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公开(公告)号:US20220195280A1
公开(公告)日:2022-06-23
申请号:US17549540
申请日:2021-12-13
申请人: ROLLS-ROYCE plc
发明人: Donka NOVOVIC , Daniel CLARK , Dragos A. AXINTE , Zhirong LIAO
摘要: A coolant for a subtractive machine process, the coolant comprising a phase change material which changes from a solid state to a liquid state as a result of frictional heat generated during the subtractive machine process of the machine tool on a component to be machined, and returns to the solid state as the component cools.
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公开(公告)号:US20230382816A1
公开(公告)日:2023-11-30
申请号:US18141562
申请日:2023-05-01
申请人: ROLLS-ROYCE PLC
发明人: Dmitrii I USHMAEV , Zhirong LIAO , Dragos A AXINTE , Andrew D NORTON , James KELL , Artem BOGATYREV
CPC分类号: C04B41/86 , C04B41/0072 , F01D5/288
摘要: A method of forming a protective coating includes providing a substrate including a major surface. The method further includes providing a top coat layer adjacent to the major surface of the substrate. The top coat layer includes a top coat surface distal to the substrate. The method further includes forming a plurality of slots in the top coat layer. The method further includes at least partially heating the top coat surface above a threshold temperature, such that a first portion of the top coat layer extending from the top coat surface partially melts to form a glazed layer, and a second portion of the top coat layer disposed between the glazed layer and the major surface of the substrate is not melted and includes at least a portion of each of the plurality of slots.
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公开(公告)号:US20230295793A1
公开(公告)日:2023-09-21
申请号:US18176916
申请日:2023-03-01
申请人: ROLLS-ROYCE plc
CPC分类号: C23C14/228 , C23C14/083
摘要: An apparatus for coating a surface of a substrate includes an evaporant source disposed within an open environment including air at atmospheric pressure. The evaporant source includes a coating material. The apparatus further includes an energy beam source disposed within the open environment and configured to emit at least one energy beam that impinges on an emission region of the evaporant source to form a vapour plume at the emission region. The vapour plume includes the coating material of the evaporant source. The apparatus further includes a fixture configured to position the evaporant source relative to the substrate within the open environment, such that a maximum distance between the emission region of the evaporant source and the surface of the substrate is less than or equal to 10 cm.
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