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公开(公告)号:US20080297758A1
公开(公告)日:2008-12-04
申请号:US12213930
申请日:2008-06-26
申请人: Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Van Meer , Patrick Johannes Cornelus Smulders , Franciscus Andreas Cornelis Spanjers , Johannes Petrus Martinus Ber Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人: Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Van Meer , Patrick Johannes Cornelus Smulders , Franciscus Andreas Cornelis Spanjers , Johannes Petrus Martinus Ber Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
IPC分类号: G03B27/58
CPC分类号: G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要: The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.
摘要翻译: 本发明涉及一种用于传送物体(W)的传送装置。 传送装置包括用于在第一位置处夹持物体(W)的至少一个然后在靠近接收器(20)的第二位置处释放物体(W)的至少一个并且释放物体(W)的夹持器(15) 在靠近接收器(20)的第二位置处夹持物体之后的第一位置。 传送装置还设置有测量装置(22),该测量装置设置成在至少一个维度上测量夹具(15)相对于接收器(20)的相对位置。 此外,基于测量的相对位置,相对于期望的相对位置来定义相对位置误差。 调整夹持器(15)和接收器(20)的相对位置以最小化第二位置中的相对位置误差。
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公开(公告)号:US07486384B2
公开(公告)日:2009-02-03
申请号:US10813687
申请日:2004-03-31
申请人: Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
发明人: Patricius Aloysius Jacobus Tinnemans , Edwin Johan Buis , Sjoerd Nicolaas Lambertus Donders , Jan Van Elp , Jan Frederik Hoogkamp , Aschwin Lodewijk Hendricus Johannes Van Meer , Patrick Johannes Cornelus Hendrik Smulders , Franciscus Andreas Cornelis Johannes Spanjers , Johannes Petrus Martinus Bernardus Vermeulen , Raimond Visser , Henricus Gerardus Tegenbosch , Johannes Charles Adrianus Van Den Berg , Henricus Johannes Adrianus Van De Sande , Thijs Vervoort
CPC分类号: G03F7/70741 , B25J13/089 , G03F7/7075 , G03F7/70925 , H01L21/6833 , H02N13/00
摘要: The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.
摘要翻译: 本发明涉及具有支撑结构以支撑和移动物体(如基底)的光刻投影装置。 支撑结构可以是具有机器人臂的机器人,其具有支撑框架的支撑框架,例如。 底物。 支撑框架包括具有用于在移动期间保持基板的一个或多个夹具的夹持结构。 机器人手臂包括一个或多个柔顺部件。 夹具可以是具有氧化的上表面的Johnson-Raybeck效应型夹具。 为了更好地去夹紧,可以向夹具提供RF AC衰减的去钳位电压。 该装置可以仅用一个单一的衬底清洁。
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公开(公告)号:US20110249246A1
公开(公告)日:2011-10-13
申请号:US13167314
申请日:2011-06-23
申请人: Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria MERTENS , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
IPC分类号: G03B27/52
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译: 公开了一种光刻设备,其包括液体供应系统,该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间,出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物, 液体供应系统和基材,以及构造成通过出口抽出混合物的抽空系统,排气系统具有分离器箱,其布置成将液体与混合物中的气体分离,分离器箱压力控制器连接到非液体 分离罐的填充区域,被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号:US08934082B2
公开(公告)日:2015-01-13
申请号:US13167314
申请日:2011-06-23
申请人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译: 公开了一种光刻设备,其包括液体供应系统,该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间,出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物, 液体供应系统和基材,以及构造成通过出口抽出混合物的抽空系统,排气系统具有分离器箱,其布置成将液体与混合物中的气体分离,分离器箱压力控制器连接到非液体 分离罐的填充区域,被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号:US08004652B2
公开(公告)日:2011-08-23
申请号:US12078635
申请日:2008-04-02
申请人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译: 公开了一种光刻设备,其包括液体供应系统,该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间,出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物, 液体供应系统和基材,以及构造成通过出口抽出混合物的抽空系统,排气系统具有分离器箱,其布置成将液体与混合物中的气体分离,分离器箱压力控制器连接到非液体 分离罐的填充区域,被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号:US20100270709A1
公开(公告)日:2010-10-28
申请号:US12836543
申请日:2010-07-14
申请人: Jeroen Johannes Sophia Maria MERTENS , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
发明人: Jeroen Johannes Sophia Maria MERTENS , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
CPC分类号: G03F7/70341
摘要: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
摘要翻译: 在浸没式光刻设备中,浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度,以确保液体的恒定流动。
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公开(公告)号:US20080259292A1
公开(公告)日:2008-10-23
申请号:US12078635
申请日:2008-04-02
申请人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
IPC分类号: G03B27/52
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
摘要翻译: 公开了一种光刻设备,其包括液体供应系统,该液体供应系统构造成至少部分地用液体填充投影系统和基板之间的空间,出口构造成去除通过液体和液体的液体限制结构之间的间隙的液体和气体的混合物, 液体供应系统和基材,以及构造成通过出口抽出混合物的抽空系统,排气系统具有分离器箱,其布置成将液体与混合物中的气体分离,分离器箱压力控制器连接到非液体 分离罐的填充区域,被构造成在非液体填充区域内保持稳定的压力。
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公开(公告)号:US08142852B2
公开(公告)日:2012-03-27
申请号:US12836543
申请日:2010-07-14
申请人: Jeroen Johannes Sophia Maria Mertens , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
发明人: Jeroen Johannes Sophia Maria Mertens , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
IPC分类号: B05D1/32
CPC分类号: G03F7/70341
摘要: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
摘要翻译: 在浸没式光刻设备中,浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度,以确保液体的恒定流动。
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公开(公告)号:US07779781B2
公开(公告)日:2010-08-24
申请号:US10900394
申请日:2004-07-28
申请人: Jeroen Johannes Sophia Maria Mertens , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
发明人: Jeroen Johannes Sophia Maria Mertens , Christiaan Alexander Hoogendam , Hans Jansen , Patricius Aloysius Jacobus Tinnemans , Leon Joseph Maria Van Den Schoor , Sjoerd Nicolaas Lambertus Donders , Bob Streefkerk
IPC分类号: B05C3/02
CPC分类号: G03F7/70341
摘要: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.
摘要翻译: 在浸没式光刻设备中,浸没液体通过限流器从罐中提供。 保持在罐中的液体保持在限流器上方基本上恒定的高度,以确保液体的恒定流动。
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公开(公告)号:US07379155B2
公开(公告)日:2008-05-27
申请号:US10966108
申请日:2004-10-18
申请人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johaannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
发明人: Jeroen Johannes Sophia Maria Mertens , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Antonius Johannus Van Der Net , Franciscus Johaannes Herman Maria Teunissen , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Edwin Van Gompel
CPC分类号: G03F7/70716 , G03F7/70341
摘要: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.
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