Abstract:
AN EPITAXIAL LAYER OF GALLIUM NITRIDE IS DEPOSITED FROM A MELT CONTAINING A SMALL CONCENTRATION OF GALLIUM AND A LARGE CONCENTRATION OF A METAL OR MIXTURE OF METALS WHICH DO NOT FORM A STABLE COMPOUND WITH NITROGEN. THE MELT IS SUBJECTED TO AN ATMOSPHERE CONTAINING NITROGEN SO AS TO FORM GALLIUM NITRITE IN THE MELT. A SUBSTRATE IS BROUGHT INTO CONTACT WITH THE GALLIUM NITRITE CONTAINING MELT AND THE MELT IS COOLED TO DEPOSIT GALLIUM NITRITE FROM THE MELT ONTO THE SUBSTRATE. THE SUBSTRATE IS THEN SEPARATED FROM THE MELT.
Abstract:
A body of single crystalline semiconductor material having a radiation generating region sandwiched between two other regions. the junctions between the intermediate radiation generating region and each of the outer two regions are heterojunctions which extend to an edge of the body. The intermediate region is of a material having a bandgap energy which is lower than that of the materials of the other two regions but the difference between the bandgap energy of the intermediate region and one of the outer regions is smaller than the bandgap energy between the intermediate region and the other of the outer regions.