Thin film transistor crystal liquid display device including plural conductive beads and manufacturing method thereof
    2.
    发明申请
    Thin film transistor crystal liquid display device including plural conductive beads and manufacturing method thereof 有权
    包括多个导电珠的薄膜晶体管晶体液晶显示装置及其制造方法

    公开(公告)号:US20030058378A1

    公开(公告)日:2003-03-27

    申请号:US10228981

    申请日:2002-08-27

    IPC分类号: G02F001/136

    CPC分类号: G02F1/133553 G02F1/133555

    摘要: A structure of a thin film transistor (TFT) liquid crystal display (LCD) device including plural conductive beads and a manufacturing method thereof are provided. The manufacturing method includes the steps of (a) providing an insulated substrate, (b) forming a TFT structure and a transparent electrode structure on the insulated substrate wherein the transparent electrode structure is connected to a source/drain region of the TFT structure, and (c) forming a thin film structure including plural conductive beads on the transparent electrode structure.

    摘要翻译: 提供了包括多个导电珠的薄膜晶体管(TFT)液晶显示器(LCD)器件的结构及其制造方法。 制造方法包括以下步骤:(a)提供绝缘基板,(b)在绝缘基板上形成TFT结构和透明电极结构,其中透明电极结构连接到TFT结构的源极/漏极区域,以及 (c)在透明电极结构上形成包括多个导电珠的薄膜结构。

    Method for fabricating an interference display unit
    3.
    发明申请
    Method for fabricating an interference display unit 有权
    制造干涉显示单元的方法

    公开(公告)号:US20040209192A1

    公开(公告)日:2004-10-21

    申请号:US10705824

    申请日:2003-11-13

    IPC分类号: G03C005/00

    摘要: A method for fabricating an interference display unit is provided. A first plate and a sacrificial layer are formed in order on a substrate and at least two openings are formed in the first plate and the sacrificial layer. A photoresist layer is spin-coated on the sacrificial layer and fills the openings. A photolithographic process patterns the photoresist layer to define a support with an arm. A second plate is formed on the sacrificial layer and posts. The arm's stress is released through a thermal process. The position of the arm is shifted and the distance between the first plate and the second plate is therefore defined. Finally, The sacrificial layer is removed.

    摘要翻译: 提供一种制造干涉显示单元的方法。 在基板上依次形成第一板和牺牲层,并且在第一板和牺牲层中形成至少两个开口。 将光致抗蚀剂层旋涂在牺牲层上并填充开口。 光刻工艺使光致抗蚀剂图案形成具有臂的支撑。 在牺牲层和柱上形成第二板。 手臂的压力通过热过程释放。 臂的位置移动,因此限定了第一板和第二板之间的距离。 最后,牺牲层被去除。

    Structure of a structure release and a method for manufacturing the same
    4.
    发明申请
    Structure of a structure release and a method for manufacturing the same 失效
    结构释放的结构及其制造方法

    公开(公告)号:US20040240027A1

    公开(公告)日:2004-12-02

    申请号:US10725585

    申请日:2003-12-03

    IPC分类号: G02F001/03 G02F001/07

    CPC分类号: G02B26/001

    摘要: A structure of a structure release and a manufacturing method are provided. The structure and manufacturing method are adapted for an interference display cell. The structure of the interference display cell includes a first electrode, a second electrode and at least one supporter. The second electrode has at least one hole and is arranged about parallel with the first electrode. The supporter is located between the first electrode and the second electrode and a cavity is formed. In the release etch process of manufacturing the structure, an etchant can pass through the hole to etch a sacrificial layer between the first and the second electrodes to form the cavity; therefore, the time needed for the process becomes shorter.

    摘要翻译: 提供了结构释放的结构和制造方法。 该结构和制造方法适用于干涉显示单元。 干涉显示单元的结构包括第一电极,第二电极和至少一个支撑件。 第二电极具有至少一个孔并且与第一电极大致平行地布置。 支撑件位于第一电极和第二电极之间,并且形成空腔。 在制造结构的释放蚀刻工艺中,蚀刻剂可以穿过该孔以蚀刻第一和第二电极之间的牺牲层以形成空腔; 因此,该过程所需的时间变短。

    Optical-interference type display panel and method for making the same
    5.
    发明申请
    Optical-interference type display panel and method for making the same 有权
    光干涉式显示面板及其制造方法

    公开(公告)号:US20040147198A1

    公开(公告)日:2004-07-29

    申请号:US10752666

    申请日:2004-01-08

    IPC分类号: H01J009/00

    CPC分类号: G02B26/001

    摘要: An optical-interference type display panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple first conductive optical film stacks, supporting layers and multiple second conductive optical film stacks are formed. The substrate further has a plurality of connecting pads consisting of a transparent conductive film of the first conductive optical film stacks. Since the transparent conductive film is made of indium tin oxide, these connecting pads have the excellent anti-oxidation ability at their surface.

    摘要翻译: 公开了一种光干涉型显示面板及其制造方法,其中显示面板具有形成有多个第一导电光学膜叠层,支撑层和多个第二导电光学膜叠层的基板。 基板还具有由第一导电光学膜叠层的透明导电膜构成的多个连接焊盘。 由于透明导电膜由氧化铟锡制成,这些连接焊盘在其表面具有优异的抗氧化能力。

    Optical-interference type reflective panel and method for making the same
    6.
    发明申请
    Optical-interference type reflective panel and method for making the same 有权
    光干涉型反射板及其制造方法

    公开(公告)号:US20040145811A1

    公开(公告)日:2004-07-29

    申请号:US10752811

    申请日:2004-01-08

    IPC分类号: G02B001/10

    CPC分类号: G02B5/288 G02B26/001

    摘要: An optical-interference type reflective panel and a method for making the same are disclosed, wherein the display panel has a substrate on which multiple supporting layers are firstly formed. Then, a plurality of first conductive optical film stacks, spacing layers and multiple second conductive optical film stacks are sequentially formed on the substrate. Finally, once the spacing layers are removed, optical-interference regulators are formed. Since said supporting layers forming step is prior to the first conductive optical film stacks, a precise back-side exposing step is not necessary so that the making procedure of the panel is simplified.

    摘要翻译: 公开了一种光干涉型反射板及其制造方法,其中显示面板具有首先形成有多个支撑层的基板。 然后,在衬底上依次形成多个第一导电光学膜堆叠,间隔层和多个第二导电光学膜堆叠。 最后,一旦间隔层被去除,就形成光干涉调节器。 由于所述支撑层形成步骤在第一导电光学膜堆叠之前,因此不需要精确的背面曝光步骤,从而简化了面板的制作步骤。