摘要:
First radicals and second radicals are simultaneous deposited into a space defined by two adjacent lines of photoresists and an underlying layer. A portion of the first radicals and the second radicals combine to form a polymer layer on the layer in the center of the space, and substantially simultaneously, another portion of thee first radicals remove the underlying layer near the base of the photoresists. The first radicals may be fluorine-rich and the second radicals may be carbon-rich.
摘要:
Electrotransfer is performed in an instrument that receives electroblotting cassettes and that contains an integrated power supply, controls, and a display that allows the user to monitor and control each of a plurality of cassettes individually through electrical contacts within the housing that mate with corresponding electrical contacts on the cassettes.
摘要:
Electrotransfer is performed in an instrument that receives electroblotting cassettes and that contains an integrated power supply, controls, and a display that allows the user to monitor and control each of a plurality of cassettes individually through electrical contacts within the housing that mate with corresponding electrical contacts on the cassettes.
摘要:
A polymer spacer material may increase the dimensions of the patterned photoresist that is used as a mask to etch the layers below the photoresist, which in turn translates into smaller dimensions etched into the underlying materials. This allows for the formation of integrated circuits having smaller features, smaller overall size, and greater density of features. In particular, the use of a polymer spacer material allows for the formation of contacts within flash memory cells having decreased dimensions so that higher density flash memory cells may be created without causing shorts between contacts or shorts due to misalignment of the contacts. Additionally, the use of the polymer spacer material extends the use of photolithography technologies that are used to form the patterns into the photoresists.