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公开(公告)号：US10725178B2
公开(公告)日：2020-07-28
申请号：US16550708
申请日：2019-08-26
发明人： Christoph Dietz
摘要： A measuring device includes a light source that emits light of a plurality of wavelengths, in particular a continuous spectrum, a first confocal diaphragm, through which light from the light source passes, and an optical illuminating/imaging system having a first splitting optical element designed as a prism or grating. The optical illuminating/imaging system, which is designed such that the light enters the first splitting optical element collimated, includes a first lens system having at least one first lens that is spatially separated from the first splitting optical element, the effective focal length of the first lens system being significantly different for different wavelengths, and the optical illuminating/imaging system being designed such that focus points of different wavelengths are formed at different locations along a line segment. The measuring device is configured to measure an object that intersects with the line segment and reflects at least a part of the light.
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2.发明申请公开(公告)号：US20190091798A1
公开(公告)日：2019-03-28
申请号：US16095299
申请日：2016-10-19
发明人： Martin Schönleber , Christoph Dietz
摘要： A method for measuring the depth of the vapour cavity during an industrial machining process employs a high-energy beam. An optical measuring beam is directed towards the base of a vapour cavity. An optical coherence tomograph generates interference factors or other raw measurement data from reflections of the measurement beam. An evaluation device generates interference-suppressed measurement data, wherein raw measurement data that is generated at different times is processed together in the course of a mathematical operation. This operation can be a subtraction or a division. Slowly changing interference factors can thus be eliminated. An end value for the distance to the base of the vapour cavity is calculated from the interference-suppressed measurement data using a filter. As a result, the depth of the vapour cavity can be determined, in the knowledge of the distance at a part of the surface of the work piece that is not exposed to the high-energy beam.
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公开(公告)号：US20200174127A1
公开(公告)日：2020-06-04
申请号：US16550708
申请日：2019-08-26
发明人： Christoph Dietz
摘要： A measuring device includes a light source that emits light of a plurality of wavelengths, in particular a continuous spectrum, a first confocal diaphragm, through which light from the light source passes, and an optical illuminating/imaging system having a first splitting optical element designed as a prism or grating. The optical illuminating/imaging system, which is designed such that the light enters the first splitting optical element collimated, includes a first lens system having at least one first lens that is spatially separated from the first splitting optical element, the effective focal length of the first lens system being significantly different for different wavelengths, and the optical illuminating/imaging system being designed such that focus points of different wavelengths are formed at different locations along a line segment. The measuring device is configured to measure an object that intersects with the line segment and reflects at least a part of the light.
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公开(公告)号：US20190137626A1
公开(公告)日：2019-05-09
申请号：US16184222
申请日：2018-11-08
发明人： Christoph Dietz
摘要： A distance measuring device comprises a measuring head, the measuring head having an optical measuring system for carrying out an optical measurement process on a measurement object by means of at least one measuring light beam formed from a broad-band measuring light. The measuring head further has a liquid guide with a liquid inlet and a liquid outlet for producing a jet of liquid directed at the measurement object, the liquid guide being designed such that in certain sections at least the measuring light beam runs essentially along the jet of liquid. The measuring head further has a flow element with a laminar flow channel, the flow element being designed such that the at least one measuring light beam is able to reach the measurement object by passing through the laminar flow channel.
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公开(公告)号：US10228551B1
公开(公告)日：2019-03-12
申请号：US16056928
申请日：2018-08-07
摘要： A chromatic confocal measuring device includes a light source, which emits light of a plurality of wavelengths, and a first beam splitter, via which the light from the light source into an imaging optical unit having chromatic aberration on. Light reflected from the measurement object is imaged by the imaging optical unit and the first beam splitter onto a first confocal detection stop arrangement, such that the first confocal detection stop arrangement functions as a confocal aperture. Light incident through the first detection stop arrangement is detected and evaluated by a first detection device. The measuring device has a first slit stop, which functions as a confocal aperture of the measuring device. The measuring device additionally includes a second detection device and a second beam splitter, wherein the second beam splitter splits the light reflected from the measurement object into a first and a second partial beam, which image the same spatial region of the measurement object. The first detection device detects light of the first partial beam by a linear detector and evaluates total intensities over all wavelengths in order to create a total intensity profile and/or a total intensity image therefrom. The second detection device at the same time spectrally splits light of the second partial beam and evaluates intensities of the light of a plurality of individual wavelengths.
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公开(公告)号：US20230417533A1
公开(公告)日：2023-12-28
申请号：US18002181
申请日：2021-06-10
发明人： Christoph Dietz , Philipp Rohrmann , Stephan Weiss
IPC分类号： G01B9/02015
CPC分类号： G01B9/02015
摘要： An optical measuring device includes a measuring head with an imaging optical unit and an evaluation unit, wherein the measuring head is connected to the evaluation unit by way of two light-guiding fibers, wherein the evaluation unit includes a light source whose light is guided through the first light-guiding fiber into the measuring head and wherein light reflected by the measurement object is guided back through the measuring head and into a second light-guiding fiber by means of a beam splitter, in such a way that outgoing and returning light are separated, wherein the fiber ends are in mutually conjugate positions, wherein the beam splitter and the fiber ends are arranged together in a connector that is separably connected to the measuring head.
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公开(公告)号：US10466357B1
公开(公告)日：2019-11-05
申请号：US16361955
申请日：2019-03-22
发明人： Christoph Dietz
摘要： A measuring device includes a light source that emits light of a plurality of wavelengths, in particular a continuous spectrum, a first confocal diaphragm, through which light from the light source passes, and an optical illuminating/imaging system having a first splitting optical element designed as a prism or grating. The optical illuminating/imaging system, which is designed such that the light enters the first splitting optical element collimated, includes a first lens system having at least one first lens that is spatially separated from the first splitting optical element, the effective focal length of the first lens system being significantly different for different wavelengths, and the optical illuminating/imaging system being designed such that focus points of different wavelengths are formed at different locations along a line segment. The measuring device is configured to measure an object that intersects with the line segment and reflects at least a part of the light.
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公开(公告)号：US20240167808A1
公开(公告)日：2024-05-23
申请号：US18282759
申请日：2022-03-10
发明人： Stephan Weiß , Katrin Philipp , Andreas Krieger , Christoph Dietz
IPC分类号： G01B11/06
CPC分类号： G01B11/06 , G01B2210/50
摘要： A chromatic, confocal measuring device uses a broadband, high-intensity light source implemented by optically pumping a luminophore. The illumination of the luminophore is selected so that the properties of the luminophore are exploited to maximize the optical output power of the light source.
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9.发明授权Apparatus and method for monitoring a thickness of a silicon wafer with a highly doped layer 有权用高度掺杂层监测硅晶片的厚度的装置和方法公开(公告)号：US09230817B2
公开(公告)日：2016-01-05
申请号：US14198566
申请日：2014-03-05
CPC分类号： H01L21/304 , B24B49/12 , G01B9/00 , G01B11/0675 , G01B11/0683 , H01L21/67253 , H01L22/12 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： Apparatus for monitoring a thickness of a silicon wafer with a highly-doped layer at least at a backside of the silicon wafer is provided. The apparatus has a source configured to emit coherent light of multiple wavelengths. Moreover, the apparatus comprises a measuring head configured to be contactlessly positioned adjacent the silicon wafer and configured to illuminate at least a portion of the silicon wafer with the coherent light and to receive at least a portion of radiation reflected by the silicon wafer. Additionally, the apparatus comprises a spectrometer, a beam splitter and an evaluation device. The evaluation device is configured to determine a thickness of the silicon wafer by analyzing the radiation reflected by the silicon wafer by an optical coherence tomography process. The coherent light is emitted multiple wavelengths in a bandwidth b around a central wavelength wc.
摘要翻译： 提供了用于至少在硅晶片背面监测具有高掺杂层的硅晶片厚度的装置。 该装置具有被配置为发射多个波长的相干光的源。 此外，该装置包括测量头，其被配置为与硅晶片相邻地非接触地定位，并被配置为用相干光照射至少一部分硅晶片并且接收由硅晶片反射的辐射的至少一部分。 另外，该装置包括光谱仪，分束器和评估装置。 评估装置被配置为通过光学相干断层摄影处理来分析由硅晶片反射的辐射来确定硅晶片的厚度。 相干光在围绕中心波长wc的带宽b中发射多个波长。
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10.发明申请Apparatus and Method for Monitoring a Thickness of a Silicon Wafer with a Highly Doped Layer 审中-公开用于监测具有高掺杂层的硅晶片的厚度的装置和方法公开(公告)号：US20140315333A1
公开(公告)日：2014-10-23
申请号：US14198566
申请日：2014-03-05
IPC分类号： H01L21/66 , H01L21/304 , G01B9/00
CPC分类号： H01L21/304 , B24B49/12 , G01B9/00 , G01B11/0675 , G01B11/0683 , H01L21/67253 , H01L22/12 , H01L22/26 , H01L2924/0002 , H01L2924/00
摘要： Apparatus for monitoring a thickness of a silicon wafer with a highly-doped layer at least at a backside of the silicon wafer is provided. The apparatus has a source configured to emit coherent light of multiple wavelengths. Moreover, the apparatus comprises a measuring head configured to be contactlessly positioned adjacent the silicon wafer and configured to illuminate at least a portion of the silicon wafer with the coherent light and to receive at least a portion of radiation reflected by the silicon wafer. Additionally, the apparatus comprises a spectrometer, a beam splitter and an evaluation device. The evaluation device is configured to determine a thickness of the silicon wafer by analyzing the radiation reflected by the silicon wafer by an optical coherence tomography process. The coherent light is emitted multiple wavelengths in a bandwidth b around a central wavelength wc.
摘要翻译： 提供了用于至少在硅晶片背面监测具有高掺杂层的硅晶片厚度的装置。 该装置具有被配置为发射多个波长的相干光的源。 此外，该装置包括测量头，其被配置为与硅晶片相邻地非接触地定位，并被配置为用相干光照射至少一部分硅晶片并且接收由硅晶片反射的辐射的至少一部分。 另外，该装置包括光谱仪，分束器和评估装置。 评估装置被配置为通过光学相干断层摄影处理来分析由硅晶片反射的辐射来确定硅晶片的厚度。 相干光在围绕中心波长wc的带宽b中发射多个波长。
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