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    CORE CONFIGURATION FOR IN-SITU ELECTROMAGNETIC INDUCTION MONITORING SYSTEM
    3.
    发明公开
    CORE CONFIGURATION FOR IN-SITU ELECTROMAGNETIC INDUCTION MONITORING SYSTEM 审中-公开

    公开(公告)号：US20230213324A1

    公开(公告)日：2023-07-06

    申请号：US18183138

    申请日：2023-03-13

    Applicant: Applied Materials, Inc.

    Inventor： Hassan G. Iravani ,  Kun Xu ,  Denis Ivanov ,  Shih-Haur Shen ,  Boguslaw A. Swedek

    IPC: G01B7/06 ,  B24B49/10

    CPC classification number: G01B7/105 ,  B24B49/10

    Abstract: An apparatus for chemical mechanical polishing includes a support for a polishing pad having a polishing surface, and an electromagnetic induction monitoring system to generate a magnetic field to monitor a substrate being polished by the polishing pad. The electromagnetic induction monitoring system includes a core and a coil wound around a portion of the core. The core includes a back portion, a center post extending from the back portion in a first direction normal to the polishing surface, and an annular rim extending from the back portion in parallel with the center post and surrounding and spaced apart from the center post by a gap. A width of the gap is less than a width of the center post, and a surface area of a top surface of the annular rim is at least two times greater than a surface area of a top surface of the center post.

    Methods and apparatus to determine parameters in metal-containing films
    4.
    发明授权
    Methods and apparatus to determine parameters in metal-containing films 有权

    公开(公告)号：US09880233B2

    公开(公告)日：2018-01-30

    申请号：US13095279

    申请日：2011-04-27

    Applicant: Abraham Ravid

    Inventor： Abraham Ravid

    IPC: G01R33/00 ,  G01B7/06 ,  G01N27/72 ,  G01N27/90

    CPC classification number: G01R33/007 ,  G01B7/105 ,  G01N27/72 ,  G01N27/9033

    Abstract: A method and apparatus to determine a parameter of a metal-containing film are provided herein. In some embodiments, a method of determining a parameter of a metal-containing film may include generating a first magnetic field by flowing an alternating current through a coil disposed adjacent to and spaced apart from the metal-containing film, wherein the first magnetic field induces a second magnetic field proximate the metal-containing film; heating the metal-containing film from a first temperature to a second temperature; measuring a response of the first magnetic field to the second magnetic field as the metal-containing film is heated from the first temperature to the second temperature; and correlating the response with a rate of temperature change of the metal-containing film as the metal-containing film is heated from the first temperature to the second temperature to determine a parameter of the metal-containing film.

    Measuring probe for measuring the thickness of thin layers, and method for the production of a sensor element for the measuring probe
    6.
    发明授权
    Measuring probe for measuring the thickness of thin layers, and method for the production of a sensor element for the measuring probe 有权

    公开(公告)号：US09605940B2

    公开(公告)日：2017-03-28

    申请号：US14119953

    申请日：2012-05-24

    Applicant: Helmut Fischer

    Inventor： Helmut Fischer

    IPC: G01B7/06

    CPC classification number: G01B7/10 ,  G01B7/105 ,  Y10T29/49071

    Abstract: The invention relates to a measuring probe for measuring the thickness of thin layers with a housing, having at least one sensor element, which is received in the housing at least slightly moveably along a longitudinal axis and which comprises at least one winding device, which is allocated to the longitudinal axis, having a spherical positioning cap facing the outer front face of the housing, said cap being arranged in the longitudinal axis, wherein the spherical positioning cap has a basic body that has a cylindrical core section and a pole cap arranged on a front face of the core section, wherein the winding device is allocated to the spherical positioning cap, said winding device being formed from a discoidal or annular carrier with at least one Archimedean coil arranged thereon and with the basic body consisting of a ferritic material and the pole cap consisting of a hard metal.

    System and method for measuring non-conductive coating thickness using eddy currents
    7.
    发明授权
    System and method for measuring non-conductive coating thickness using eddy currents 有权
    使用涡流测量非导电涂层厚度的系统和方法

    公开(公告)号：US09194687B1

    公开(公告)日：2015-11-24

    申请号：US13018562

    申请日：2011-02-01

    Applicant: Feng Yu ,  Jay M. Amos

    Inventor： Feng Yu ,  Jay M. Amos

    IPC: G01B7/06

    CPC classification number: G01B7/105 ,  G01B7/06 ,  G01B7/10

    Abstract: A nondestructive system and method for measuring non-conductive coating thickness is disclosed. The method includes providing a composite substrate, placing a conductive layer over a surface of the composite substrate, and depositing a plurality of non-conductive coating layers over the conductive layer. An eddy-current measuring coil formed on a printed circuit board is provided atop the coating layers. The coil has a driving trace with first and second driving electrodes, and a receiving trace having first and second receiving electrodes. The receiving and driving traces can be either coaxial or interwoven, are spaced apart, and share a common center. A load administered to the first and second driving electrodes using an eddyscope is measured across the first and second receiving electrodes to determine impedance; the measured impedance is used to determine a total thickness of the plurality of coating layers and whether an overall coating thickness is uniform.

    Abstract translation: 公开了用于测量非导电涂层厚度的非破坏性系统和方法。 该方法包括提供复合衬底，将导电层放置在复合衬底的表面上，以及在导电层上沉积多个非导电涂层。 形成在印刷电路板上的涡流测量线圈设置在涂层的顶部。 线圈具有带有第一驱动电极和第二驱动电极的驱动迹线，以及具有第一和第二接收电极的接收迹线。 接收和驱动迹线可以是同轴的或交织的，间隔开的，并且共享共同的中心。 在第一和第二接收电极两端测量施加于第一驱动电极和第二驱动电极的载荷，以确定阻抗; 测量的阻抗用于确定多个涂层的总厚度以及整个涂层厚度是否均匀。

    DETECTION DEVICE
    8.
    发明申请
    DETECTION DEVICE 有权
    检测装置

    公开(公告)号：US20150323483A1

    公开(公告)日：2015-11-12

    申请号：US14496062

    申请日：2014-09-25

    Applicant: Boe Technology Group Co., Ltd.

    Inventor： Xiaowei Liu ,  Yao Liu ,  Xiangqian Ding ,  Jinchao Bai

    IPC: G01N27/22 ,  C23C16/44 ,  C23C16/455

    CPC classification number: C23C16/52 ,  C23C2/14 ,  C23C14/545 ,  C23C14/564 ,  C23C16/4401 ,  C23C16/45589 ,  C23C16/45591 ,  G01B7/085 ,  G01B7/105 ,  G01N27/228 ,  G01R27/26 ,  H01J37/32568 ,  H01L21/67253

    Abstract: A detection device includes a chamber for vacuum coating, a capacitance measurement device and a baffle mechanism located in the chamber. The baffle mechanism is a closed structure encompassed by a number of baffle walls, wherein at least one baffle wall includes a fixed baffle plate and a moveable baffle plate. The moveable baffle plate is pivotable about the fixed baffle plate. The moveable baffle plate, after pivoting, may get parallel with an adjacent baffle wall. The adjacent baffle wall and the moveable baffle plate are respectively connected to the capacitance measurement device, and the capacitance measurement device is used to measure the capacitance between the adjacent baffle wall and the moveable baffle plate. The detection device may accurately detect the service life of the baffle mechanism and achieve precise management of the apparatus.

    Abstract translation: 检测装置包括用于真空涂覆的室，电容测量装置和位于室中的挡板机构。 挡板机构是由多个挡板包围的封闭结构，其中至少一个挡板壁包括固定挡板和可移动挡板。 可移动挡板可围绕固定挡板枢转。 可移动挡板在枢转之后可能与相邻的挡板平行。 相邻的挡板壁和可动挡板分别连接到电容测量装置，并且电容测量装置用于测量相邻挡板壁和可移动挡板之间的电容。 检测装置可以准确地检测挡板机构的使用寿命，实现设备的精确管理。

    POLISHING PAD WITH TWO-SECTION WINDOW HAVING RECESS
    10.
    发明申请
    POLISHING PAD WITH TWO-SECTION WINDOW HAVING RECESS 审中-公开
    具有两部分窗户的抛光垫

    公开(公告)号：US20150004888A1

    公开(公告)日：2015-01-01

    申请号：US14485386

    申请日：2014-09-12

    Applicant: Applied Materials, Inc.

    Inventor： Boguslaw A. Swedek ,  Manoocher Birang

    IPC: B24B37/26

    CPC classification number: B24B37/26 ,  B24B37/013 ,  B24B37/205 ,  B24B49/02 ,  B24B49/10 ,  B24B49/105 ,  B24B49/12 ,  B24D11/02 ,  G01B7/105

    Abstract: A method of forming a polishing pad with a polishing layer having a polishing surface and a back surface. A plurality of grooves are formed on the polishing surface, and an indentation is formed in the back surface of the polishing layer. A region on the polishing surface corresponding to the indentation in the back surface is free of grooves or has shallower grooves.

    Abstract translation: 一种用具有研磨面和背面的研磨层形成研磨垫的方法。 在研磨面上形成有多个凹槽，在研磨层的背面形成有凹部。 与后表面的凹部对应的研磨面上的区域没有凹槽或具有较浅的凹槽。

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