公开(公告)号：US12106989B2

公开(公告)日：2024-10-01

申请号：US18332314

申请日：2023-06-09

Applicant: PICO & TERA CO., LTD. ,  Bum Je Woo

Inventor： Bum Je Woo

IPC: H01L21/673 ,  H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67393 ,  H01L21/67167 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67376 ,  H01L21/67386 ,  H01L21/6773

Abstract: Proposed is an EFEM configured to perform wafer transfer between a wafer storage device and process equipment. More particularly, proposed is an EFEM that prevents harmful gases inside a transfer chamber in which wafer transfer is performed from escaping out of the EFEM.

公开(公告)号：US20160284580A1

公开(公告)日：2016-09-29

申请号：US15079632

申请日：2016-03-24

Applicant: Bum Je Woo ,  Pico & Tera Co., Ltd.

Inventor： Bum Je Woo ,  Seok Mun Yoon ,  Myoung Sok Han ,  Hyun Sin Kim

IPC: H01L21/673

Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container wherein the space of the wafer storage container is divided into the spaces, namely a storage room, a gas injection room, and a gas exhausting room, which are independent and separate from each other, so when the wafer storage container is transported to the load port and being coupled therewith, the purge gas is injected/exhausted through the separating walls inside the storage room, thereby efficiently removing the remaining fumes on the surface of the wafer.

Abstract translation: 本发明涉及一种晶片储存容器，更具体地说，涉及晶片储存容器，其中晶片储存容器的空间被分为空间，即储藏室，注气室和排气室，其中 彼此独立且分开，因此当晶片储存容器被输送到负载端口并与之耦合时，净化气体通过储藏室内的隔离壁注入/排出，从而有效地除去表面上剩余的烟雾 的晶片。

公开(公告)号：US11715659B2

公开(公告)日：2023-08-01

申请号：US17836703

申请日：2022-06-09

Applicant: PICO & TERA CO., LTD. ,  Bum Je Woo

Inventor： Bum Je Woo

IPC: H01L21/673 ,  H01L21/677 ,  H01L21/67

CPC classification number: H01L21/67393 ,  H01L21/6773 ,  H01L21/67167 ,  H01L21/67196 ,  H01L21/67201 ,  H01L21/67376 ,  H01L21/67386

Abstract: Proposed is an EFEM configured to perform wafer transfer between a wafer storage device and process equipment. More particularly, proposed is an EFEM that prevents harmful gases inside a transfer chamber in which wafer transfer is performed from escaping out of the EFEM.

公开(公告)号：US11710651B2

公开(公告)日：2023-07-25

申请号：US17246325

申请日：2021-04-30

Applicant: PICO & TERA CO., LTD. ,  Bum Je Woo

Inventor： Bum Je Woo ,  Seok Mun Yoon ,  Jang Heo ,  Young Chul Kim

IPC: H01L21/673 ,  H01L21/02 ,  H01L21/67

CPC classification number: H01L21/67393 ,  H01L21/02 ,  H01L21/67 ,  H01L21/673 ,  H01L21/6732

Abstract: The present invention relates to a container for storing a wafer, particularly to a container for storing a wafer in which a plurality of purging areas is vertically partitioned in the interior of a storage chamber, and a purge gas is sprayed into the plurality of purging areas, thereby allowing not only uniform purging of the wafer to be assured but also efficient purging of the wafer without waste of the purge gas to be achieved.

公开(公告)号：US10580675B2

公开(公告)日：2020-03-03

申请号：US15975651

申请日：2018-05-09

Applicant: PICO & TERA CO., LTD. ,  Bum Je Woo

Inventor： Bum Je Woo ,  Seok Mun Yoon ,  Myoung Sok Han ,  Hyun Sin Kim

IPC: H01L21/677 ,  H01L21/673

Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container wherein the space of the wafer storage container is divided into the spaces, namely a storage room, a gas injection room, and a gas exhausting room, which are independent and separate from each other, so when the wafer storage container is transported to the load port and being coupled therewith, the purge gas is injected/exhausted through the separating walls inside the storage room, thereby efficiently removing the remaining fumes on the surface of the wafer.

公开(公告)号：US11342200B2

公开(公告)日：2022-05-24

申请号：US14760345

申请日：2013-10-31

Applicant: PICO & TERA CO., LTD.

Inventor： Bum Je Woo

IPC: H01L21/67 ,  H01L21/677 ,  F24F7/007 ,  H01L21/673 ,  F24F7/00

Abstract: Provided is an exhaust system of a wafer treatment device, and the main purpose thereof is to prevent secondary contamination of a wafer by not allowing foreign substances such as process gases and fumes and the like floating in the wafer treatment device to make contact with the wafer in a side storage. The wafer treatment device comprises: a cleaning device for removing foreign substances remaining on a wafer; and an exhaust device comprising first and second main bodies at the lower side of a main body of the wafer treatment device. By not allowing foreign substances such as process gases and fumes and the like floating in the wafer treatment device to make contact with a wafer in a side storage, secondary contamination of the wafer is prevented.

公开(公告)号：US10720352B2

公开(公告)日：2020-07-21

申请号：US15079632

申请日：2016-03-24

Applicant: Pico & Tera Co., Ltd. ,  Bum Je Woo

Inventor： Bum Je Woo ,  Seok Mun Yoon ,  Myoung Sok Han ,  Hyun Sin Kim

IPC: H01L21/677 ,  H01L21/673

Abstract: The present invention relates to a wafer storage container, more particularly, relates to a wafer storage container wherein the space of the wafer storage container is divided into the spaces, namely a storage room, a gas injection room, and a gas exhausting room, which are independent and separate from each other, so when the wafer storage container is transported to the load port and being coupled therewith, the purge gas is injected/exhausted through the separating walls inside the storage room, thereby efficiently removing the remaining fumes on the surface of the wafer.

公开(公告)号：US12014937B2

公开(公告)日：2024-06-18

申请号：US17726445

申请日：2022-04-21

Applicant: PICO & TERA CO., LTD.

Inventor： Bum Je Woo

IPC: H01L21/67 ,  F24F7/007 ,  H01L21/673 ,  H01L21/677

CPC classification number: H01L21/67028 ,  F24F7/007 ,  H01L21/67017 ,  H01L21/67389 ,  H01L21/67393 ,  H01L21/67781

Abstract: Provided is an exhaust system of a wafer treatment device, and the main purpose thereof is to prevent secondary contamination of a wafer by not allowing foreign substances such as process gases and fumes and the like floating in the wafer treatment device to make contact with the wafer in a side storage. The wafer treatment device comprises: a cleaning device for removing foreign substances remaining on a wafer; and an exhaust device comprising first and second main bodies at the lower side of a main body of the wafer treatment device. By not allowing foreign substances such as process gases and fumes and the like floating in the wafer treatment device to make contact with a wafer in a side storage, secondary contamination of the wafer is prevented.

公开(公告)号：US11984336B2

公开(公告)日：2024-05-14

申请号：US17738939

申请日：2022-05-06

Applicant: PICO & TERA CO., LTD. ,  Bum Je Woo

Inventor： Bum Je Woo

IPC: H01L21/673

CPC classification number: H01L21/67393 ,  H01L21/6732 ,  H01L21/67386

Abstract: Proposed is a wafer storage container for accommodating wafers in a storage chamber and, more particularly, a wafer storage container that can effectively block contaminated outside air flowing into the wafer storage container from an external chamber.

公开(公告)号：US11387125B2

公开(公告)日：2022-07-12

申请号：US17107368

申请日：2020-11-30

Applicant: PICO & TERA CO., LTD. ,  Bum Je Woo

Inventor： Bum Je Woo

IPC: H01L21/673 ,  H01L21/677 ,  H01L21/67

Abstract: Proposed is an EFEM configured to perform wafer transfer between a wafer storage device and process equipment. More particularly, proposed is an EFEM that prevents harmful gases inside a transfer chamber in which wafer transfer is performed from escaping out of the EFEM.