reference lights (Ln, La) (D=(&lgr;a−&lgr;n)/(Sa−Sn)). And, on the basis of the detection positions (Sn, SO) of the reference light (Ln) and the light to be detected (LO) on the sensor (10), the calculated actual characteristic value (D) of the spectroscope and the known wavelength (&lgr;n) of the reference light (Ln), wavelength (&lgr;O) of the light to be detected (LO) is calculated (&lgr;O=&lgr;n+(SO−Sn)·D).

摘要翻译： 即使由于各分光器之间的个体差异而导致的分光器的特性发生变化，本发明也能够准确地检测从被检测光源输出的被检测光的波长 或测量环境的变化。 根据本发明的装置通过参考光源发射具有不同波长（lambdn，λ））的至少两个参考光（Ln，La）作为参考光。 并且，基于传感器上的至少两个参考光（Ln，La）的检测位置（Sn，Sa）以及在传感器上的已知波长（lambdn，λ）来计算分光计的实际特征值（D） 至少两个参考光（Ln，La）（D =（λ-lambdn）/（Sa-Sn）））。 并且，基于传感器（10）上的基准光（Ln）和被检测光（LO）的检测位置（Sn，SO），计算出的分光器的实际特性值（D）和 计算参考光（Ln）的已知波长（lambdn），待检测光（LO）的波长（lambd0）（lambdO = lambdn +（SO-Sn）.D）。

公开(公告)号：US06819699B1

公开(公告)日：2004-11-16

申请号：US09518639

申请日：2000-03-03

申请人： Tatsuo Enami ,  Osamu Wakabayashi ,  Katsutomo Terashima ,  Kiwamu Takehisa ,  Tsukasa Hori ,  Hakaru Mizoguchi

发明人： Tatsuo Enami ,  Osamu Wakabayashi ,  Katsutomo Terashima ,  Kiwamu Takehisa ,  Tsukasa Hori ,  Hakaru Mizoguchi

IPC分类号： H01S322

CPC分类号： H01S3/225

摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.

摘要翻译： 用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。 由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体 控制器向准分子激光气体添加痕量的氙气。 因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。

公开(公告)号：US06337872B1

公开(公告)日：2002-01-08

申请号：US09422857

申请日：1999-10-25

申请人： Hisashi Nara ,  Kiyoharu Nakao ,  Hakaru Mizoguchi ,  Toshihiro Nishisaka ,  Tatsuo Enami

发明人： Hisashi Nara ,  Kiyoharu Nakao ,  Hakaru Mizoguchi ,  Toshihiro Nishisaka ,  Tatsuo Enami

IPC分类号： H01S322

CPC分类号： H01S3/036 ,  H01S3/225

摘要： The invention provides an once through fan for an excimer laser apparatus having a reduced vibration and being capable of increasing a rotational speed. In order to obtain this, in an once through fan (1) for an excimer laser apparatus provided with a blade portion (6) having a plurality of blades, a rotary shaft (4) for rotating the blade portion and a magnetic bearing (7) rotatably supporting the rotary shaft in a non-contact manner so as to circulate a laser gas sealed within a chamber (2) in accordance with a rotation of the blade portion, a rotor (21) of a motor (23) installed within the chamber (2) and rotating the rotary shaft (4) is mounted on an outer peripheral portion of the rotary shaft, and at least one magnetic bearing (7, 7) for supporting the rotary shaft is arranged in each of both sides in an axial direction of the rotor.

摘要翻译： 本发明提供了一种具有减小的振动并能够增加转速的准分子激光装置的一次通过风扇。 为了获得这一点，在设置有具有多个叶片的叶片部分（6）的准分子激光装置的一次通过风扇（1）中，用于使叶片部分旋转的旋转轴（4）和磁性轴承（7） ）以不接触的方式可旋转地支撑旋转轴，以便根据叶片部分的旋转使密封在腔室（2）内的激光气体循环;马达（23）的转子（21）安装在 室（2）并旋转旋转轴（4）安装在旋转轴的外周部分上，并且至少一个用于支撑旋转轴的磁轴承（7,7）以轴向方向布置在两侧 转子方向。

公开(公告)号：US07984539B2

公开(公告)日：2011-07-26

申请号：US11984292

申请日：2007-11-15

申请人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

发明人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

IPC分类号： B29C73/00

CPC分类号： H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

公开(公告)号：US20110232058A1

公开(公告)日：2011-09-29

申请号：US13152369

申请日：2011-06-03

申请人： Junichi FUJIMOTO ,  Hakaru Mizoguchi ,  Tatsuo Enami

发明人： Junichi FUJIMOTO ,  Hakaru Mizoguchi ,  Tatsuo Enami

IPC分类号： B23P6/00

CPC分类号： H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

公开(公告)号：US07196796B2

公开(公告)日：2007-03-27

申请号：US10341364

申请日：2003-01-14

申请人： Masato Moriya ,  Tatsuo Enami ,  Hirokazu Kubo ,  Masashi Shinbori ,  Toru Suzuki

发明人： Masato Moriya ,  Tatsuo Enami ,  Hirokazu Kubo ,  Masashi Shinbori ,  Toru Suzuki

IPC分类号： G01B9/02

CPC分类号： G01J9/0246 ,  H01S5/0687

摘要： In a wavelength detecting apparatus using an etalon, a drift in wavelength measurement by the etalon is stabilized and an adverse influence of out gas is eliminated, so that correct wavelength measurement is realized. The wavelength detecting apparatus includes a housing equipped with a port for use of introducing replacement gas, an etalon set inside the housing, and a moisture-absorbing unit for absorbing at least moisture released inside the housing.

摘要翻译： 在使用标准具的波长检测装置中，标准具的波长测量的漂移被稳定，并且消除了气体的不良影响，从而实现了正确的波长测量。 波长检测装置包括：壳体，其具有用于引入替代气体的端口，在壳体内部设置的标准具;以及用于吸收至少吸收在壳体内部释放的水分的吸湿单元。

公开(公告)号：US08813329B2

公开(公告)日：2014-08-26

申请号：US13152369

申请日：2011-06-03

申请人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

发明人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

IPC分类号： B29C73/00

CPC分类号： H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

公开(公告)号：US20080115342A1

公开(公告)日：2008-05-22

申请号：US11984292

申请日：2007-11-15

申请人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

发明人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

IPC分类号： B21D39/00

CPC分类号： H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。