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公开(公告)号：US20230347582A1
公开(公告)日：2023-11-02
申请号：US18217225
申请日：2023-06-30
Inventor： Hicham Hamoudi , Golibjon Berdiyorov
IPC: B29C64/159 , B29C64/245 , B29C64/295 , B29C64/209 , C07C321/04 , C07C321/26 , C07D213/70 , B29C64/106
CPC classification number: B29C64/159 , B29C64/245 , B29C64/295 , B29C64/209 , C07C321/04 , C07C321/26 , C07D213/70 , B29C64/106 , B33Y30/00
Abstract: A solution-based system for printing a 3D structure is provided and includes a substrate; a first solution including an organic molecule including a functional group at each end for creation of self-assembled monolayers (SAMs) including a first self-assembled monolayer (SAM) as a building block for printing the 3D structure, wherein the first solution is applied to a surface of the substrate to form the first SAM including a first SAM surface as a basis for the 3D structure; a second solution including metal ions, wherein the substrate with the first SAM is immersed into the second solution, and wherein the first solution is applied to the substrate which is immersed in the second solution thereby obtaining molecular-metal SAMs to provide a multiple layered SAM material; and means for applying a force and forming the 3D structure from the multiple layered SAM material, wherein the 3D structure is provided on the substrate.
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公开(公告)号：US11718023B2
公开(公告)日：2023-08-08
申请号：US16876785
申请日：2020-05-18
Inventor： Hicham Hamoudi , Golibjon Berdiyorov
IPC: B29C64/159 , B29C64/245 , B29C64/295 , B29C64/209 , C07C321/04 , C07C321/26 , C07D213/70 , B29C64/106 , B33Y30/00 , B33Y10/00
CPC classification number: B29C64/159 , B29C64/106 , B29C64/209 , B29C64/245 , B29C64/295 , C07C321/04 , C07C321/26 , C07D213/70 , B33Y10/00 , B33Y30/00
Abstract: Systems and methods for low-cost and morphologically stable 3D printing are disclosed. A solution-based method for 3D printing, comprising i) providing a substrate comprising a flat surface; ii) providing a first solution of a self-assembled monolayer (SAM) molecule comprising a functional group at each end of the SAM molecule; iii) applying the first solution to the flat surface of the substrate to form a first SAM comprising a first liquid surface; iv) providing a second solution of a metal precursor; v) applying the second solution on the first liquid surface to form a second liquid surface over the first SAM; vi) applying a first force to cross-link the first SAM; vii) repeating steps iii) and v)-vi) to form a multiple layer of the SAM; and viii) either applying a second force to anneal the multiple layer of the SAM to form a soft material or applying a third force to anneal the multiple layer of the SAM to form a hard material.
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公开(公告)号：US12269210B2
公开(公告)日：2025-04-08
申请号：US18217225
申请日：2023-06-30
Inventor： Hicham Hamoudi , Golibjon Berdiyorov
IPC: B29C64/159 , B29C64/106 , B29C64/209 , B29C64/245 , B29C64/295 , C07C321/04 , C07C321/26 , C07D213/70 , B33Y10/00 , B33Y30/00
Abstract: A solution-based system for printing a 3D structure is provided and includes a substrate; a first solution including an organic molecule including a functional group at each end for creation of self-assembled monolayers (SAMs) including a first self-assembled monolayer (SAM) as a building block for printing the 3D structure, wherein the first solution is applied to a surface of the substrate to form the first SAM including a first SAM surface as a basis for the 3D structure; a second solution including metal ions, wherein the substrate with the first SAM is immersed into the second solution, and wherein the first solution is applied to the substrate which is immersed in the second solution thereby obtaining molecular-metal SAMs to provide a multiple layered SAM material; and means for applying a force and forming the 3D structure from the multiple layered SAM material, wherein the 3D structure is provided on the substrate.
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公开(公告)号：US20250068086A1
公开(公告)日：2025-02-27
申请号：US18813454
申请日：2024-08-23
Inventor： Hicham Hamoudi , Sara Iyad Mohd Saleh Ahmad
Abstract: A maskless photolithography technique is provided for the direct synthesis and integration of metallic nanostructures exhibiting branching and flower-like fractal geometries on two-dimensional (2D) carbon-based nanosheets, employing room temperature ultraviolet (UV) irradiation. The photolithography process leverages the structural and electronic properties of carbon-based nanosheets comprising semiconducting organic carbon-based molecular monolayers connected by metallic atoms providing strong covalent linkages. By embedding the metallic precursor for fractal nanostructures within the carbon-based nanosheet during the initial synthesis, UV irradiation initiates the photoreduction of metallic atoms and their growth into fractal nanostructures with high yield and uniformity.
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5.发明公开公开(公告)号：US20240181569A1
公开(公告)日：2024-06-06
申请号：US18385560
申请日：2023-10-31
Inventor： Hicham Hamoudi , Sara Iyad Mohd Saleh Ahmad
IPC: B23K26/362 , B33Y40/20 , B33Y80/00
CPC classification number: B23K26/362 , B33Y40/20 , B33Y80/00
Abstract: A method for synthesis of fractal metallic nanostructure is provided. The method includes applying electron-beam irradiation directly on a metal-containing carbon nanosheet. Moreover, the Disclosed Invention relates to a novel method for the direct synthesis and control of fractal growth of metallic nanostructures on hybrid self-assembled metal/carbon nanosheets using electron-beam irradiation. In particular, the nanosheet is the source or the metallic precursor for the fractal nanostructure as well as the substrate on which the fractal formation takes place. In addition, the irradiation-induced interactions between the electron-beam and the carbon-based nanosheet enables the patterning and carving of the nanosheet with different designs of various complexities to eventually control the path and route of the irradiation induced nucleation and growth of the metallic fractal morphology.
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Patent Agency Ranking
公开(公告)号：US11974443B2
公开(公告)日：2024-04-30
申请号：US16922508
申请日：2020-07-07
Inventor： Hicham Hamoudi , Golibjon Berdiyorov
CPC classification number: H10K30/352 , H10K71/40 , H10K71/50 , H10K71/00
Abstract: Disclosed is a fabrication method for constructing low-cost, morphologically stable, highly ordered, and crystalized layered organic solar cells. The method implements self-assembled molecular monolayers as building blocks (a bottom up strategy) to fabricate a device. This approach enables the creation of a layered material with desired morphology in a controlled way. In such geometry, optoelectronic and transport properties can be controlled by metal atom inclusions into the molecular monolayers, which presents a range of options in creating photo-sensitive molecular building blocks to cover a wide range of the solar spectra from IR to visible to UV.
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公开(公告)号：US12274156B2
公开(公告)日：2025-04-08
申请号：US18425736
申请日：2024-01-29
Inventor： Hicham Hamoudi , Golibjon Berdiyorov
Abstract: Disclosed is a fabrication method for constructing low-cost, morphologically stable, highly ordered, and crystalized layered organic solar cells. The method implements self-assembled molecular monolayers as building blocks (a bottom up strategy) to fabricate a device. This approach enables the creation of a layered material with desired morphology in a controlled way. In such geometry, optoelectronic and transport properties can be controlled by metal atom inclusions into the molecular monolayers, which presents a range of options in creating photo-sensitive molecular building blocks to cover a wide range of the solar spectra from IR to visible to UV.
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8.发明公开公开(公告)号：US20240292636A1
公开(公告)日：2024-08-29
申请号：US18425736
申请日：2024-01-29
Inventor： Hicham Hamoudi , Golibjon Berdiyorov
CPC classification number: H10K30/352 , H10K71/40 , H10K71/50 , H10K71/00
Abstract: Disclosed is a fabrication method for constructing low-cost, morphologically stable, highly ordered, and crystalized layered organic solar cells. The method implements self-assembled molecular monolayers as building blocks (a bottom up strategy) to fabricate a device. This approach enables the creation of a layered material with desired morphology in a controlled way. In such geometry, optoelectronic and transport properties can be controlled by metal atom inclusions into the molecular monolayers, which presents a range of options in creating photo-sensitive molecular building blocks to cover a wide range of the solar spectra from IR to visible to UV.
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公开(公告)号：US20230356462A1
公开(公告)日：2023-11-09
申请号：US18217219
申请日：2023-06-30
Inventor： Hicham Hamoudi , Golibjon Berdiyorov
IPC: B29C64/159 , B29C64/209 , B29C64/295 , C07D213/70 , C07C321/04 , B29C64/245 , B29C64/106 , C07C321/26 , B33Y10/00 , B33Y30/00
CPC classification number: B29C64/159 , B29C64/209 , B29C64/295 , C07D213/70 , C07C321/04 , B29C64/245 , B29C64/106 , C07C321/26 , B33Y10/00 , B33Y30/00
Abstract: A vapor-based method and system for printing a 3D structure are provided. The vapor-based method includes providing a substrate; providing a first vapor including an organic molecule including a functional group at each end for creation of self-assembled monolayers (SAMs) as a building block for printing the 3D structure; providing a second vapor including metal ions; applying the first vapor and the second vapor to form molecular-metal SAMs thereby providing a multiple layered SAMs material on the substrate; and applying a force and forming the 3D structure from the multiple layered SAMs material, wherein the 3D structure is provided on the substrate.
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10.发明申请公开(公告)号：US20210354374A1
公开(公告)日：2021-11-18
申请号：US16876785
申请日：2020-05-18
Inventor： Hicham Hamoudi , Golibjon Berdiyorov
IPC: B29C64/159 , B29C64/245 , B29C64/295 , B29C64/209 , B29C64/106 , C07C321/04 , C07C321/26 , C07D213/70
Abstract: Systems and methods for low-cost and morphologically stable 3D printing are disclosed. A solution-based method for 3D printing, comprising i) providing a substrate comprising a flat surface; ii) providing a first solution of a self-assembled monolayer (SAM) molecule comprising a functional group at each end of the SAM molecule; iii) applying the first solution to the flat surface of the substrate to form a first SAM comprising a first liquid surface; iv) providing a second solution of a metal precursor; v) applying the second solution on the first liquid surface to form a second liquid surface over the first SAM; vi) applying a first force to cross-link the first SAM; vii) repeating steps iii) and v)-vi) to form a multiple layer of the SAM; and viii) either applying a second force to anneal the multiple layer of the SAM to form a soft material or applying a third force to anneal the multiple layer of the SAM to form a hard material.
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