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公开(公告)号：US20110232058A1
公开(公告)日：2011-09-29
申请号：US13152369
申请日：2011-06-03
申请人： Junichi FUJIMOTO , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi FUJIMOTO , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B23P6/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。
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公开(公告)号：US07984539B2
公开(公告)日：2011-07-26
申请号：US11984292
申请日：2007-11-15
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B29C73/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。
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公开(公告)号：US08813329B2
公开(公告)日：2014-08-26
申请号：US13152369
申请日：2011-06-03
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B29C73/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。
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公开(公告)号：US20080115342A1
公开(公告)日：2008-05-22
申请号：US11984292
申请日：2007-11-15
申请人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
发明人： Junichi Fujimoto , Hakaru Mizoguchi , Tatsuo Enami
IPC分类号： B21D39/00
CPC分类号： H01S3/2308 , H01S3/0014 , H01S3/03 , H01S3/10092 , H01S3/225 , Y10T29/49718 , Y10T29/49721 , Y10T29/4973 , Y10T29/49826
摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.
摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。
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5.发明授权Arf excimer laser device, scanning type exposure device and ultraviolet laser device 有权Arf准分子激光装置，扫描型曝光装置和紫外线激光装置公开(公告)号：US06819699B1
公开(公告)日：2004-11-16
申请号：US09518639
申请日：2000-03-03
申请人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
发明人： Tatsuo Enami , Osamu Wakabayashi , Katsutomo Terashima , Kiwamu Takehisa , Tsukasa Hori , Hakaru Mizoguchi
IPC分类号： H01S322
CPC分类号： H01S3/225
摘要： A buffer gas contained in a laser gas used for an ArF excimer laser mainly consists of He, and Xe is preferably added to the laser gas. Mixture piping divided by valves is disposed on piping running from a chamber to an excimer laser gas cylinder, the mixture piping and a Xe gas cylinder are connected, gas exhaust by a gas exhaust module and opening and closing of the valves are controlled by a gas controller to add a trace quantity of xenon gas to the excimer laser gas. Thus, to remedy a burst characteristic and a spike characteristic of the ultraviolet laser device by adding a trace quantity of xenon gas, the xenon gas can be supplied efficiently into the chamber without modifying existing laser gas supply equipment.
摘要翻译： 用于ArF准分子激光器的激光气体中所含的缓冲气体主要由He构成，优选将Xe添加到激光气体中。 由阀门分隔的混合管道设置在从室到准分子激光气瓶的管道上，混合管道和Xe气瓶连接，气体排气模块排气和阀门的打开和关闭由气体 控制器向准分子激光气体添加痕量的氙气。 因此，为了通过添加痕量的氙气来补偿紫外激光装置的突发特性和尖峰特性，可以将氙气有效地供应到腔室中而不改变现有的激光气体供应装置。
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公开(公告)号：US06337872B1
公开(公告)日：2002-01-08
申请号：US09422857
申请日：1999-10-25
IPC分类号： H01S322
摘要： The invention provides an once through fan for an excimer laser apparatus having a reduced vibration and being capable of increasing a rotational speed. In order to obtain this, in an once through fan (1) for an excimer laser apparatus provided with a blade portion (6) having a plurality of blades, a rotary shaft (4) for rotating the blade portion and a magnetic bearing (7) rotatably supporting the rotary shaft in a non-contact manner so as to circulate a laser gas sealed within a chamber (2) in accordance with a rotation of the blade portion, a rotor (21) of a motor (23) installed within the chamber (2) and rotating the rotary shaft (4) is mounted on an outer peripheral portion of the rotary shaft, and at least one magnetic bearing (7, 7) for supporting the rotary shaft is arranged in each of both sides in an axial direction of the rotor.
摘要翻译： 本发明提供了一种具有减小的振动并能够增加转速的准分子激光装置的一次通过风扇。 为了获得这一点，在设置有具有多个叶片的叶片部分（6）的准分子激光装置的一次通过风扇（1）中，用于使叶片部分旋转的旋转轴（4）和磁性轴承（7） ）以不接触的方式可旋转地支撑旋转轴，以便根据叶片部分的旋转使密封在腔室（2）内的激光气体循环;马达（23）的转子（21）安装在 室（2）并旋转旋转轴（4）安装在旋转轴的外周部分上，并且至少一个用于支撑旋转轴的磁轴承（7,7）以轴向方向布置在两侧 转子方向。
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公开(公告)号：US6130904A
公开(公告)日：2000-10-10
申请号：US669332
申请日：1996-06-20
摘要： In an excimer laser apparatus in which halogen gas, rare gas and buffer gas are fed into the laser chamber, before laser oscillation, the oscillation stop time is calculated, and, if the calculated oscillation stop time exceeds a prescribed time, the calculated oscillation stop time is used to calculate a feeding amount of mixed gas comprising rare gas or buffer gas, and the mixed gas is fed, prior to laser oscillation, in the calculated feeding amount; stable laser output is thereby obtained from the initial period of laser oscillation.
摘要翻译： PCT No.PCT / JP94 / 02187 Sec。 371日期：1996年6月20日 102（e）日期1996年6月20日PCT 1994年12月22日PCT PCT。 公开号WO95 / 18477 日期：1995年6月7日在激光振荡前将卤素气体，稀有气体和缓冲气体供给到激光室的准分子激光装置中，计算振荡停止时间，如果计算出的振荡停止时间超过规定时间 使用计算出的振荡停止时间来计算包含稀有气体或缓冲气体的混合气体的进料量，并且在激光振荡之前将所述混合气体以计算的进料量进料; 从激光振荡的初始阶段得到稳定的激光输出。
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公开(公告)号：US5663977A
公开(公告)日：1997-09-02
申请号：US619530
申请日：1996-03-19
申请人： Junichi Fujimoto , Hakaru Mizoguchi
发明人： Junichi Fujimoto , Hakaru Mizoguchi
CPC分类号： H01S3/036
摘要： A gas laser apparatus is operated in such a manner that gas supplied to a laser chamber is excited for laser oscillation. A cabinet (11) which houses gas containers (12 and 13) is located adjacent to the laser oscillator (1) or integrated with it, The piping for the laser gas is incorporated in the cabinet, Such a structure realizes an economical laser of stabilized performance and easy maintenance.
摘要翻译： PCT No.PCT / JP94 / 01600 Sec。 371日期：1996年3月19日 102（e）1996年3月19日PCT PCT 1994年9月28日PCT公布。 公开号WO95 / 09460 日期1995年04月6日气体激光装置的操作是这样一种方式使得供应给激光室的气体被激发用于激光振荡。 容纳气体容器（12和13）的机柜（11）位于激光振荡器（1）附近或与其一体化的地方，激光气体的管道被并入机柜中，这种结构实现了经济的激光器 性能好，维护方便。
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公开(公告)号：US5373523A
公开(公告)日：1994-12-13
申请号：US136448
申请日：1993-10-14
CPC分类号： H01S3/0346 , H01S3/036 , H01S3/225
摘要： An excimer laser apparatus is provided with a compact high efficiency dust particle removal means which is capable of maintaining the windows clean with only a small volume of purging gas, and which prevents deterioration of aperture masks without having to increase the cavity length or risking the possibility of leakage from piping connections. The excimer laser apparatus uses, as dust particle removal means, filters (13a and 13b) made of metal or ceramic which is non-reactive with fluorine. A ground potential dust collector can be provided at a downstream side of a static dust particle remover, having an anode and a cathode, for collecting any dust particles which have passed through the static dust particle remover. In addition, clean laser medium gas can be introduced into subchambers (14a and 14b) through gas introducing passages (11a and 11b) provided in the walls of the housing (1) and then into the laser chamber (12) through labyrinths (8a and 8b) without disturbing the clean gas which stays near the internal surfaces of the windows (6a and 6b).
摘要翻译： 准分子激光装置设置有紧凑的高效除尘装置，其能够仅利用少量清洗气体来保持窗户清洁，并且防止孔径掩模的劣化，而不必增加空腔长度或冒着可能性 从管道连接泄漏。 准分子激光装置使用与氟反应的金属或陶瓷制成的过滤器（13a，13b）作为除尘装置。 可以在具有阳极和阴极的静电除尘器的下游侧设置地电位集尘器，用于收集通过静电除尘器的任何灰尘颗粒。 此外，可以通过设置在壳体（1）的壁中的气体引入通道（11a和11b）将干净的激光介质气体引入到子室（14a和14b）中，然后通过迷宫（8a和8a）进入激光室 8b），而不干扰保持在窗口（6a和6b）的内表面附近的清洁气体。
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10.发明授权
公开(公告)号：US5450436A
公开(公告)日：1995-09-12
申请号：US154531
申请日：1993-11-19
摘要： A laser system which realizes its stable operation. In the system, a spectrum width of laser light dischargingly excited in a laser chamber is detected by a spectrum width monitor. A controller controls, on the basis of the detected spectrum width, a replenishment amount of gas to be replenished from an F2 gas cylinder into the laser chamber through a sub-tank and on-off valves to cause the spectrum width to become constant.Further, when replenishment of a halogen gas diluted with a buffer gas is carried out, a gas exhaustion step of keeping the internal total gas pressure of the laser chamber constant is omitted.In addition, a laser oscillation pulse number is counted for a predetermined period of time and a replenishment amount of the halogen gas is carried out according to the count value.
摘要翻译： 实现其稳定运行的激光系统。 在该系统中，通过光谱宽度监视器检测在激光室中放电激发的激光的光谱宽度。 控制器基于检测到的频谱宽度，通过子箱和开关阀将从F2气瓶补充的气体的补充量控制到激光室，使得光谱宽度变得恒定。 此外，当进行用缓冲气体稀释的卤素气体的补充时，省略了保持激光室内部总气体压力恒定的气体排出步骤。 此外，激光振荡脉冲数被计数预定时间段，并且根据计数值执行卤素气体的补充量。
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