Linear accelerator for generating high X-ray doses

    公开(公告)号:US12137514B2

    公开(公告)日:2024-11-05

    申请号:US17754764

    申请日:2020-12-02

    Abstract: An X-ray generation system is configured to generate an X-ray beam configured to be delivered to a patient undergoing radiation therapy. The X-ray generation system includes a linear accelerator system configured to generate an electron beam configured to impinge a target configured to respond to the incident electron beam by emitting an X-ray beam configured to deliver an X-ray dose rate to the patient in a range of 40 Gy/s to 1000 Gy/s within a treatment delivery window.

    SPLIT STRUCTURE PARTICLE ACCELERATORS

    公开(公告)号:US20210204389A1

    公开(公告)日:2021-07-01

    申请号:US17180458

    申请日:2021-02-19

    Abstract: A particle accelerator can include a first waveguide portion and a second waveguide portion. The first waveguide portion can include a first plurality of cell portions and a first iris portion that is disposed between two of the first plurality of cell portions. The first iris portion can include a first portion of an aperture such that the aperture is configured to be disposed about a beam axis. The first waveguide portion can further include a first bonding surface. The second waveguide portion can include a second plurality of cell portions and a second iris portion that is disposed between two of the second plurality of cell portions. The second iris portion can include a second portion of the aperture. The second waveguide portion can include a second bonding surface.

    SPLIT STRUCTURE PARTICLE ACCELERATORS
    7.
    发明申请

    公开(公告)号:US20200092979A1

    公开(公告)日:2020-03-19

    申请号:US16676766

    申请日:2019-11-07

    Abstract: A particle accelerator can include a first waveguide portion and a second waveguide portion. The first waveguide portion can include a first plurality of cell portions and a first iris portion that is disposed between two of the first plurality of cell portions. The first iris portion can include a first portion of an aperture such that the aperture is configured to be disposed about a beam axis. The first waveguide portion can further include a first bonding surface. The second waveguide portion can include a second plurality of cell portions and a second iris portion that is disposed between two of the second plurality of cell portions. The second iris portion can include a second portion of the aperture. The second waveguide portion can include a second bonding surface.

    Split structure particle accelerators

    公开(公告)号:US11950352B2

    公开(公告)日:2024-04-02

    申请号:US17180458

    申请日:2021-02-19

    CPC classification number: H05H7/16 H01P3/127 H01P11/002 H05H7/22 H05H2007/225

    Abstract: A particle accelerator can include a first waveguide portion and a second waveguide portion. The first waveguide portion can include a first plurality of cell portions and a first iris portion that is disposed between two of the first plurality of cell portions. The first iris portion can include a first portion of an aperture such that the aperture is configured to be disposed about a beam axis. The first waveguide portion can further include a first bonding surface. The second waveguide portion can include a second plurality of cell portions and a second iris portion that is disposed between two of the second plurality of cell portions. The second iris portion can include a second portion of the aperture. The second waveguide portion can include a second bonding surface.

    Modified split structure particle accelerators

    公开(公告)号:US11612049B2

    公开(公告)日:2023-03-21

    申请号:US17276446

    申请日:2019-09-18

    Abstract: A particle accelerator can include a first waveguide portion and a second waveguide portion. The first waveguide portion can include a first plurality of cell portions and a first iris portion that is disposed between two of the first plurality of cell portions. The first iris portion can include a first portion of an aperture such that the aperture is configured to be disposed about a beam axis. The first waveguide portion can further include a first bonding surface. The second waveguide portion can include a second plurality of cell portions and a second iris portion that is disposed between two of the second plurality of cell portions. The second iris portion can include a second portion of the aperture. The second waveguide portion can include a second bonding surface.

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