Apparatus for processing semiconductor devices
    1.
    发明授权
    Apparatus for processing semiconductor devices 失效
    用于处理半导体器件的装置

    公开(公告)号:US3749383A

    公开(公告)日:1973-07-31

    申请号:US3749383D

    申请日:1971-04-29

    Applicant: RCA CORP

    Inventor: VOIGT E HALL W

    CPC classification number: C23C14/34 B01J3/04 Y10S414/135

    Abstract: Apparatus for growing epitaxial layers of semiconductor material on substrate wafers at a relatively high production rate comprises a reactor furnace and a loading device cooperatively associated with it. An elevator is disposed to raise, and to lower, a holder for the wafers through an opening in the bottom of the heating chamber of the furnace. The loading device comprises an arm disposed for rotation on a carriage that is slidable towards and away from the elevator. The holder is adapted to be disposed on either end of the rotatable arm for delivery to, and for removal from, the furnace. When the loading device is disposed for movement between two furnaces, three wafer holders can be used for processing wafers at a high rate of production.

    Abstract translation: 用于在相对高的生产率下在衬底晶片上生长半导体材料的外延层的装置包括与其协作地相关联的反应器炉和加载装置。 升降机设置成通过炉的加热室的底部的开口升高和降低晶片的保持器。 装载装置包括一个臂,它设置成能够在电梯上朝向和远离的方向滑动的滑架上旋转。 保持器适于设置在可旋转臂的任一端上,用于输送到炉中并从炉中取出。 当装载装置设置为在两个炉之间移动时,可以使用三个晶片保持器以高生产率处理晶片。

Patent Agency Ranking