公开(公告)号：US3875026A

公开(公告)日：1975-04-01

申请号：US47229374

申请日：1974-05-22

Applicant: RCA CORP

Inventor： WIDMER ROLAND WERNER

IPC: G03H1/04 ,  C25D1/10 ,  G03F7/00 ,  G03F7/26 ,  G03H1/02 ,  G03H1/18 ,  C23B5/00 ,  C23B5/58

CPC classification number: G03H1/0276 ,  C25D1/10 ,  G03F7/001 ,  G03H1/0244 ,  G03H2001/0292 ,  G03H2001/0296 ,  G03H2260/14 ,  G03H2260/63 ,  G03H2270/13 ,  G03H2270/52

Abstract: A master for replicating surface relief holograms is prepared by depositing a photoresist on the surface of an amorphous aluminum substrate, exposing the photoresist to an interference pattern, developing the photoresist to record the interference pattern as a surface relief pattern, transferring the surface relief pattern onto the surface of the aluminum substrate, removing the remaining photoresist, and anodizing the aluminum surface. This method is particularly useful in making masters for surface relief focused image holograms whose surface dimensions are in the order of one micron or less.