公开(公告)号：US20220091506A1

公开(公告)日：2022-03-24

申请号：US17462216

申请日：2021-08-31

Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC

Inventor： Ke Yang ,  Emad Aqad ,  James F. Cameron ,  Suzanne M. Coley ,  Manibarsha Goswami ,  ChoongBong Lee ,  Bhooshan Popere ,  James W. Thackeray ,  Brandon Wenning

IPC: G03F7/039 ,  G03F7/004 ,  C08F212/14 ,  C08F220/18

Abstract: A photoresist composition comprises a first polymer comprising a first repeating unit comprising a hydroxy-aryl group and a second repeating unit comprising an acid-labile group, wherein the first polymer does not comprise a lactone group; a second polymer comprising a first repeating unit comprising a hydroxy-aryl group, a second repeating unit comprising an acid-labile group, and a third repeating unit comprising a lactone group; a photoacid generator; and a solvent.