公开(公告)号：US06768567B2

公开(公告)日：2004-07-27

申请号：US10163479

申请日：2002-06-05

申请人： Patrick P. Naulleau

发明人： Patrick P. Naulleau

IPC分类号： G02B532

CPC分类号： G03F7/70591 ,  G02B5/32 ,  G02B13/143 ,  G02B13/26 ,  G03F7/70108 ,  G03F7/70141 ,  G03F7/70158

摘要： A lithographic illuminator to illuminate a reticle to be imaged with a range of angles is provided. The illumination can be employed to generate a pattern in the pupil of the imaging system, where spatial coordinates in the pupil plane correspond to illumination angles in the reticle plane. In particular, a coherent synchrotron beamline is used along with a potentially decoherentizing holographic optical element (HOE), as an experimental EUV illuminator simulation station. The pupil fill is completely defined by a single HOE, thus the system can be easily modified to model a variety of illuminator fill patterns. The HOE can be designed to generate any desired angular spectrum and such a device can serve as the basis for an illuminator simulator.

摘要翻译： 提供用于以一定范围的角度照射要成像的掩模版的光刻照明器。 照明可用于在成像系统的瞳孔中产生图案，其中瞳孔平面中的空间坐标对应于标线片平面中的照明角度。 特别地，相干同步加速器束线与潜在的去相干全息光学元件（HOE）一起使用，作为实验的EUV照明器模拟站。 瞳孔填充完全由单个HOE定义，因此可以轻松地修改系统以模拟各种照明器填充图案。 HOE可以被设计成产生任何期望的角度谱，并且这样的装置可以用作照明器模拟器的基础。

公开(公告)号：US06798494B2

公开(公告)日：2004-09-28

申请号：US09944391

申请日：2001-08-30

申请人： Patrick P. Naulleau

发明人： Patrick P. Naulleau

IPC分类号： G03B2754

CPC分类号： G03F7/70091 ,  G03F7/702

摘要： The effective coherence of an undulator beamline can be tailored to projection lithography requirements by using a simple single moving element and a simple stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (i) source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence; (ii) a reflective surface that receives incident radiation from said source; (iii) means for moving the reflective surface through a desired range of angles in two dimensions wherein the rate of the motion is fast relative to integration time of said image processing system; and (iv) a condenser optic that re-images the moving reflective surface to the entrance plane of said image processing system, thereby, making the illumination spot in said entrance plane essentially stationary.

摘要翻译： 波导束线的有效相干性可以通过使用简单的单个移动元件和简单的固定低成本球面镜来调整投影光刻要求。 本发明特别适用于需要部分相干照明的光学图像处理系统的照明装置。 照明器包括：（i）具有高于所需相干性的固有相干性的相干或部分相干辐射源; （ii）接收来自所述源的入射辐射的反射表面; （iii）用于将反射表面移动到两维中的所需角度范围的装置，其中运动速率相对于所述图像处理系统的积分时间快; 以及（iv）将移动的反射表面重新成像到所述图像处理系统的入射面的聚光镜，从而使得所述入射面中的照明点基本上是静止的。

公开(公告)号：US07016030B2

公开(公告)日：2006-03-21

申请号：US10689171

申请日：2003-10-20

申请人： Patrick P. Naulleau

发明人： Patrick P. Naulleau

IPC分类号： G01N21/00 ,  G01B11/28

CPC分类号： G01N21/55 ,  G01N21/8422 ,  G01N2021/9511 ,  G02B17/0615

摘要： Techniques for rapidly characterizing reflective surfaces and especially multi-layer EUV reflective surfaces of optical components involve illuminating the entire reflective surface instantaneously and detecting the image far field. The technique provides a mapping of points on the reflective surface to corresponding points on a detector, e.g., CCD. This obviates the need to scan a probe over the entire surface of the optical component. The reflective surface can be flat, convex, or concave.

摘要翻译： 用于快速表征光学部件的反射表面，特别是多层EUV反射表面的技术包括瞬时照射整个反射表面并检测图像远场。 该技术提供了反射表面上的点对检测器（例如CCD）上的对应点的映射。 这消除了在光学部件的整个表面上扫描探针的需要。 反射表面可以是平的，凸的或凹的。

公开(公告)号：US06927887B2

公开(公告)日：2005-08-09

申请号：US09981500

申请日：2001-10-16

申请人： Patrick P. Naulleau

发明人： Patrick P. Naulleau

IPC分类号： G02B5/32 ,  G03F7/20

CPC分类号： G03F7/70075 ,  G02B5/32 ,  G03F7/70091 ,  G03F7/70158 ,  G03F7/70583

摘要： The effective coherence of a synchrotron beam line can be tailored to projection lithography requirements by employing a moving holographic diffuser and a stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (1) a synchrotron source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence, (2) a holographic diffuser having a surface that receives incident radiation from said source, (3) means for translating the surface of the holographic diffuser in two dimensions along a plane that is parallel to the surface of the holographic diffuser wherein the rate of the motion is fast relative to integration time of said image processing system; and (4) a condenser optic that re-images the surface of the holographic diffuser to the entrance plane of said image processing system.

摘要翻译： 同步加速器束线的有效相干性可以通过采用移动全息漫射器和固定的低成本球面镜来调整投影光刻要求。 本发明特别适用于需要部分相干照明的光学图像处理系统的照明装置。 照明器包括：（1）相干或部分相干辐射的同步加速器源，其具有高于期望相干性的固有相干性，（2）具有接收来自所述源的入射辐射的表面的全息漫射器，（3） 用于沿着平行于全息漫射器的表面的平面二维地平移全息漫射器的表面，其中运动速率相对于所述图像处理系统的积分时间是快的; 和（4）将所述全息漫射器的表面重新成像到所述图像处理系统的入射面的聚光镜。

公开(公告)号：US6100978A

公开(公告)日：2000-08-08

申请号：US300539

申请日：1999-04-27

申请人： Patrick P. Naulleau ,  Kenneth Alan Goldberg

发明人： Patrick P. Naulleau ,  Kenneth Alan Goldberg

IPC分类号： G03F7/20 ,  G01B9/02

CPC分类号： G03F7/706 ,  G03F7/70591 ,  G03F7/70941

摘要： A hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI is provided. The dual-domain PS/PDI combines the separate noise-suppression capabilities of the widely-used phase-shifting and Fourier-transform fringe pattern analysis methods.The dual-domain PS/PDI relies on both a more restrictive implementation of the image plane PS/PDI mask and a new analysis method to be applied to the interferograms generated and recorded by the modified PS/PDI. The more restrictive PS/PDI mask guarantees the elimination of spatial-frequency crosstalk between the signal and the scattered-light noise arising from scattered-reference-light interfering with the test beam. The new dual-domain analysis method is then used to eliminate scattered-light noise arising from both the scattered-reference-light interfering with the test beam and the scattered-reference-light interfering with the "true" pinhole-diffracted reference light. The dual-domain analysis method has also been demonstrated to provide performance enhancement when using the non-optimized standard PS/PDI design.The dual-domain PS/PDI is essentially a three-tiered filtering system composed of lowpass spatial-filtering the test-beam electric field using the more restrictive PS/PDI mask, bandpass spatial-filtering the individual interferogram irradiance frames making up the phase-shifting series, and bandpass temporal-filtering the phase-shifting series as a whole.

摘要翻译： 提供能够抑制阻碍常规PS / PDI的散射参考光噪声的混合空间/时域点衍射干涉仪（称为双域PS / PDI）。 双域PS / PDI结合了广泛使用的相移和傅里叶变换条纹图案分析方法的独立噪声抑制能力。 双域PS / PDI依赖于对图像平面PS / PDI掩模的更加限制性的实现，以及应用于由修改的PS / PDI生成和记录的干涉图的新的分析方法。 更严格的PS / PDI掩模保证消除信号与散射参考光干扰测试光束引起的散射光噪声之间的空间 - 频率串扰。 然后使用新的双域分析方法来消除干扰测试光束的散射参考光和干扰“真实”针孔衍射参考光的散射参考光产生的散射光噪声。 双域分析方法也被证明在使用非优化标准PS / PDI设计时提供性能提升。 双域PS / PDI本质上是一个三层滤波系统，由采用更严格的PS / PDI掩模的测试光束电场的低通空间滤波组成，对通过空间滤波的单个干涉图辐射帧进行相位调制， 移相系列和带通时间滤波整个相移系列。

公开(公告)号：US06861273B2

公开(公告)日：2005-03-01

申请号：US09846150

申请日：2001-04-30

申请人： Erik Anderson ,  Patrick P. Naulleau

发明人： Erik Anderson ,  Patrick P. Naulleau

IPC分类号： C23F1/00 ,  G02B5/20 ,  G03C9/00 ,  G03F7/20 ,  H01L21/00

CPC分类号： G03F7/70075 ,  G03F7/70283 ,  H01L27/1462

摘要： Techniques for fabricating well-controlled, random relief, engineered surfaces that serve as substrates for EUV optical devices are accomplished with grayscale exposure. The method of fabricating a multilevel EUV optical element includes: (a) providing a substrate; (b) depositing a layer of curable material on a surface of the substrate; (c) creating a relief profile in a layer of cured material from the layer of curable material wherein the relief profile comprises multiple levels of cured material that has a defined contour; and (d) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. The curable material can comprise photoresist or a low dielectric constant material.

摘要翻译： 用于制造作为EUV光学器件的基板的良好控制，随机浮雕，工程表面的技术通过灰度曝光来实现。 制造多层EUV光学元件的方法包括：（a）提供衬底; （b）在所述基板的表面上沉积可固化材料层; （c）在可固化材料层的一层固化材料层中产生浮雕型材，其中所述浮雕型材包括具有限定轮廓的多层固化材料; 以及（d）在所述凹凸轮廓上沉积多层反射膜，其中所述膜具有与所述凹凸轮廓的外轮廓基本匹配的外轮廓。 可固化材料可以包括光致抗蚀剂或低介电常数材料。

公开(公告)号：US06859263B2

公开(公告)日：2005-02-22

申请号：US10377947

申请日：2003-02-28

申请人： Patrick P. Naulleau

发明人： Patrick P. Naulleau

IPC分类号： G03F7/20 ,  G03B27/54 ,  G02B5/10 ,  G02B27/30 ,  G03B27/42 ,  G21K5/00

CPC分类号： G03F7/70091 ,  G03F7/702

摘要： Techniques for generating partially coherent radiation and particularly for converting effectively coherent radiation from a synchrotron to partially coherent EUV radiation suitable for projection lithography.

摘要翻译： 用于产生部分相干辐射的技术，特别是用于将来自同步加速器的有效相干辐射转换成适用于投影光刻的部分相干的EUV辐射。

公开(公告)号：US06392792B1

公开(公告)日：2002-05-21

申请号：US09730970

申请日：2000-12-05

申请人： Patrick P. Naulleau

发明人： Patrick P. Naulleau

IPC分类号： G02B520

CPC分类号： G21K1/062 ,  B82Y10/00 ,  B82Y40/00 ,  G02B5/0825 ,  G02B5/1857 ,  G03F1/24 ,  G03F7/70058 ,  G03F7/70216 ,  G03F7/70958 ,  G21K1/06 ,  G21K2201/067 ,  Y10S359/90

摘要： Techniques for fabricating a well-controlled, quantized-level, engineered surface that serves as substrates for EUV reflection multilayer overcomes problems associated with the fabrication of reflective EUV diffraction elements. The technique when employed to fabricate an EUV diffraction element that includes the steps of: (a) forming an etch stack comprising alternating layers of first and second materials on a substrate surface where the two material can provide relative etch selectivity; (b) creating a relief profile in the etch stack wherein the relief profile has a defined contour; and (c) depositing a multilayer reflection film over the relief profile wherein the film has an outer contour that substantially matches that of the relief profile. For a typical EUV multilayer, if the features on the substrate are larger than 50 nm, the multilayer will be conformal to the substrate. Thus, the phase imparted to the reflected wavefront will closely match that geometrically set by the surface height profile.

摘要翻译： 用于制造用于EUV反射多层膜的良好控制，量化水平的工程表面的技术克服了与反射EUV衍射元件的制造相关的问题。 该技术用于制造EUV衍射元件，其包括以下步骤：（a）形成蚀刻叠层，其包括在衬底表面上交替的第一和第二材料层，其中两种材料可提供相对的蚀刻选择性; （b）在所述蚀刻堆叠中产生浮雕轮廓，其中所述凸起轮廓具有限定的轮廓; 和（c）在所述凹凸轮廓上沉积多层反射膜，其中所述膜具有与所述凹凸轮廓的外轮廓基本匹配的外轮廓。 对于典型的EUV多层，如果衬底上的特征大于50nm，则多层将与衬底共形。 因此，施加到反射波前的相位将与由表面高度分布几何设置的几何相似。

公开(公告)号：US06233056B1

公开(公告)日：2001-05-15

申请号：US09627533

申请日：2000-07-28

申请人： Patrick P. Naulleau ,  Kenneth Alan Goldberg

发明人： Patrick P. Naulleau ,  Kenneth Alan Goldberg

IPC分类号： G01B902

CPC分类号： G03F7/706 ,  G03F7/70591 ,  G03F7/70941

摘要： The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) provides the high-accuracy wavefront characterization critical to the development of EUV lithography systems. Enhancing the implementation of the PS/PDI can significantly extend its spatial-frequency measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wavefront and flare. The enhanced technique employs a hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI. Using the dual-domain technique in combination with a flare-measurement-optimized mask and an iterative calculation process for removing flare contribution caused by higher order grating diffraction terms, the enhanced PS/PDI can be used to simultaneously measure both figure and flare in optical systems.

摘要翻译： 极紫外（EUV）相移点衍射干涉仪（PS / PDI）提供了对EUV光刻系统开发至关重要的高精度波前表征。 增强PS / PDI的实现可以显着扩展其空间频率测量带宽。 增强的PS / PDI能够同时表征波前和耀斑。 该增强技术采用能够抑制阻碍常规PS / PDI的散射参考光噪声的混合空间/时域点衍射干涉仪（称为双域PS / PDI）。 使用双域技术结合光斑测量优化掩模和迭代计算过程，用于消除由高阶光栅衍射项引起的光斑贡献，增强型PS / PDI可用于同时测量光学中的图形和闪光 系统。

公开(公告)号：US07027226B2

公开(公告)日：2006-04-11

申请号：US09956160

申请日：2001-09-17

申请人： Kenneth Alan Goldberg ,  Patrick P. Naulleau

发明人： Kenneth Alan Goldberg ,  Patrick P. Naulleau

IPC分类号： G02B1/00 ,  G02B5/18 ,  G03F9/00

CPC分类号： G03F7/70075 ,  G02B5/1833 ,  G02B5/1838 ,  G03F7/70158

摘要： A wavefront modulating optical element device employs two or more materials lithographically patterned with programmed thickness profiles. The spatially-varying thickness profiles are chosen to yield arbitrary relative phase-shift and attenuation upon transmission. The device can be designed to create arbitrary diffractive optical elements with specific applications including diffusers, arbitrary holographic optical elements, null-elements for wavefront compensation and control in interferometry.