公开(公告)号：US06337872B1

公开(公告)日：2002-01-08

申请号：US09422857

申请日：1999-10-25

申请人： Hisashi Nara ,  Kiyoharu Nakao ,  Hakaru Mizoguchi ,  Toshihiro Nishisaka ,  Tatsuo Enami

发明人： Hisashi Nara ,  Kiyoharu Nakao ,  Hakaru Mizoguchi ,  Toshihiro Nishisaka ,  Tatsuo Enami

IPC分类号： H01S322

CPC分类号： H01S3/036 ,  H01S3/225

摘要： The invention provides an once through fan for an excimer laser apparatus having a reduced vibration and being capable of increasing a rotational speed. In order to obtain this, in an once through fan (1) for an excimer laser apparatus provided with a blade portion (6) having a plurality of blades, a rotary shaft (4) for rotating the blade portion and a magnetic bearing (7) rotatably supporting the rotary shaft in a non-contact manner so as to circulate a laser gas sealed within a chamber (2) in accordance with a rotation of the blade portion, a rotor (21) of a motor (23) installed within the chamber (2) and rotating the rotary shaft (4) is mounted on an outer peripheral portion of the rotary shaft, and at least one magnetic bearing (7, 7) for supporting the rotary shaft is arranged in each of both sides in an axial direction of the rotor.

摘要翻译： 本发明提供了一种具有减小的振动并能够增加转速的准分子激光装置的一次通过风扇。 为了获得这一点，在设置有具有多个叶片的叶片部分（6）的准分子激光装置的一次通过风扇（1）中，用于使叶片部分旋转的旋转轴（4）和磁性轴承（7） ）以不接触的方式可旋转地支撑旋转轴，以便根据叶片部分的旋转使密封在腔室（2）内的激光气体循环;马达（23）的转子（21）安装在 室（2）并旋转旋转轴（4）安装在旋转轴的外周部分上，并且至少一个用于支撑旋转轴的磁轴承（7,7）以轴向方向布置在两侧 转子方向。

公开(公告)号：US08779401B2

公开(公告)日：2014-07-15

申请号：US13533464

申请日：2012-06-26

申请人： Hakaru Mizoguchi ,  Takayuki Yabu ,  Toshihiro Nishisaka

发明人： Hakaru Mizoguchi ,  Takayuki Yabu ,  Toshihiro Nishisaka

IPC分类号： G21K5/00

CPC分类号： H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A target supply unit includes a nozzle unit having a through-hole to allow a target material to be outputted therethrough. A cover is provided to cover the nozzle unit, the cover having a through-hole to allow the target material to pass therethrough. A discharge device is included to pump out gas inside a space defined by the cover.

摘要翻译： 目标供给单元包括具有通孔以允许目标材料从其中输出的喷嘴单元。 提供盖以覆盖喷嘴单元，盖具有通孔以允许目标材料通过。 包括排出装置以在由盖限定的空间内排出气体。

公开(公告)号：US20120228527A1

公开(公告)日：2012-09-13

申请号：US13477940

申请日：2012-05-22

申请人： Tamotsu ABE ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu ABE ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： G21K5/02

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US08212228B2

公开(公告)日：2012-07-03

申请号：US12382108

申请日：2009-03-09

申请人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： H05G2/00

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus prevents debris staying and accumulating within a chamber from contaminating the chamber and deteriorating the performance of an important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 极紫外光源装置可防止残留物积聚在室内，免受室内污染，降低重要光学元件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US5754579A

公开(公告)日：1998-05-19

申请号：US750538

申请日：1996-12-13

申请人： Hakaru Mizoguchi ,  Toshihiro Nishisaka ,  Hiroshi Komori

发明人： Hakaru Mizoguchi ,  Toshihiro Nishisaka ,  Hiroshi Komori

IPC分类号： H01S3/036 ,  H01S3/134 ,  H01S3/22

CPC分类号： H01S3/036 ,  H01S3/134

摘要： A first object is to stabilize output of laser light. In order to achieve the first object, if it is detected by an output detection means (15) that the output (E) of laser light (La) has departed from a target value, whilst maintaining the voltage of a power source (17) at a fixed value or in a fixed range, the amount of laser gas supplied to a laser chamber (4) is controlled such that the output (E) of laser light becomes the target value. A second object is to reduce the wear of the pre-ionization electrodes and to prevent drop in output of laser light. The second object is achieved as follows. Specifically, the pulse current discharged from primary capacitor (C1) is stepped up in voltage by a pulse transformer and is charged onto a secondary capacitor (C2). At this point a magnetic switch (SR) that is connected to the downstream side of secondary capacitor (C2) becomes saturated and becomes conductive, allowing current to pass through pre-ionization electrodes (6) that are connected in series with the magnetic switch (SR). At the time-point where the movement of charge of secondary capacitor (C2) has finished, a discharge current in the reverse direction tries to flow in secondary capacitor (C2) but magnetic switch (SR) acts to block the reverse current, stopping the pre-ionization discharge. Concurrently with this the core of pulse transformer (20) is saturated, with the result that charge starts to move from secondary capacitor (C2) to peaking capacitor (C4). The voltage of peaking capacitor (C4) therefore rises until it reaches the discharge initiation voltage, and laser oscillation is performed.

摘要翻译： PCT No.PCT / JP95 / 01015 Sec。 371日期1996年12月13日第 102（e）日期1996年12月13日PCT提交1995年5月26日PCT公布。 第WO95 / 34927号公报 日期1995年12月21日第一个目标是稳定激光输出。 为了实现第一目的，如果由输出检测装置（15）检测到激光（La）的输出（E）已经脱离目标值，同时保持电源（17）的电压， 在固定值或固定范围内，供给激光室（4）的激光气体的量被控制成激光的输出（E）成为目标值。 第二个目的是减少预电离电极的磨损并防止激光输出的下降。 第二个目的是如下实现的。 具体地说，从主电容器（C1）放出的脉冲电流通过脉冲变压器升压成电压并充电到次级电容器（C2）上。 此时，与次级电容器（C2）的下游侧连接的磁性开关（SR）饱和并变成导通状态，使电流通过与磁性开关串联连接的预电离电极（6） SR）。 在二次电容器（C2）的充电移动完成的时间点，反向放电电流试图在二次电容器（C2）中流动，但是磁性开关（SR）用于阻止反向电流，停止 预电离放电。 与此同时，脉冲变压器（20）的核心是饱和的，结果是充电开始从次级电容器（C2）移动到峰值电容器（C4）。 峰值电容器（C4）的电压因此上升直到达到放电起始电压，并且执行激光振荡。

公开(公告)号：US20090224181A1

公开(公告)日：2009-09-10

申请号：US12382108

申请日：2009-03-09

申请人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

发明人： Tamotsu Abe ,  Toshihiro Nishisaka ,  Hiroshi Someya ,  Masato Moriya ,  Takeshi Asayama ,  Hideo Hoshino ,  Hakaru Mizoguchi

IPC分类号： G01J3/10

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/70916

摘要： An extreme ultra violet light source apparatus in which debris staying and accumulating within a chamber can be prevented from contaminating the chamber and deteriorating the performance of important optical component. The extreme ultra violet light source apparatus includes: a chamber in which extreme ultra violet light is generated; a driver laser for applying a laser beam to a target supplied to a predetermined position within the chamber to generate plasma; a collector mirror provided within the chamber, for collecting and outputting the extreme ultra violet light radiated from the plasma; an exhaust path communicating with the chamber and connected to an exhausting device, for maintaining an interior of the chamber at a certain pressure; a catching chamber provided in the exhaust path, for catching debris generated from the plasma; and a collecting unit for collecting the caught debris out of the chamber.

摘要翻译： 可以防止残留在室内积聚的碎片的极紫外光源装置污染室，劣化重要的光学部件的性能。 极紫外光源装置包括：产生极紫外光的室; 用于将激光束施加到提供到所述室内的预定位置的目标以产生等离子体的驱动器激光器; 设置在室内的收集器反射镜，用于收集和输出从等离子体辐射的极紫外光; 与所述室连通并连接到排气装置的排气路径，用于将所述室的内部保持在一定压力; 设置在排气路径中的捕获室，用于捕获从等离子体产生的碎屑; 以及收集单元，用于将捕获的碎屑收集在室外。

公开(公告)号：US20110232058A1

公开(公告)日：2011-09-29

申请号：US13152369

申请日：2011-06-03

申请人： Junichi FUJIMOTO ,  Hakaru Mizoguchi ,  Tatsuo Enami

发明人： Junichi FUJIMOTO ,  Hakaru Mizoguchi ,  Tatsuo Enami

IPC分类号： B23P6/00

CPC分类号： H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

公开(公告)号：US07984539B2

公开(公告)日：2011-07-26

申请号：US11984292

申请日：2007-11-15

申请人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

发明人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

IPC分类号： B29C73/00

CPC分类号： H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

公开(公告)号：US08813329B2

公开(公告)日：2014-08-26

申请号：US13152369

申请日：2011-06-03

申请人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

发明人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

IPC分类号： B29C73/00

CPC分类号： H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

公开(公告)号：US20080115342A1

公开(公告)日：2008-05-22

申请号：US11984292

申请日：2007-11-15

申请人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

发明人： Junichi Fujimoto ,  Hakaru Mizoguchi ,  Tatsuo Enami

IPC分类号： B21D39/00

CPC分类号： H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

摘要： When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

摘要翻译： 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。