公开(公告)号：US08825444B1

公开(公告)日：2014-09-02

申请号：US12555721

申请日：2009-09-08

申请人： Pablo I. Rovira ,  Jaime Poris ,  Jonathan M. Madsen ,  Scott D. Penner

发明人： Pablo I. Rovira ,  Jaime Poris ,  Jonathan M. Madsen ,  Scott D. Penner

IPC分类号： G06F11/30 ,  G21C17/00 ,  G01C25/00 ,  G01D18/00 ,  G06F11/34 ,  G05B23/02

CPC分类号： G06F11/3409 ,  G05B23/024

摘要： A metrology unit includes an integrated reference target with which an automated system check process is performed. The automated system check process includes measuring a feature on the reference target and determining if the measurement is within a desired specification for the metrology unit. When the metrology unit fails the automated system check, or if otherwise warranted, an automated diagnosis process may be performed using the same integrated reference target. The automated system check and automated diagnosis may be optimized based on correlations between parameters of the automated qualification and parameters of the automated diagnosis. Similarly, the measurement of a processed wafer may be optimized based on a correlation between parameters of the metrology of the processed wafer and parameters of the automated system check.

摘要翻译： 计量单元包括执行自动化系统检查过程的集成参考目标。 自动化系统检查过程包括测量参考目标上的特征并确定测量是否在度量单元的期望规格内。 当计量单元故障自动化系统检查时，或者如果有其他保证，则可以使用相同的集成参考目标来执行自动诊断过程。 可以基于自动化鉴定的参数和自动诊断的参数之间的相关性来优化自动化系统检查和自动诊断。 类似地，可以基于处理的晶片的度量的参数和自动化系统检查的参数之间的相关性来优化处理的晶片的测量。

公开(公告)号：US07173417B1

公开(公告)日：2007-02-06

申请号：US10402661

申请日：2003-03-28

申请人： Jaime Poris ,  Claudio L. Rampoldi ,  Pablo I. Rovira ,  Christopher W. Blaufus

发明人： Jaime Poris ,  Claudio L. Rampoldi ,  Pablo I. Rovira ,  Christopher W. Blaufus

IPC分类号： G01B7/06 ,  G01R33/02

CPC分类号： G01B7/105 ,  G01B11/0616

摘要： A metrology instrument includes an eddy current sensor that is mounted to and concentric with a confocal distance sensor. By measuring the precise vertical placement of the eddy current probe with respect to the surface of the sample using the confocal distance sensor, the accuracy and precision of the eddy current measurement is improved. Because the confocal distance sensor and the eddy current sensor are confocal, there is no need to move the relative lateral positions between the sample and instrument, between the distance measurement and the eddy current measurement, thereby reducing error in the measurement as well are maximizing the throughput by minimizing the required stage travel for a single measurement.

摘要翻译： 计量仪器包括安装在共聚距离传感器上并与其同心的涡流传感器。 通过使用共聚距离传感器测量涡流探针相对于样品表面的精确垂直布置，提高了涡流测量的精度和精度。 由于共焦距离传感器和涡流传感器是共焦的，所以在距离测量和涡流测量之间，不需要在样品和仪器之间移动相对的横向位置，从而减少了测量中的误差，同时也使最大化 通过最小化单个测量所需的阶段行程来实现吞吐量。

公开(公告)号：US07061613B1

公开(公告)日：2006-06-13

申请号：US10758619

申请日：2004-01-13

申请人： Chunsheng Huang ,  Pablo I. Rovira ,  Jaime Poris

发明人： Chunsheng Huang ,  Pablo I. Rovira ,  Jaime Poris

IPC分类号： G01J4/00

CPC分类号： G01J4/04 ,  G01N21/211 ,  G01N2021/213

摘要： An ellipsometer with a variable retarder, which introduces a spatial dependence in the beam, includes a polarizing beam splitter to produce two beams with orthogonal polarization states. The beam splitter may be, e.g., a polarizing displacer or polarizing beam splitter. The intensities of the two beams are measured, e.g., using separate detectors or separate detector elements in an array. The intensity from the two beams may be summed and used as a reference to normalize intensity of the produced beam.

摘要翻译： 具有可变延迟器的椭圆光度计，其在光束中引入空间依赖性，包括偏振分束器，以产生具有正交偏振状态的两个光束。 分束器可以是例如偏振置换器或偏振分束器。 测量两个光束的强度，例如使用阵列中的分离的检测器或单独的检测器元件。 来自两个光束的强度可以相加并用作标准化所产生的光束的强度的参考。

公开(公告)号：US07005306B1

公开(公告)日：2006-02-28

申请号：US10618155

申请日：2003-07-11

申请人： Jaime Poris

发明人： Jaime Poris

IPC分类号： H01L21/66

CPC分类号： H01L22/14 ,  H01L2924/0002 ,  H01L2924/00

摘要： The thickness of a thin conductive film is accurately measured without direct knowledge of the temperature of the sample. A coulometer measurement during deposition of the conductive film on a substrate, along with other data such as the plated surface area, the electrochemical reaction, the molar volume of the deposited metal and the coulombic efficiency, is used to determine the average thickness of the film. Eddy current measurements yield the sheet resistance of the film at a plurality of locations, from which the average sheet resistance can be determined. The eddy current measurements are made so as to reduce the effects of any temperature change in the sample. The average thickness and the average sheet resistance yield the average resistivity of the film. The thickness of the film at a measurement location can be calculated using that average resistivity and the sheet resistance measurement at that location.

摘要翻译： 在不直接了解样品温度的情况下，精确测量薄导电膜的厚度。 使用在基板上沉积导电膜期间的电量计测量以及诸如电镀表面积，电化学反应，沉积金属的摩尔体积和库仑效率的其它数据来确定膜的平均厚度 。 涡流测量产生薄膜在多个位置处的薄层电阻，可以确定平均薄层电阻。 进行涡流测量以减少样品中任何温度变化的影响。 平均厚度和平均薄层电阻产生薄膜的平均电阻率。 可以使用该位置处的平均电阻率和薄层电阻测量来计算测量位置处的膜的厚度。

公开(公告)号：US06813031B1

公开(公告)日：2004-11-02

申请号：US10634568

申请日：2003-08-04

申请人： Jaime Poris ,  Claudio L. Rampoldi

发明人： Jaime Poris ,  Claudio L. Rampoldi

IPC分类号： G01B902

CPC分类号： G01B11/0616

摘要： A profiling method compensates for phase changes associated with the presence of multiple or varying material in the area to be measured. The profiling method measures at least a portion of the height profile of the area of interest. The phase of the different materials in the region are also obtained and used to generate a correction factor. Depending on the type of material in the region of interest, the correction factor may be the material specific phase difference of the materials in the region, e g., when at least one of the materials is opaque to the wavelength of light used to measure the height profile, or the relationship between the thickness and phase of the material for a desired thickness range, e.g., when one or more of the materials is transparent to the wavelengths used to measure the height profile. The correction factor is then used to correct and/or convert the measured phase profile to an actual height profile. Accordingly, an accurate height profile may be obtained for regions that include dishing, erosion, or that contain various types of materials.

摘要翻译： 分析方法补偿与要测量的区域中多个或不同材料的存在相关的相位变化。 分析方法测量感兴趣区域的高度分布的至少一部分。 该区域中不同材料的相位也被获得并用于产生校正因子。 根据感兴趣区域中的材料类型，校正因子可以是该区域中材料的材料特定相位差，例如当至少一种材料对于用于测量的光的波长是不透明的 高度分布，或者所需厚度范围内的材料的厚度和相位之间的关系，例如当一种或多种材料对于用于测量高度分布的波长是透明的。 然后将校正因子用于校正和/或将测量的相位曲线转换为实际高度分布。 因此，对于包括凹陷，侵蚀或包含各种类型的材料的区域，可以获得精确的高度分布。

公开(公告)号：US06657216B1

公开(公告)日：2003-12-02

申请号：US10173726

申请日：2002-06-17

申请人： Jaime Poris

发明人： Jaime Poris

IPC分类号： G01N2186

CPC分类号： G01B11/0608 ,  G02B21/0032 ,  G02B21/0064

摘要： A confocal displacement sensor uses one or two light sources and produces two spots on a sample surface. The reflected intensities from the two spots are detected and measured by one or two detectors. A vertical resolution enhancement can be implemented by modifying the properties of the objective and/or detector lenses. The resultant height profile does not need to be corrected for tilt as is common with all single point surface measurement techniques. A differential scan can be performed with the two spots relatively close together to generate the slope of the height profile. Integrating this profile yields the height profile of the scan. A referential scan can be performed by scanning the reference point across an area of constant height and the measurement point scanned across the feature to be measured to directly generate the height profile.

摘要翻译： 共焦位移传感器使用一个或两个光源，并在样品表面上产生两个点。 通过一个或两个检测器来检测和测量两个点的反射强度。 可以通过修改物镜和/或检测器透镜的特性来实现垂直分辨率增强。 如所有单点表面测量技术所常见的，所得到的高度轮廓不需要对倾斜进行校正。 可以使两个点相对靠近在一起进行差分扫描，以产生高度分布的斜率。 集成此配置文件会生成扫描的高度配置文件。 可以通过在恒定高度的区域上扫描参考点来执行参照扫描，并且在要测量的特征上扫描测量点以直接生成高度分布。

公开(公告)号：US5625170A

公开(公告)日：1997-04-29

申请号：US183476

申请日：1994-01-18

申请人： Jaime Poris

发明人： Jaime Poris

IPC分类号： G01G17/00 ,  G01G23/01 ,  G01G19/50 ,  G01C17/38

CPC分类号： G01G23/012 ,  G01G17/00

摘要： A time delayed differential weighing procedure used with an electronic analytical balance is optimized for samples exhibiting a small change in mass, for example from deposition, etching, plating or corroding, relative to the sample mass to minimize all significant sources of error that could otherwise degrade the measurement results, such as errors resulting from air density and temperature changes that occur during the interval between the first measurement of a sample, before the sample is processed, and a subsequent measurement of the sample, after the sample is processed. A calibration standard having substantially the same density as that of the sample is weighed both times the sample is weighed, i.e. before and after processing, to track the change in the sample balance reading due to air density and temperature changes, and thereby eliminate sample related errors. Balance and weighing procedure accuracy and precision are tested by a gauge study procedure. A procedure for determining area exposed after photoresist develop on a semiconductor wafer application is also provided.

摘要翻译： 与电子分析天平一起使用的时间延迟差分称重程序针对显示质量变化较小的样品（例如沉积，蚀刻，电镀或腐蚀）相对于样品质量进行了优化，以最大限度地减少所有可能降解的重要误差源 测量结果，例如在样品被处理之前在样品的第一次测量之间发生的间隔期间发生的空气密度和温度变化导致的误差，以及在样品被处理之后样品的随后测量。 在样品称重之前，即加工前后称量具有与样品密度基本相同的密度的校准标准，以跟踪由于空气密度和温度变化导致的样品平衡读数的变化，从而消除样品相关 错误。 平衡和称重程序的精度和精度通过量规研究程序进行测试。 还提供了用于确定在半导体晶片应用上的光致抗蚀剂显影后暴露的区域的步骤。

公开(公告)号：US20090148256A1

公开(公告)日：2009-06-11

申请号：US11953768

申请日：2007-12-10

申请人： Jaime Poris

发明人： Jaime Poris

IPC分类号： B65H1/04

CPC分类号： G01B5/0004

摘要： A chuck, which may hold a substrate during stress measurements, includes a number of pins that support the substrate. Each support pin has a dome shaped upper surface that contacts a bottom surface of a substrate when supporting the substrate. The dome shaped upper surface minimizes contact with the substrate as well as assists in maintaining the same contact location with the substrate regardless of substrate shape. The dome shaped upper surface may be formed of a layer of soft material having a high coefficient of static friction to hold the substrate stationary with respect to the pins when the chuck is accelerated moved during or between stress measurements. Additionally, the layer of soft material may be a thin layer that covers a hard internal dome to reduce creep.

摘要翻译： 在应力测量期间可夹持衬底的卡盘包括支撑衬底的多个销。 每个支撑销具有在支撑衬底时接触衬底的底表面的圆顶形的上表面。 圆顶形的上表面使得与基板的接触最小化，并且有助于保持与基板的相同的接触位置，而与基板形状无关。 圆顶形的上表面可以由具有高静态摩擦系数的软质材料层形成，以便当卡盘在应力测量期间或在应力测量之间被加速移动时，使基板相对于销静止。 此外，软材料层可以是覆盖硬内部圆顶以减少蠕变的薄层。

公开(公告)号：US06568290B1

公开(公告)日：2003-05-27

申请号：US09636264

申请日：2000-08-10

申请人： Jaime Poris

发明人： Jaime Poris

IPC分类号： G01N3300

CPC分类号： H01L21/7684 ,  H01L21/3212

摘要： A metrology process, in accordance with the present invention, measures the dishing of a first feature made of a first material by determining the relative height of the first feature with respect to a second feature, where the first and second features have different dishing rates. The relative height of the first feature with respect to the second feature may be determined by measuring a first relative height of the first feature with respect to a reference location, measuring a second relative height of the second feature with respect to a reference location, and calculating the difference between the first and second relative heights. Alternatively, other methods may be used. The relative height is then correlated with calibration data to determine the amount of dishing of the first feature. The calibration data is generated by first providing a sample substrate with features approximately the same as the substrate to be measured, e.g., first and second calibration features of similar dishing rates as first and second features on a production substrate. The sample substrate is then processed to produce dishing of the first and second calibration features. Subsequently, the actual dishing of the first and second calibration features is measured, and the difference in dishing between the first and second calibration features calculated. The calibration data is then produced by relating the difference in dishing between the first and second calibration features to the actual dishing of the first calibration feature.

摘要翻译： 根据本发明的计量过程通过确定第一特征相对于第二特征的相对高度来测量由第一材料制成的第一特征的凹陷，其中第一和第二特征具有不同的凹陷速率。 可以通过相对于参考位置测量第一特征相对于参考位置的第一相对高度来测量第一特征相对于第二特征的相对高度，相对于参考位置测量第二特征的第二相对高度，以及 计算第一和第二相对高度之间的差异。 或者，可以使用其他方法。 然后将相对高度与校准数据相关联，以确定第一特征的凹陷量。 通过首先提供具有与要测量的基底大致相同的特征的样品基底，例如具有与生产基底上的第一和第二特征相似的凹陷速率的第一和第二校准特征，生成校准数据。 然后对样品基底进行处理以产生第一和第二校准特征的凹陷。 随后，测量第一和第二校准特征的实际凹陷，并计算第一和第二校准特征之间的凹陷差。 然后通过将第一和第二校准特征之间的凹陷的差与第一校准特征的实际凹陷相关联来产生校准数据。

公开(公告)号：US4315059A

公开(公告)日：1982-02-09

申请号：US170254

申请日：1980-07-18

申请人： Ian D. Raistrick ,  Jaime Poris ,  Robert A. Huggins

发明人： Ian D. Raistrick ,  Jaime Poris ,  Robert A. Huggins

IPC分类号： H01M6/14 ,  H01M8/06 ,  H01M10/39 ,  H01M6/36

CPC分类号： H01M8/06 ,  H01M10/399 ,  H01M6/14

摘要： Lithium-based cells are promising for applications such as electric vehicles and load-leveling for power plants since lithium is very electropositive and light weight. One type of lithium-based cell utilizes a molten salt electrolyte and is operated in the temperature range of about 400.degree.-500.degree. C. Such high temperature operation accelerates corrosion problems and a substantial amount of energy is lost through heat transfer. The present invention provides an electrochemical cell (10) which may be operated at temperatures between about 100.degree.-170.degree. C. Cell (10) comprises an electrolyte (16), which preferably includes lithium nitrate, and a lithium or lithium alloy electrode (12).

摘要翻译： 锂电池对于电动车辆和发电厂的负载均衡等应用是有希望的，因为锂是非常正电和重量轻的。 一种类型的锂基电池使用熔盐电解质并在约400-500℃的温度范围内运行。这种高温操作加速了腐蚀问题，并且通过热传递损失了大量的能量。 本发明提供了可在约100-170℃的温度下操作的电化学电池（10）。电池（10）包括优选包括硝酸锂的电解质（16）和锂或锂合金电极 12）。