ELECTRODE MATERIAL AND BATTERY
    4.
    发明公开

    公开(公告)号:US20240097132A1

    公开(公告)日:2024-03-21

    申请号:US18522341

    申请日:2023-11-29

    CPC classification number: H01M4/62 H01M4/485 H01M10/0562 H01M2004/021

    Abstract: An electrode material includes an active material particle and a solid electrolyte particle. The solid electrolyte particle includes Li, M, and X, wherein M is at least one selected from the group consisting of metal elements excluding Li and metalloid elements, and X is at least one selected from the group consisting of F, Cl, Br, and I. The ratio R1 of the volume of the active material particle to the sum of the volume of the active material particle and the volume of the solid electrolyte particle is greater than or equal to 10% and less than 65% when expressed as percentage. The ratio R2 of the average particle diameter of the active material particle to the average particle diameter of the solid electrolyte particle is greater than or equal to 0.5 and less than or equal to 3.4.

    ELECTRICAL STORAGE DEVICE AND METHOD FOR MANUFACTURING ELECTRICAL STORAGE DEVICES
    8.
    发明申请
    ELECTRICAL STORAGE DEVICE AND METHOD FOR MANUFACTURING ELECTRICAL STORAGE DEVICES 审中-公开
    电气存储装置及制造电气存储装置的方法

    公开(公告)号:US20150270580A1

    公开(公告)日:2015-09-24

    申请号:US14657206

    申请日:2015-03-13

    CPC classification number: H01M14/00 H01G11/56 H01G11/84 Y02E60/13

    Abstract: An electrical storage device includes a stack structure including a conductive first electrode layer, a conductive second electrode layer, a charging layer disposed between the first electrode layer and the second electrode layer, the charging layer including a mixture containing an insulating material and at least one metal oxide selected from the group consisting of niobium oxide, tantalum oxide and molybdenum oxide, and an electron barrier layer disposed between the charging layer and the second electrode layer.

    Abstract translation: 一种电存储装置,包括:堆叠结构,包括导电第一电极层,导电第二电极层,设置在第一电极层和第二电极层之间的充电层,充电层包括含有绝缘材料和至少一个 选自氧化铌,氧化钽和氧化钼的金属氧化物以及设置在充电层和第二电极层之间的电子势垒层。

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