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公开(公告)号：US5917527A
公开(公告)日：1999-06-29
申请号：US747135
申请日：1996-11-12
IPC分类号： B41J2/175
CPC分类号： B41J2/17513
摘要： Disclosed is a novel inkjet print cartridge (pen) in which a body of polyurethane foam is inserted into an ink chamber of the pen for ink containment and backpressure. The ink chamber has a tall narrow aspect ratio. The body of polyurethane foam is felted in the width direction of the pen to have a width less than 20% of its pre-felted width. After felting, the body of foam is cut to have a "near net size" as the interior volume of the ink chamber. Specifically, the pre-insertion volume is less than about 130% of the interior volume of the ink chamber. The substantial felting in the width direction provides sufficient stiffness to the foam that it can be inserted into the tall, narrow aspect ratio ink chamber.
摘要翻译： 公开了一种新颖的喷墨打印墨盒（笔），其中聚氨酯泡沫体被插入墨水容纳和背压的笔的墨水室中。 墨水室具有高窄的纵横比。 聚氨酯泡沫体在笔的宽度方向上被压制成具有小于其预毡宽度的20％的宽度。 在熔化之后，泡沫体被切割成具有作为墨水室的内部容积的“近净尺寸”。 具体而言，预插入体积小于墨水室的内部容积的约130％。 在宽度方向上的实质性毡化为泡沫提供了足够的刚度，使其能够插入到高，窄的纵横比油墨室中。
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公开(公告)号：US07893386B2
公开(公告)日：2011-02-22
申请号：US10713298
申请日：2003-11-14
IPC分类号： B23K26/14
CPC分类号： B23K26/146
摘要： The described embodiments relate to laser micromachining a substrate. One exemplary method includes forming a feature into a substrate, at least in part, by directing a laser beam at the substrate. During at least a portion of said forming, the method includes supplying liquid to at least a first region of the feature along a first liquid supply path and supplying liquid to at least a second different region of the feature along at least a second liquid supply path.
摘要翻译： 所描述的实施例涉及激光微加工衬底。 一个示例性方法包括至少部分地通过将激光束引导到衬底来将特征形成到衬底中。 在所述成形的至少一部分期间，该方法包括沿着第一液体供应路径向特征的至少第一区域供应液体，并且沿至少第二液体供应路径向特征的至少第二不同区域供应液体 。
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公开(公告)号：US06930055B1
公开(公告)日：2005-08-16
申请号：US10855113
申请日：2004-05-26
申请人： Siddhartha Bhowmik , Rio T. Rivas , Mark C. Huth , Rocky H. Knuth
发明人： Siddhartha Bhowmik , Rio T. Rivas , Mark C. Huth , Rocky H. Knuth
IPC分类号： B41J2/16 , H01L21/302
CPC分类号： B81C1/00619 , B41J2/1603 , B41J2/1628 , B41J2/1629 , B41J2/1634 , B41J2/1642 , B81B2201/052
摘要： The described embodiments relate to substrates having features formed therein and methods of forming same. One exemplary method forms a blind feature through a majority of a thickness of a substrate, the blind feature being defined by at least one sidewall surface and a bottom surface. The method also applies an etch resistant material to the blind feature and removes the etch resistant material from at least a portion of the bottom surface. The method further wet etches the substrate at least through the bottom surface sufficient to form a through feature through the thickness of the substrate.
摘要翻译： 所描述的实施例涉及具有其中形成的特征的基板及其形成方法。 一个示例性方法通过基底的大部分厚度形成盲特征，盲特征由至少一个侧壁表面和底表面限定。 该方法还将抗蚀刻材料施加到盲特征并从底表面的至少一部分去除耐蚀刻材料。 该方法进一步湿润蚀刻基底至少通过底表面足以在基底的厚度上形成穿透特征。
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